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研究生： 張詩典
Shih-Tien Chang
論文名稱： 以脈衝直流磁控濺鍍法鍍製氮化鉻鋯與氮化鉻鋯矽奈米複合薄膜性質評估研究
Characteristics of pulsed DC reactive magnetron sputtered nanocomposite Cr-Zr-N and Cr-Zr-Si-N thin films
指導教授： 王朝正
Chaur-Jeng Wang
口試委員: 李志偉
Jyh-Wei Lee
朱瑾
jinn P. Chu
學位類別： 碩士
Master
系所名稱： 工程學院 - 機械工程系
Department of Mechanical Engineering
論文出版年： 2010
畢業學年度： 98
語文別： 中文
論文頁數： 134
中文關鍵詞： 氮化鉻鋯矽薄膜 、氮化鉻鋯薄膜 、直流反應式磁控濺鍍儀 、奈米壓痕 、破裂韌性 、磨耗
外文關鍵詞： Cr-Zr-Si-N thin film, Cr-Zr-N thin film, pulsed DC reactive magnetron sputtering, nanoindentation, fracture toughness, wear
相關次數： 點閱：261  下載：12 
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    • 氮化鉻薄膜擁有良好的機械性質與抗氧化能力，但硬度略低於其他硬膜，實驗將鋯與矽同時加入氮化鉻薄膜中以期改善顯微結構與機械性質。研究使用反應式雙極非對稱脈衝直流磁控濺鍍法製備含鋯量自0.49 at.%到13.58 at.%範圍的五種氮化鉻鋯矽奈米複合薄膜，各薄膜在加入約5 ~ 7 at%的矽含量後，使得原本典型的氮化鉻柱狀結構與晶粒尺度趨於細緻化，同時機械性質也得到提升。硬度也由於鋯的加入而增加，薄膜鋯含量為10.42 %時達到最高硬度23.99 GPa，且隨鋯含量的增加會更進一步的使薄膜結構緻密化，刮痕試驗中顯示薄膜的臨界荷重隨鋯含量增加而下降。另外於3.5 wt.% 氯化鈉水溶液電化學腐蝕實驗中可以得知，加入矽可以薄膜提升抗蝕能力，同時也隨鋯含量增加而提升。在850 oC高溫氮化鉻鋯矽的抗高溫氧化能力隨鋯含量增加而下降，留下鬆散的氧化鉻結構。

    The chromium nitride thin film have a good mechanical properties and oxidation resistance. but the drawback is the slightly lower hardness then other hard coatings. the concept of nanocomposite thin films is employed by adding silicon and zirconium to enhanced microstructures, mechanical properties and corrosion resistance, In this study, The Cr-Zr-N and Cr-Zr-Si-N thin films with various Zr contents ranging from 0.49 at.% to 13.58 at.% were deposited by a bipolar asymmetric pulsed DC reactive magnetron sputtering system. The columnar structure and grain size refinements and the mechanical properties enhancements were observed due to the addition of 6.98 at.% Si to the Cr-Zr-N coating. A texture evolution was observed when the Zr contents of Cr-Zr-Si-N film increased. The hardness increased with increasing Zr contents in the Cr-Zr-Si-N coatings. The Cr-Zr-Si-N coatings with 10.42 at.% Zr content exhibited a combination of high hardness, based on the scratch adhesion strength test results, the adhesion properties of Cr-Zr-Si-N coatings deposited on tool steels are decreased with increasing Zr. The corrosion resistance was analyed by using the potentiostat in 3.5 wt.% NaCl aqueous solution. and the corrosion resistance of the thin films was improved as the Zr content increased. According to the oxidation tests at 850oC,after the annealing test, It is found that volume of thin film increased with increasing Zr contents, In general, the high temperature oxidation resistance of Cr-Zr-Si-N coatings decreased with increasing Zr.

    第一章 序論 1 1.1 前言 1 1.2 研究動機與目的 2 第二章 文獻回顧 3 2.1 脈衝直流磁控濺鍍系統 3 2.1.1 磁控濺鍍系統 3 2.1.2 直流式(DC)磁控濺鍍系統 5 2.1.3 反應性氣體濺鍍(Reactive Gas Sputtering) 5 2.1.4 遲滯效應 6 2.1.5 脈衝磁控濺鍍法 7 2.2 氮化鉻薄膜 9 2.2.1 氮化鉻薄膜特性 9 2.2.2 氮化鉻薄膜組成 10 2.3 氮化鉻矽與氮化鉻鋯奈米複合薄膜 12 2.3.1 氮化鋯矽奈米複合薄膜強化機制 12 2.3.2 氮化鉻鋯奈米複合薄膜強化機制 17 2.7薄膜電化學腐蝕 18 第三章 實驗方法 21 3.1 實驗流程 21 3.2 實驗方法與步驟 25 3.2.1 基材試片規格與前處理 25 3.2.2 實驗設備 27 3.2.3 鍍膜製程 28 3.3 鍍膜性質 31 3.3.1 成份分析實驗 31 3.3.2 表面與截面型態分析試驗 31 3.3.3 X光繞射分析試驗 32 3.3.4 硬度試驗 33 3.3.5 附著性試驗 35 3.3.6 破斷韌性試驗 37 3.3.7 磨耗試驗 38 3.3.8 電化學腐蝕實驗 39 3.3.9 高溫氧化實驗 41 第四章 結果與討論 42 4.1 晶相及微結構分析 42 4.1.1 成份分析 42 4.1.2 晶相分析 44 4.1.3 鍵結能譜分析 48 4.1.4 微結構分析 54 4.2 機械性質 65 4.2.1 硬度 65 4.2.2 破斷韌性 66 4.2.3 磨耗性質 73 4.2.4 刮痕試驗附著性分析 78 4.3 電化學腐蝕實驗 82 4.4 高溫氧化實驗 92 4.4.1 薄膜表面型態變化 92 4.4.2 晶相分析 93 4.4.3 薄膜表面與橫截面影像分析 95 4.5 矽添加對於CrZrSiN薄膜的影響 105 4.6 鋯添加對於CrZrSiN薄膜的影響 105 第五章 結論 107 參考文獻 109

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