研究生: |
彭裕傑 Yu-Jie Peng |
---|---|
論文名稱: |
階段濺鍍之氧化矽薄膜研究 SiO2 thin films deposited by the step sputtering technique |
指導教授: |
趙振綱
Ching-Kong Chao |
口試委員: |
趙振綱
黃育熙 張瑞慶 林宗鴻 |
學位類別: |
碩士 Master |
系所名稱: |
工程學院 - 機械工程系 Department of Mechanical Engineering |
論文出版年: | 2017 |
畢業學年度: | 105 |
語文別: | 中文 |
論文頁數: | 64 |
中文關鍵詞: | 氧化矽薄膜 、射頻磁控濺鍍 、附著力 、光穿透率 、水氣穿透率 |
外文關鍵詞: | silicon oxide film, RF magnetron sputtering, adhesion, light transmittance, WVTR |
相關次數: | 點閱:278 下載:2 |
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本文將利用射頻磁控濺鍍機(RF magnetron sputter)濺鍍氧化矽薄膜於可撓性基材PET上,利用單階段濺鍍技術與雙階段濺鍍技術,並改變濺鍍功率,探討其對氧化矽薄膜之表面粗糙度、表面型態、附著力、光穿透率及水氣穿透率之影響。單階段濺鍍分別以30W、40W、50W之功率製作100 nm膜厚之SiO2薄膜; 雙階段濺鍍則分別先以30W功率沉積50 nm SiO2薄膜於PET上,再以50W功率沉積50 nm SiO2薄膜於上層。另一組則是以先以50W功率沉積50 nm SiO2薄膜於PET上,再以30W功率沉積50 nm SiO2薄膜於上層。
由實驗結果顯示,較高功率(50W)下所濺鍍之SiO2薄膜,其表面粗糙度較高,且薄膜內的缺陷也較明顯,晶體與晶體間的裂縫較深、較長,造成水氣穿透率的提升。另外高功率下所鍍製的薄膜因有較大表面能,能有較好的附著力。而利用雙階段濺鍍所鍍製的SiO2薄膜,其中30W SiO2 / 50W SiO2 / PET,以高功率鍍製的薄膜作為與PET的接觸層,能增加整體薄膜的附著力;以低功率鍍製的薄膜作為最上層的表面層,能降低薄膜表面粗糙度以及提升薄膜的表面型態,且整體水氣穿透率可降低至2.358 g / m2.day,相對於PET的5.924 g / m2.day有明顯的改善,且其平均光穿透率可達85%以上。
In this paper, 100 nm silicon oxide thin films have been deposited on the flexible polyethylene terephthalate (PET) substrate by RF magnetron sputtering, using single-step and two-step sputtering technique. The influence of the surface roughness, surface pattern, adhesion, light transmittance and water vapor permeability of the silicon oxide film under different sputtering power are investigated.
Single-step sputtering uses 30W, 40W, 50W sputtering powers to produce 100 nm SiO2 films, respectively; Two-step sputtering, first group, deposits 50 nm SiO2 films with 30W sputtering power on the PET, and then deposits 50 nm SiO2 films with 50W sputtering power in the upper layer. The other group first deposits 50 nm SiO2 films with 50W sputtering power on the PET, and then deposits 50 nm SiO2 films with 30W sputtering power in the upper surface.
The results show that the surface roughness of the silicon dioxide films sputtered at high-power (50W) is higher, and the defects in the films are more obvious. The cracks in the films are deeper and longer, resulting in enhanced water vapor permeability. In addition, the high-power coated films due to the larger surface energy, can have better adhesion. And the use of two-stage sputtering of the SiO2 films, especially 30W SiO2 / 50W SiO2 / PET, with high-power coated films as PET contact layer, can increase the overall films adhesion; low-power coated films on the top layer as the surface layer can reduce the surface roughness and enhance the surface morphology, and the overall water vapor permeability can be reduced to 2.358 g / m2.day, compared to PET 5.924 g / m2.day obvious improved, and its average light penetration rate is up to 85%.
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