研究生: |
簡瑋德 Wei-De Chien |
---|---|
論文名稱: |
二維二硫化鉬薄膜的製備及其光學特性與應用之研究 Fabrication of two-dimensional molybdenum disulfide thin film also the study on optical characteristics and applications |
指導教授: |
李奎毅
Kuei-Yi Lee |
口試委員: |
李奎毅
Kuei-Yi Lee 何清華 Ching-Hwa Ho 陳瑞山 Ruei-San Chen 邱博文 Chiu, Po-Wen |
學位類別: |
碩士 Master |
系所名稱: |
電資學院 - 電子工程系 Department of Electronic and Computer Engineering |
論文出版年: | 2017 |
畢業學年度: | 105 |
語文別: | 中文 |
論文頁數: | 88 |
中文關鍵詞: | 二硫化鉬 、薄膜 、氧電漿 、光感測器 、光激發螢光 、拉曼光譜 、光電特性 |
外文關鍵詞: | Oxygen plasma, Raman spectroscope |
相關次數: | 點閱:294 下載:0 |
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本論文主要是來探討原子層級的二硫化鉬薄膜的製備與其應用. 本論文主
要是利用化學氣相沉積法合成原子層級的二硫化鉬薄膜於基板上, 而基板則是
選用藍寶石與石英基板, 待合成完二硫化鉬薄膜後, 利用光學顯微鏡分析在基板
上的形貌與其薄膜連續性, 之後利用拉曼散射, 分析薄膜原子振動模態, 再利用
原子力顯微鏡分析薄膜的厚度, 可發現薄膜厚度為原子層級. 利用X光電子能譜
儀分析發現薄膜元素組成, 之後利用二硫化鉬薄膜進行光激發螢光量測, 探討其
光學特性, 同時利用低溫系統量測12 K至300 K不同溫度的光激發螢光光譜, 而
其中在 150 K 時, 束縛能激子被量測到, 而隨著溫度的上升, 束縛能激子與自由
激子皆產生紅移的現象, 同時也進行光穿透實驗, 發現到二硫化鉬由於電子自旋
分裂的自由 A 激子與自由 B 激子. 最後利用二硫化鉬薄膜製作成元件, 進行場
效電晶體模擬與光感測器研究, 在場效電晶體中, 利用閘極電場, 來控制以二硫
化鉬作為通道的通道大小, 在電晶體的電壓-電流特性曲線量測中以狄拉克點
(電壓-電流曲線中最低點) 為分界可觀察到電子與電洞工作區. 之後進行光感測
II
器研究, 探討光導率與光響應度對雷射功率的關係, 最後將二硫化鉬薄膜利用氧
電漿進行摻雜反應, 同時進行光感測實驗, 發現經摻雜後, 可以得到較好的光電
流值, 主要是經摻雜後, 可改變接面的位障, 以及增加貢多的表面缺陷以及陷阱
態, 進而提升光感測效益, 由此結果可以發現利用二硫化鉬製成新元件與應用.
The theme of this thesis is focused on the preparation and application of molybdenum disulfide (MoS2) film at the atomic layer. MoS2 thin films were deposited by chemical vapor deposition (CVD) method on the quartz and sapphire substrates. After the MoS2
thin film was synthesized, the morphology and film continuity of the substrate were analyzed by optical microscopy. Raman scattering was used to analyze the atomic vibration mode of the MoS2 thin film. The atom force microscopy (AFM) showed the epitaxial thickness are atomic layer. Optical properties of near-band-edge emission of MoS2 thin film using photoluminescence (PL) measurements in the temperature range between 12 K and 300 K. Bound exciton has been observed at low temperature. On the other hand, transmittance experiment observed free A exciton and free B exciton which are caused by electron spin splitting. At the application of MoS2 thin film, we used MoS2 to fabricate field effect transistor (FET) channel and photodetector. Beside, we studied of the optoelectronic structure for the MoS2 thin film and we made into photoconductive detectors. Finally, the oxygen plasma treatment was used to induce oxygen atoms into the MoS2. The better optoelectronic characteristics due to the plasma treatment doped MoS2. The tunneling current increases exponentially with doping concentration. By applying our fabricating method, the MoS2 thin film provides a new application of semiconductor device.
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