本論文是利用反應式射頻磁控濺鍍系統 (Reactive radio-frequency magnetron sputtering : RFMS) 沉積氧化釕於石墨烯上，並使用場發射電子顯微鏡 (Field emission scanning electron microscope : FE-SEM)、拉曼光譜儀 (Raman scattering system)、X 光繞射分析儀 (X-ray diffraction : XRD)、X 光光電子能譜儀 (X-ray photoelectron spectrometer : XPS)，探討複合結構之特性，進而研究循環伏安圖，充放電行為及交流阻抗的電化學電容應用。
將二氧化釕濺鍍於已沉積石墨烯的銅網基板上證明石墨烯在反應式射頻磁控濺鍍系統製程過程中不會與通入的氧氣結合而造成破壞。第二部份將石墨烯轉移到Eagle 2000基板上並沉積氧化釕，改變氧化釕成長溫度，結果可從拉曼譜線得知Eg半高寬隨著成長溫度的上升而變窄，此與氧化釕奈米結構尺寸有關。從X 光繞射圖譜得知在低溫下沉積的氧化釕並沒有明顯的繞射峰出現，直到成長溫度為150oC時，有 [110] 及 [101] 面的微弱訊號出現，升高溫度到達200oC時可觀察到 [110] 及 [101] 面訊號變強，且半高寬變窄，此外還偵測到 [111]、[211] 及 [112] 面訊號。樣品的表面形貌可由場發射電子顯微鏡結果得知，隨著成長溫度的上升，其形貌從非晶態薄膜狀轉變為管狀結構。定性與定量分析部份由X 光光電子能譜儀得到，其元素組成大約為Ru : O為 1 : 2。
接下來固定氧化釕的成長溫度在室溫，並使用快速熱退火爐 (Rapid thermal annealing : RTA) 退火。從拉曼譜線可觀察到As-deposited 的拉曼位移在400 cm-1 以前有一微弱訊號，根據文獻所知此來源可能為含水的二氧化釕特徵峰訊號，半高寬及紅位移現象都與奈米結構的特性和組成有關。退火過後的表面形貌可由場發射電子顯微鏡得知，退火後的晶粒大小約20 nm ~ 80 nm。由X 光繞射圖譜可以觀察到在退火溫度增加到400oC時出現 [110] 面的微弱訊號，退火溫度升高到500oC時 [110] 面訊號變強，此外還偵測到 [101] 面訊號。定性與定量分析部份由X 光光電子能譜儀得知，隨著退火溫度的上升，O 1s 的訊號越強，其元素組成大約為Ru : O為1 : 2。
此外，對氧化釕/石墨烯複合結構做電化學電容應用。由循環伏安結果得知，隨著氧化釕成長溫度的降低，將石墨烯的比電容值從2 Fg-1 提升至246.1 Fg-1。恆電流充放電實驗中，退火前的氧化釕/石墨烯樣品在經過1000次的循環後，已經完全失去電容效應，無法繼續儲存電容。經過退火過後的結果我們可由循環伏安圖得知，退火200oC下的比電容值 (203.1 Fg-1) 比退火前下降約9%，但經過充放電循環1000次後，所算出的比電容值約197.2 Fg-1 ~ 203.2 Fg-1，依然保有儲存電容的能力，呈現穩定的狀態。綜合以上結果可以歸納出在室溫下沉積氧化釕，並退火200oC，2分鐘，所製備的氧化釕/石墨烯複合結構樣品，可以展現高比電容值及良好的穩定性，因此這對電化學電容的應用是具有相當大的效用。

Ruthenium oxide with various growth and anneal temperatures were deposited on graphene templates to form RuO/grapheme nanocomposites by reactive radio frequency magnetron sputtering using a Ru metal target. The graphene templates were synthesized on Eagle 2000 and copper screen substrates using floating thermal chemical vapor deposition technique. The detailed characterization focusing on the surface morphology, structural and spectroscopic properties of the RuO/graphene nanocomposites were using field-emission scanning electron microscopy (FESEM), Raman spectroscopy, X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS). The electrochemical capacitor characteristics were also studied.
FESEM micrographs of ruthenium oxide with different growth temperatures , showed that the surface morphology of the as-deposited ruthenium oxide varied from film to tube-like. After annealing with different temperatures, the grain size of the as-deposited ruthenium oxide of small nano-particle became larger. The attribute of nanosized ruthenium oxide is further manifested by the considerable Raman line broadening. The XRD results indicated of rutile phase RuO2 after growth temperature 150oC and 200oC with peaks intensity I[101]> I [110]> I [211]。XPS analyses revealed oxygen vs. ruthenium ratio of 2:1.
The specific capacitance results from cyclic voltammetry measurement for RuO/grapheme composites reaches to value about 246.1 Fg-1,which is much larger than that of the pure grapheme (2 Fg-1). The ruthenium oxide be available for the electrochemical reactions. The progressive redox reactions occurring at the surface and faradic charge transfer between electrolyte and electrode. The long-term tests from charge/discharge demonstrated that annealing 200oC decayed slightly even after 1000 cycles at 0.1 mA. This preliminary study demonstrates the potential applications of the RuO/grapheme composites as the electrode material in electrochemical capacitors.

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