光學尺可分為穿透型與反射型兩種型式。編碼器使用發光二極體(LED)作為光源，並使用光偵測器收集訊號，將刻有光柵的線性光學尺置於LED與偵測器之間，當線性光學尺移動時，偵測器可以讀到光強訊號，輸出弦波或方波的電子訊號。
本研究以兩種不同方向開發製作週期為20μm反射式線性光學尺之技術，第一個方向是以反轉式奈米轉印技術，搭配PDMS模具以施加壓力81MPa、光阻填充模穴時間4分鐘及UV曝光時間15分鐘，進行轉印光柵結構至SK5鋼帶以製作反射式光學尺。研究並探討不同施壓壓力大小對光柵結構轉寫率之影響，及SK5鋼帶有無表面處理對於反射率及干涉光點效果之影響。第二個方向是以光纖雷射刻劃的方式在SKD11鋼片上刻劃出具有光柵結構的反射式之光學尺，並研討SKD11鋼片有無表面處理對於反射率及干涉光點效果的影響。研究結果指出最佳的光纖雷射刻劃反射式光學尺之參數為20W功率、1.5μs脈衝寬度、110kHz頻率及30mm/s進給速度。最後，本研究提出一快速雷射刻劃反射式光學尺之方法並進行初步測試。

There are two typical types of linear scale: transmissive type and reflective type. An optical encoder uses a light emitting diode (LED) as the light source and an optical sensor as the detector. A linear scale with grating structures is installed between the LED and the optical detector. The optical detector receives light intensity signal and output sin wave or square wave electric signal when the linear scale moves.
The study includes two directions to develop process for 20μm pitch reflective linear scales. The first direction is to apply reversal nanoimprint on imprinting grating structures on SK5 strips to fabricate reflective linear scales with PDMS molds and operating parameters 81MPa pressure, imprinting time 4 minutes and UV exposure time 15minutes. This work also studied the effect of imprinting pressure on the transfer rate of fabricated structures and the effect of SK5 strip surface quality on the interference pattern. The second direction is to use fiber laser to generate grating structures on SKD11 reflective linear scales. The effect of SKD11 strip surface treatment on the interference pattern was also done in this study. According to the experimental results, the best fiber laser cutting parameters are laser power 20W, pulse width 1.5μs, pulse frequency 110 kHz and feed rate 30mm/s. Finally, a new method to achieve high efficiency of reflective linear scale manufacturing was proposed and tested in this work.

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