由於石墨烯在各方面的應用上皆表現出驚人的特性，人們對於石墨烯的研究及應用越來越重視，甚至有學者將它稱為能夠改變21世紀之材料。
　　本研究係使用PVD濺鍍配合真空退火處理之製程來製造石墨烯，不同於以往的是本研究是利用將靶材混合濺鍍之方式。在嘗試了不同底材、靶材以及實驗參數後，再利用拉曼光譜儀來分析，希望能成功製造出高品質之石墨烯。
　　實驗結果顯示，多組實驗數據搭配皆能成功的製造出石墨烯，但以SiO2為底材，靶材選用鎳鉻靶材以及石墨靶材，鎳鉻及石墨的混合之鍍層總厚度為500 nm，退火溫度為950℃，持溫時間為10分鐘，此組實驗參數在利用拉曼光譜儀、光學顯微鏡和掃描式電子顯微鏡觀察，皆顯示出相當不錯的結果。

　　In recent years, the research and application of graphene becoming more and more popular. This two-dimensional material exhibits amazing properties on the application of all aspects, some scholars even say that graphene will change the way we live.
　　In this thesis, we use sputtering and annealing to manufacture the graphene, but the different from others is that we pre-mix the targets during sputtering. We have been tried different substrates, sputtering targets, and other experiment parameters, then analyzing by Raman spectroscopy.
　　The experiment results show that graphene can be manufactured successfully by several combinations of different experiment parameters, and after analyzing by Raman spectroscopy, optical microscope, and scanning electron microscope, we find that the best result is that applying SiO2 as substrates, nickel-chromium and graphite were selected as targets, total coating thickness is 500nm, and the annealing temperature is 950 Celsius holding 10 minutes.

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