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研究生: 陳建維
Chien-Wei Chen
論文名稱: 高溫熱處理之PCS鍍膜氧化矽奈米線結構暨光學與場發射特性分析
Analyses of PCS-coated silica nanowires heated in high temperature and their optical and field emission properties
指導教授: 周賢鎧
Shyankay Jou
口試委員: 胡毅
Yi Hu
鄭偉鈞
Wei-Chun Cheng
學位類別: 碩士
Master
系所名稱: 工程學院 - 材料科學與工程系
Department of Materials Science and Engineering
論文出版年: 2009
畢業學年度: 97
語文別: 中文
論文頁數: 77
中文關鍵詞: 碳化矽奈米線
外文關鍵詞: PCS
相關次數: 點閱:195下載:2
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本論文的研究內容可以分成三個階段來探討,第一階段是利用SLS機制直接於矽基材上成長矽奈米線,實驗採用金顆粒作為催化劑,並使用石英管爐通入氫氬混合氣後加熱至850 ℃以上來成長矽奈米線,並改變溫度與持溫時間來控制奈米線長度,成長出的奈米線為氧化矽奈米線,最短可以小於100 nm。
  第二階段是在第一階段成長出的奈米線試片上添加配製好的PCS溶液,再使用石英管爐進行熱處理成長碳化矽包覆層,並分析探討各種實驗參數如PCS濃度、熱處理條件、通入氣氛對生成物的影響,我們發現通入純氬氣或氫氬混合氣會對生成的奈米線外觀造成極大的差異,生成的分別是碳化矽膜包覆氧化矽奈米線與Si-O-C奈米線。
  最後則是對製成的樣品進行場發射與PL發光量測。當使用較長且高密度的碳化矽包覆氧化矽奈米線基材,可以得到4.7 V/μm的場發射起始電壓,而同一條件試片在PL量測時會發出波長在520 nm的綠光。


This study is divided into three parts. In the first step we used SLS (Solid-Liquid-Solid) mechanism to grow silicon nanowires directly on Si substrate with gold particles as catalyst. Nanowires could be fabricated while passing mixed argon and hydrogen gases through a quratz tube been heated upon 850 ℃. We produced the nanowires with different lengths by changing the process temperatures and times. The nanowires which we grew up were composed of silica, and the length could be controlled under 100 nm.
In the second part PCS solution was applied to the silica nanowires substrate prepared from step one, and then heated in the quartz tube. It was noticed that many factors, like PCS concentration or heat treatment parameter, would affect the product’s conformation and character. Using pure argon or hydrogen mixed gas as heating atmosphere would make the SiC nanowires different much more with morphologies.
At last we proceeded measurements of nanowires’ optical and field emission properties. It showed that the lowest turn-on field of 4.7 V/μm was observed from SiC thin film coated silica nanowires. This specimen emitted green light at 520 nm by PL, in addition.

中文摘要…………………………………………………………………………….....I 英文摘要……………………………………………………………………………...II 目錄…………………………………………………………………………………. IV 表目錄………………………………………………………………………………VII 圖目錄……………………………………………………………………………......IX 第一章 前言…………………………………………………………………………1 第二章 實驗原理與文獻回顧………………………………………………………2 2.1 矽奈米線的製備方法與成長機制……………………………………………….2 2.1.1 金屬催化劑的製備………………………………………………………..3 2.1.2 化學氣相沉積CVD(Chemical Vapor Deposition) ……………………….6 2.1.3 蒸鍍(evaporate) …………………………………………………………...9 2.1.4 蝕刻(etching) ……………………………………………………………10 2.1.5 熱退火(Annealing) ………………………………………………………12 2.2 生成碳化矽的方法與原理……………………………………………………...14 2.2.1 碳熱還原…………………………………………………………………15 2.2.2 熱裂解……………………………………………………………………16 第三章 實驗方法與步驟…………………………………………………………..22 3.1 實驗耗材簡介…………………………………………………………………...22 3.2 實驗儀器簡介…………………………………………………………………...23 3.3 實驗流程…………………………………………………………………...........25 3.3.1 矽基材清洗………………………………………………………………25 3.3.2 成長矽奈米線……………………………………………………………26 3.3.3 成長碳化矽奈米線………………………………………………………28 第四章 結果與討論………………………………………………………………..30 4.1 矽或氧化矽奈米線的成長控制………………………………………………...30 4.1.1 合適的金觸媒條件與氣體流量…………………………………………30 4.1.2 矽或氧化矽奈米線成長溫度…………………………………………....33 4.1.3 矽或氧化矽奈米線成長時間…………………………………………....35 4.1.4 矽或氧化矽奈米線之結構與成份分析…………………………………37 4.2 碳化矽奈米線的製備……………………………………………………...........39 4.2.1 PCS溶液濃度控制…………………………………………………….....39 4.2.2 PCS熱處理溫度…………………………………………………….........44 4.2.3 持溫時間……………………………………………………....................47 4.2.4 熱處理氣氛………………………………………………........................49 4.2.5 氫氬混合氣氣氛成長碳化矽奈米線的成分結構分析…………………52 4.2.6 氬氣氣氛成長碳化矽奈米線的成分結構分析…………………………56 4.3 場發射量測………………………………………………...................................59 4.4 發光性質量測………………………………………………...............................67 第五章 結論………………………………………………......................................71 References………………………………………………............................................73

[1] Y. Yang, G. Meng, X. Liu, L. Zhang, Z. Hu, C. He, and Y. Hu, “Aligned SiC
Porous Nanowire Arrays with Excellent Field Emission Properties Converted
from Si Nanowires on Silicon Wafer” THE JOURNAL OF PHYSICAL
CHEMISTRY C 112, 20126-20130(2008).

[2] D. P. Yu, Q. L. Hang, Y. Ding, H. Z. Zhang, Z. G. Bai, J. J. Wang, Y. H. Zou,
W. Qian, G. C. Xiong, and S. Q. Feng, “Amorphous silica nanowires:
Intensive blue light emitters” APPLIED PHYSICS LETTERS 73, 3076-3078
(1998).

[3] F. Gao, W. Yang, H. Wang,§ Yi Fan, Z. Xie,§ and L. An*, “Controlled
Al-Doped Single-Crystalline 6H-SiC Nanowires ”CRYSTAL GROWTH &
DESIGN 8, 1461–1464(2008).

[4] G. Wei, W. Qin, G. Wang, J. Sun, J. Lin, R. Kim, D. Zhang and K. Zheng, “The
synthesis and ultraviolet photoluminescence of 6H–SiC nanowires by microwave
method” JOURNAL OF PHYSICS D: APPLIED PHYSICS 41, 235102(2008).

[5] S. C. Chiu, Y. Y. Li, “SiC nanowires in large quantities: Synthesis, band gap
characterization, and photoluminescence properties” JOURNAL OF CRYSTAL
GROWTH 311, 1036–1041(2009).

[6] Q. Wei, G. Meng, X. An, Y. Hao, L. Zhang, “Synthesis and photoluminescence
of aligned straight silica nanowires on Si substrate” SOLID STATE
COMMUNICATIONS 138, 325–330(2006).

[7] S. H. Lin, L. P. Hwang, Y. T. Chen, “Size effect in self-trapped exciton
photoluminescence from SiO2-based nanoscale materials” PHYSICAL
REVIEW B 64, 085421(2001).

[8] K. Senthil, K. Yong, “Enhanced field emission from density-controlled SiC
nanowires” MATERIALS CHEMISTRY AND PHYSICS 112, 88–93(2008).

[9] S. K. Jou, C. K. Hsu, “Preparation of carbon nanotubes from vacuum pyrolysis
of Polycarbosilane” MATERIALS SCIENCE AND ENGINEERING B 106,
275–281(2004).
[10] J. C. She, S. Z. Deng, N. S. Xu, R. H. Yao, J. Chen, “Fabrication of vertically
aligned Si nanowires and their application in a gated field emission device”
APPLIED PHYSICS LETTERS 88, 013112(2006).

[11] G. Y. Xiong, S. Chen, S. H. Jo, W. Z. Wang, D. Z. Wang, and Z. F. Rena,c,
“Field emission of silicon nanowires” APPLIED PHYSICS LETTERS 88,
213108(2006).

[12] Y. M. Liu, S. S. Fan, “Field emission properties of carbon nanotubes grown on
silicon nanowire arrays” SOLID STATE COMMUNICATIONS 133,
131–134(2005).

[13] C. Lia, G. J. Fanga, S. G.Su, Z. Q. Chen, J. B. Wang, S. Ma, X. Z. Zhao, “Raman spectroscopy and field electron emission properties of aligned silicon
nanowire arrays” PHYSICA E 30, 169–173(2005).

[14] S. Jou, C. T. Sun, X. Chen, “Silicon carbide films from polycarbosilane and
their usage as buffer layers for diamond deposition” DIAMOND & RELATED
MATERIALS 14, 1688 – 1694(2005).

[15] J. Westwater, D. P. Gosain, S. Tomiya, S. Usui, “Growth of silicon nanowires
via gold/silane vapor–liquid–solid reaction” JOURNAL OF VACUUM
SCIENCE TECHNOLOGY B 15, 554-557(1997).

[16] Z. R. Yu, A. M. Mariano, L. L´. A, J. H. Du, D. C. Bian, “Formation of silicon
nanoislands on crystalline silicon substrates by thermal annealing of silicon rich
oxide deposited by low pressure chemical vapour deposition”
NANOTECHNOLOGY 17, 4962–4965(2006).

[17] J. Albuschies, M. Baus, O. Winkler, B. Hadam, B. Spangenberg, H. Kurz ,
“High-density silicon nanowire growth from self-assembled Au nanoparticles”
MICROELECTRONIC ENGINEERING 83, 1530–1533(2006).

[18] G. S. Huang, X. L. Wu, Y. C. Cheng, X. F. Li, S. H. Luo, T. Feng, Paul K. Chu, “Fabrication and field emission property of a Si nanotip array” NANOTECHNOLOGY 17, 5573–5576(2006).

[19] Q. Wana, T.H. Wang, C.L. Lin, “Self-assembled Au–Si alloy nanocones: synthesis and electron field emission characteristics” APPLIED SURFACE
SCIENCE 221, 38–42(2004).

[20] J. F. Zhou, Z. L. Li, Y. F. Chen, G. H. Wang, M. Han, “Large-scale array of highly oriented silicon-rich micro/nanowires induced by gas flow steering” SOLID STATE COMMUNICATIONS 133, 271–275(2005).

[21] Y. F. Tzeng, C. Y. Lee, H. T. Chiu, N. H. Tai , I. N. Lin, “Electron field
emission properties on ultra-nano-crystalline diamond coated silicon nanowires” DIAMOND & RELATED MATERIALS 17, 1817–1820(2008).

[22] J. Shieh, C. H. Lin, M. C. Yang, “Plasma nanofabrications and antireflection
applications” JOURNAL OF PHYSICS D: APPLIED PHYSICS 40,
2242–2246(2007).

[23] K. Q. Peng, Y. J. Yan, S. P. Gao, J. Zhu, “Dendrite-Assisted Growth of Silicon
Nanowires in Electroless Metal Deposition” ADVANCED FUNCTIONAL
MATERIALS 13, 127-132(2003).
.
[24] D. P. Yua, Y. J. Xing, Q. L. Hanga, H. F. Yana, J. Xua, Z. H. Xib, S. Q. Feng,
“Controlled growth of oriented amorphous silicon nanowires via a Solid-liquid-solid (SLS) mechanism” PHYSICA E 9, 305-309(2001).

[25] Y. Y. Wong, M. Yahaya, M. M. Salleh, B. Y. Majlis, “Controlled growth of
silicon nanowires synthesized via solid–liquid–solid mechanism” SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS 6, 330–334(2005).

[26] H. K. Park, B. Y. Yang, S. W. Kim, G. H. Kim, D. H. Youn, S. H. Kim, S. L.
Maeng, “Formation of silicon oxide nanowires directly from Au/Si and
Pd–Au/Si substrates” PHYSICA E 37, 158–162(2007).

[27] 彭展崢,「使用濺鍍法成長矽奈米結構」,碩士論文,國立台灣
科技大學(1997)。

[28] William D. Callister, Jr. Materials Science And Engineering:An Introduction,
7th Asia student edition, Wiley, NY, USA.

[29] M. Takeda, A. Saeki, J. Sakamoto, Y. Imai, H. Ichikawa, “Effect of Hydrogen
Atmosphere on Pyrolysis of Cured Polycarbosilane Fibers” JOURNAL OF
THE AMERICAN CERAMIC SOCIETY 83, 1063-69(2000).

[30] T. E. Paulson, C. G. Pantano, “Synthesis of Silicon Carbide Thin Films with
Polycarbosilane (PCS)” JOURNAL OF THE AMERICAN CERAMIC
SOCIETY 80, 2333-40(1997).

[31] Y. Coffinier, S. Janel, A. Addad, R, Blossey, L. Gengembre, E. Payen, R.
Boukherroub, “Preparation of Superhydrophobic Silicon Oxide Nanowire
Surfaces” LANGMUIR 23, 1608-1611(2007).

[32] X. Chen, Y. Xing, J. Xu, J. Xiang, D. Yu “Rational growth of highly
oriented amorphous silicon nanowire films” CHEMICAL PHYSICS LETTERS
374, 626-630(2003).

[33] J. B. Chang , J. Z. Liu, P. X. Yan, L. F. Bai, Z.J. Yan, X. M. Yuan, Q. Yang,
“Ultrafast growth of single-crystalline Si nanowires” MATERIAL LETTERS
60, 2125-2128(2006).

[34] 周賢鎧,「多孔性與楔形微晶鑽石複合薄膜之合成」,行政院國家科學委
員會補助專題研究計畫成果報告(NSC89-2215-E011-001),臺北,臺灣
(2000)。

[35] S. M. SZE, KWOK K. NG, PHYSICS OF SEMICNDUCTOR DEVICES,
3rd edition,WILEY INTERSCIENCE, p.790-791(2007).

[36] 李志煌,「二氧化矽奈米線氣體感測應用之研究」,碩士論文,國立雲林
科技大學電子工程研究所(2007)。

[37] T. V. Blank, Y. A. Goldberg, E. V. Kalinina, O. V. Konstantinov, A. O.
Konstantinov, A. Hall´en, “Temperature dependence of the photoelectric conversion quantum efficiency of 4H–SiC Schottky UV photodetectors”
SEMICONDUCTOR SCIENCE AND TECHNOLOGY 20, 710–715(2005).

[38] G. Y. Xiong, S. Chen, S. H. Jo, W. Z. Wang, D. Z. Wang, Z. F. Ren, “Field
emission of silicon nanowires” APPLIED PHYSICS LETTERS 88,
213108(2006).

[39] A. R. Guichard, M. L. Brongersma, T. Kamins, S. Sharma, “Light emitting
silicon nanowires for photonic device applications” GROUP IV PHOTONICS, 3rd IEEE INTERNATIONAL CONFERENCE ON, 137-139(2006).

[40] J. Qi, J. M. White, A. M. Belcher, Y. Masumoto, “Optical spectroscopy of
silicon nanowires” CHEMICAL PHYSICS LETTERS 372, 763–766(2003).

[41] J. Botsoa, J. M. Bluet, V. Lysenko, O. Marty, D. Barbier, G. Guillot, “Photoluminescence of 6H–SiC nanostructures fabricated by electrochemical
etching” JOURNAL OF APPLIED PHYSICS 102, 083526(2007).

[42] R. P. Elliott, F. A. Shunk, Bulletin of Alloy Phase Diagrams, Material Park
Ohio : ASM INTERNATIONAL 2, 359(1990).

[43] X. B. Zeng, Y. Y. Xu, S. B. Zhang, Z. H. Hu, H. W. Diao, Y. Q. Wang, G. L.
Kong, X.B. Liao, “Silicon nanowires grown on a pre-annealed Si substrate”
JOURNAL OF CRYSTAL GROWTH 247, 13–16(2003).

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