本研究之目的為設計研發依商用拋光墊溝槽及其經過磨耗後之尺寸PDMS材料翻模複製的透明溝槽，並與玻璃黏合為一體之觀測模型，經過相似性轉換計算後利用粒子影像測速法(Particle Image Velocimetry, PIV)觀測螢光微粒在透明溝槽模型中的運動狀況，最後進行Glass-CMP驗證分析結果。本研究期望能解決在CMP製程中，因為晶圓與拋光墊之間視野狹小且材料不透明材質，導致若想在製程中瞭解拋光液中的磨粒在不同製程參數下對製程效益的影響非常困難之難題。本研究可分為三部分：先以微銑床在壓克力上銑削寬度520 μm，高度分別為400 μm、260 μm及120 μm之尺寸，再以PDMS翻模複製並打氧電漿使其與玻璃黏合完成透明溝槽模型製備，分別對透明溝槽模型進行尺寸量測與拋光墊及玻璃晶圓之折合模數、硬度、接觸角量測。第二部分先以相似性轉換計算注入流量再以PIV法觀測螢光微粒在不同溝槽深度及不同轉速參數下運動情形，分析結果注入速度與溝深影響對微粒速度及渦度有正相關，並能夠觀測到十字溝槽中微粒從進注口流入，經過轉角處加速的情形。最後進行Glass-CMP驗證實驗中得到晶圓之材料移除率與PIV觀測微粒運動結果之最大速度、渦度場呈現0.96與0.93極高度相關。

This study aims to develop a PDMS transparent groove model based on the commercial polishing pad groove and the changes of its depth, which is bonded to glass. After calculating the parameter based on the similarity transformation, particle image velocimetry (PIV) is used to observe the movement of the particles in the transparent groove model. Finally, the Glass-CMP is conducted to verify the results of the analysis. Due to the small gap between the wafer and the polishing pad as well as the opacity of the polishing pad, it is difficult to observe how the abrasives in the slurry affect the efficiency of the process under different CMP parameters. The study is conducted in three phases. Firstly, acrylic sheets are milled by a micro-milling machine into the width of 520 μm and the height of 400 μm, 260 μm, and 120 μm, respectively. PDMS is used to manufacture the transparent groove model, and oxygen plasma is then used to bond the model to glass. The dimensions of the transparent groove model are measured, as well as the reduce modulus, hardness, and contact angle of polishing pad and glass wafer. Secondly, the quantity of the fluorescent agent injected is calculated based on the similarity transformation, and the movement of the fluorescent particles in pad grooves with different depths and under different rotation parameters is observed by PIV. The results show that injection velocity and groove depth are highly correlated with particle velocity and vorticity, and that in the cross grooves, the flow of the particles is accelerated at the corners. Finally, the Glass-CMP verification experiment demonstrates that the material removal rate is positively correlated with the velocity magnitude and vorticity field of the particle movement observed by PIV have 0.96 and 0.93 highly correlated.

[1] B. B. Bakir, C. Sciancalepore, A. Descos, H. Duprez, D. Bordel, L. Sanchez, et al., "Heterogeneously integrated III-V on silicon lasers," ECS Transactions, vol. 64, p. 211, 2014.
[2] M. Quirk and J. Serda, Semiconductor manufacturing technology vol. 1: Prentice Hall Upper Saddle River, NJ, 2001.
[3] T. K. Doy, K. Seshimo, K. Suzuki, A. Philipossian, and M. Kinoshita, "Impact of novel pad groove designs on removal rate and uniformity of dielectric and copper CMP," Journal of the Electrochemical Society, vol. 151, p. G196, 2004.
[4] A. J. Smits, Flow visualization: techniques and examples: World Scientific, 2012.
[5] 林昱銘, "電致動力輔助化學機械平坦化加工之雙向交錯式電極開發應用於矽導微孔晶圓研究," 碩士, 機械工程系, 國立臺灣科技大學, 2017.
[6] S. Shinohara, A. Mochizuki, H. Yoshida, and M. Sumi, "Laser Doppler velocimeter using the self-mixing effect of a semiconductor laser diode," Applied Optics, vol. 25, pp. 1417-1419, 1986.
[7] M. Raffel, C. E. Willert, F. Scarano, C. J. Kähler, S. T. Wereley, and J. Kompenhans, Particle image velocimetry: a practical guide: Springer, 2018.
[8] J. W. Gregory, H. Sakaue, T. Liu, and J. P. Sullivan, "Fast pressure-sensitive paint for flow and acoustic diagnostics," Annual Review of Fluid Mechanics, vol. 46, pp. 303-330, 2014.
[9] J. Coppeta, C. Rogers, A. Philipossian, and F. Kaufman, "Characterizing slurry flow during CMP using laser induced fluorescence," in Second International Chemical Mechanical Polish Planarization for ULSI Multilevel Interconnection Conference, Santa Clara, CA, 1997.
[10] 陳逸翔, "以流場可視化方法探討化學機械拋光製程中 拋光液流動行為與濃度分佈," 碩士, 機械工程系, 國立臺灣科技大學, 2018.
[11] 王子軒, "探討化學機械拋光製程中機台參數對拋光液濃度分佈之影響," 碩士, 機械工程系, 國立臺灣科技大學, 2019.
[12] P. Khajornrungruang, K. Kimura, R. Yui, N. Wada, and K. Suzuki, "Slurry Supplying Method for Large Quartz Glass Substrate Polishing," Japanese Journal of Applied Physics, vol. 50, p. 05EC03, 2011.
[13] T. Yamazaki, T. K. Doi, M. Uneda, S. Kurokawa, O. Ohnishi, K. Seshimo, et al., "Effect of groove pattern of chemical mechanical polishing pad on slurry flow behavior," Japanese Journal of Applied Physics, vol. 51, p. 05EF03, 2012.
[14] Y. Li, J. Wang, Q. Xu, W. Yang, and Y. Guo, "Effects of velocity and pressure distributions on material removal rate in polishing process," in 4th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 2009, p. 72820G.
[15] N. Belkhir, T. Aliouane, and D. Bouzid, "Correlation between contact surface and friction during the optical glass polishing," Applied Surface Science, vol. 288, pp. 208-214, 2014.
[16] 郭尚儒, "電致動力輔助化學機械平坦化製程應用於玻璃穿孔晶圓平坦化研究," 碩士, 機械工程系, 國立臺灣科技大學, 2015.
[17] Y. Nakayama, Introduction to fluid mechanics: Butterworth-Heinemann, 2018.
[18] F. Durst, Fluid mechanics: an introduction to the theory of fluid flows: Springer Science & Business Media, 2008.
[19] 傅彥綺, "拋光墊線上量測系統於修整性能分析與銅化學機械拋光之相關性研究," 碩士, 機械工程系, 國立臺灣科技大學, 2016.
[20] 廖偉程, "動態量測拋光墊系統於修整性能與銅膜晶圓化學機械平坦化之相關性研究," 碩士, 機械工程系, 國立臺灣科技大學, 2019.
[21] S. D. Minteer, Microfluidic techniques: reviews and protocols vol. 321: Springer Science & Business Media, 2006.
[22] A. Mata, A. J. Fleischman, and S. Roy, "Characterization of polydimethylsiloxane (PDMS) properties for biomedical micro/nanosystems," Biomedical microdevices, vol. 7, pp. 281-293, 2005.
[23] D. C. Duffy, J. C. McDonald, O. J. Schueller, and G. M. Whitesides, "Rapid prototyping of microfluidic systems in poly (dimethylsiloxane)," Analytical chemistry, vol. 70, pp. 4974-4984, 1998.
[24] J. C. McDonald, D. C. Duffy, J. R. Anderson, D. T. Chiu, H. Wu, O. J. Schueller, et al., "Fabrication of microfluidic systems in poly (dimethylsiloxane)," ELECTROPHORESIS: An International Journal, vol. 21, pp. 27-40, 2000.
[25] C. W. Beh, W. Zhou, and T.-H. Wang, "PDMS–glass bonding using grafted polymeric adhesive–alternative process flow for compatibility with patterned biological molecules," Lab on a Chip, vol. 12, pp. 4120-4127, 2012.
[26] S. Prion and K. A. Haerling, "Making sense of methods and measurement: Pearson product-moment correlation coefficient," Clinical simulation in nursing, vol. 11, pp. 587-588, 2014.
[27] 蔡明城, "開發線上監控量測方法與系統應用於拋光墊性能水準分析之研究," 碩士, 機械工程系, 國立臺灣科技大學, 2015.
[28] 蕭百成, "銅化學機械平坦化之軟拋光墊性能指標分析研究," 碩士, 機械工程系, 國立臺灣科技大學, 2018.