研究生: |
王怡婷 Yi-Ting Wang |
---|---|
論文名稱: |
紫外線臭氧處理及熱退火氧化石墨烯之氨氣感測器 Graphene Oxide by UV/Ozone Treatment and Thermal Annealing for Ammonia Gas Sensing |
指導教授: |
周賢鎧
Shyankay Jou |
口試委員: |
蔡孟霖
Meng-Lin Tsai 胡毅 Hu Yi |
學位類別: |
碩士 Master |
系所名稱: |
工程學院 - 材料科學與工程系 Department of Materials Science and Engineering |
論文出版年: | 2020 |
畢業學年度: | 108 |
語文別: | 中文 |
論文頁數: | 140 |
中文關鍵詞: | 石墨烯 、UV/Ozone 、熱退火 、氨氣感測器 、蕭特基元件 |
外文關鍵詞: | graphene, UV/Ozone, thermal anneal, ammonia gas sensor, Schottky device |
相關次數: | 點閱:581 下載:1 |
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石墨烯僅有原子級的厚度且不佔有體積,比表面能相當高,屬於半導體材料及具有極高的載子遷移率,氣體吸附的電荷轉移靈敏度高,對於製作成元件同時兼具傳輸層與感測層的特殊性質,對於各種分子的吸附具有相當的優勢。
本研究以化學氣相沉積法合成雙層石墨烯,為了增加缺陷對於吸附氣體的響應度提高,經過UV/Ozone處理改質表面,增加含氧官能基幫助捕捉氣體分子,得到氧化石墨烯製成蕭特基元件。另外,也將其做200 ℃低溫氬氣之熱退火處理,得到還原氧化石墨烯,與原石墨烯進行響應度比較,然而由XPS分析得知氧原子比例增加,並無達成還原效果。
量測環境分為乾燥空氣與濕空氣,在乾空氣中經過UVO處理10分鐘,對於50 ppm氨氣的響應度可達14.41 %,比原石墨烯的響應度7.72 %高;而退火後,響應度整體下降,其中UVO 1分鐘與3分鐘的響應度增加,可能是適量的氧摻雜退火後形成蝕刻坑造成。濕空氣下的響應效果,與乾燥空氣相比較差,因為氧官能基對水的吸附性強,從250 ppm高濃度氨氣測量至50 ppm低濃度時,已經吸附大量的水分子,影響對氨氣響應度的表現。在RH 30 %低濕度條件下,經過退火處理的氧化石墨烯,響應效果較佳;而在RH 70 %高濕度條件下,則因為吸附過量水氣,對於50 ppm氨氣已無響應。
Graphene is a two-dimensional monolayer of sp2-bonded carbon atoms. Because of its high specific surface area and excellent charge mobility, graphene can be used for gas sensors.
In this work, bi-layer graphene is grown by chemical vapor deposition process. To enhance the response of gas sensing, using UV/Ozone treatment was used to modify the surface of graphene to increase defects including active oxygen functional groups and vacancies, which can efficiently act as adsorption sites for detected gas molecules. The ozone treated graphene is similar to graphene oxide (GO). Additionally, the graphene oxide with low-temperature 200°C annealing in argon was expected to become reduce graphene oxide (RGO). Nevertheless, the graphene oxide hasn’t been reduced after annealing. The atomic ratio of carbon to oxygen increases from X-ray photoelectron spectroscopy.
Two kinds of material are fabricated Schottky devices to compare with PG ammonia gas response. The response is about 14.41 % for UVO treated 10 min Schottky device, which is higher than PG of about 7.74 % to 50 ppm NH3 in dry air ambience. After annealing at 200℃ in argon gas, all responses are decreased. However, the responses of UVO treated 1 min and 3 min devices rise. Because of doping appropriate oxygen and annealing, O2 etch pits are formed. In contrast to the dry air environment, the responses are weaker in humidity air. Oxygen functional groups easily interact with H2O. This phenomenon will affect NH3 gas sensing after long time exposure. The performance of annealed graphene oxide is better than without annealed one to 50 ppm concentration in RH 30 %. When the humidity rises to RH 70 %, the device responses to 50 ppm NH3 no longer.
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