本論文針對複合功能轉印設備開發為主軸，並研究其熱壓轉印、紫外光固化轉印、氣體輔助轉印等製程。所開發之複合功能轉印設備提供一個穩定、高精度、大面積微奈米結構轉印之平台。
熱壓轉印製程中，藉由保壓模具之鎖模機構提供高穩定性的微結構轉印製程，使塑料填充模穴後，於冷卻階段仍能保有穩定的壓力，能於轉印Cu模與Ni模之V-cut微結構有99%之轉寫率，轉印金字塔微結構導光板時能達到98.2%轉寫率，轉印12吋大面積微透鏡導光板時能具有大面積轉寫率達94.7%。氣體輔助轉印製程中，成功於玻璃基版上轉印hydrogen silsesquioxane (HSQ)之材料，其奈米級轉寫結構具有低於5%之反射率。本研究應用複合功能機台能成功開發微結構光學元件製作技術，預期能運用於大面積抗反射結構、微透鏡陣列等光學元件製作。

Nanoimprint lithography (NIL) is a high throughput and high-resolution patterning method. This study is devoted to develop hybrid function imprinting machine and process. The functions includes hot embossing, ultraviolet-curing (UV-curing), and gas-assisted imprint. In addition, we intend to develop an effective fabrication process for large area microstructures.
In hot embossing experiments, we applied a synchronous method with a special designed packing device to achieve a fast nano/micro structure imprinting process with high transfer rate. In gas-assisted imprinting experiments, nano anti-reflection structures were successfully imprinted on bare glasses with hydrogen silsesquioxane (HSQ). The reflective ratio of the structures is below 5% after baking process. Nano and micro optical structures were successfully fabricated in this work with the developed hybrid function imprinting machine. It shows the potential of fabricating large area optical applications with the developed machine and process, such as reflective structures and micro lens array.

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