微/奈米轉印技術是目前被廣泛注目的新興技術。因其具奈米尺度的解析度、成形三維結構的能力及高生產效率等優點，被認可能成為新世代大量生產微奈米結構及其應用的新製造技術。但由於其熱壓轉印製程流程包括加熱、加壓與冷卻，造成製程時間仍過長，還需要改善製程以縮短製程時間，才能達到高效能量產的需求。
本研究延續本實驗室之前開發之快速熱壓轉印製程，利用理論模擬探討在預熱、加壓、保壓及降溫等製程階段，實驗參數的影響及模穴填充過程，以進一步縮短製程之時間。本研究使用商用Computational fluid dynamics (CFD)，以有限元素法(Finite element method, FEM)建立一2D對稱之模型，模擬其填充行為，並以牛頓流體簡化高分子材料於微/奈米轉印製程的流動行為，以分段等溫的方式描述非等溫製程條件；其中模擬預測與實驗量測得到相符的趨勢。
根據模擬的結果，並以實驗加以驗証，當製程以150℃為轉印溫度、105℃為脫模溫度，其結果可達94%的填充率並可縮短一半的製程時間(約為120秒)。本研究結果將有助於未來微/奈米轉印技術的應用。

Micro/nano imprint technology is a commonly expected technique nowadays. It is very promising in the future because the technology has several advantages, such as having nano-scale resolution, forming three dimension structures and high throughput. This technology may be used to create the micro/nano structure for the next generation.However, a few steps of the whole process take a long time, including heating, pressing, and cooling. Only if the time for the process is reduced can the need for efficient mass-production be met.
This is a study followed by previous research on “continuous sub-station synchronization process”, which is supplemented by a specially designed “holding pressure device”. In addition, this research also uses a theoretical simulation and improves the process and the parameters of the simulation results, so that it can shorten the time for the process. This study, based on the finite element method, uses commercial computational fluid dynamics software to create a 2D axis-symmetry model in order to simulate the filling behavior. Moreover, the Newtonian fluid is used to simplify the flowing pattern of the polymer materials in micro/nano imprint process, and the method of segmented isothermal is used to describe the non-isothermal process, so that the results of the present simulation can match with those of previous research.
According to the results of the simulation along with another experiment added to it, when 150 Celsius degree is used as the transferring temperature and 105 Celsius degree is used as de-molding temperature, that filling rate can reach up to 94% and reduce half of the time spent in process (around 120 seconds), which can be helpful with the micro/nano imprint application in the future.

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