研究生: |
林子堯 ZIH-YAO LIN |
---|---|
論文名稱: |
微米及奈米點陣膜之磁性研究 Investigation of micron/nano Magnetic NiFe dot array film |
指導教授: |
鄭偉鈞
Wei-chun Cheng 任盛源 Shien-Uang Jen |
口試委員: |
陳勝吉
Sheng-Chi Chen |
學位類別: |
碩士 Master |
系所名稱: |
工程學院 - 機械工程系 Department of Mechanical Engineering |
論文出版年: | 2012 |
畢業學年度: | 100 |
語文別: | 中文 |
論文頁數: | 106 |
中文關鍵詞: | 點陣 、奈米針 、斜鍍 |
外文關鍵詞: | nanodot, nanowire, oblique |
相關次數: | 點閱:160 下載:1 |
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本研究之一是利用NiFe鍍料以熱蒸鍍之方式,將薄膜鍍在170 μm厚之玻璃基板上,使成長為單層、厚度為100 nm之連續薄膜。 再利用微影蝕刻技術將連續薄膜製作成半徑為20μm之圓(或邊長為40 μm之方形)、數量為50x50之點陣,再改變點與點之間距,以研究其磁特性。 而研究之二,是利用NiFe鍍料以熱蒸鍍之方式,將薄膜鍍在具奈米針陣列之單晶矽基板上。熱蒸鍍時利用改變罩板角度(斜鍍、與水平方向夾角為20o、30 o 、40o)以及控制薄膜厚度(100 nm、50 nm),目的是使奈米針上之薄膜能粒粒分明(使其不連續),每粒尺寸約50 nm並進行後續分析。
由震動式磁力計(VSM)量測出之磁滯曲線發現,點陣結構中,點與點之距離越靠近(點陣密度越高),因偶極場作用力(dipolar interaction)之關係,其方正比(squareness ratio;SQR)會越高。而另一奈米針之研究,由震動式磁力計(VSM)量測出之磁滯曲線發現,同一製程參數下,鍍在奈米針狀結構矽基板與鍍在平面矽基板上之NiFe膜,奈米針狀結構矽基板之矯頑磁場明顯高於平面矽基板,而方正比部分則是平面矽基板明顯高於奈米針狀結構矽基板。在奈米針狀結構矽基板中,又以罩板角度(與水平方向夾角)為40o (最傾斜鍍)之方正比(squareness ratio;SQR)最大。
In project (A), NiFe continuous films were deposited onto glass substrate by thermal evaporation method film with thickness 100 nm. By using Lithography and etching technique, the NiFe films were then manufactured into 50X50 dots:circle with 20 μm radius (or squares with 40 μm each side). Then the magnetic properties of dot array films were studied by changing the separation between the neighboring dots.In another project, project (B), NiFe films were deposited on Si substrates containing nano-wires. In order to make the films also forming nanodot array and for further analysis, we changed the angle of mask during evaporation and controlled the thickness of the films.
We used VSM to measure the Hysteresis Loop of dot array film. We found that when the separation between dots in dot array structure are decreased, the squareness ratio are increased due to dipolar interaction. In the other project, we used VSM to measure the Hysteresis Loop of film on nano-wires. We discovered that under the same procedure, the coercive field of “nano-wired NiFe films” (films on nano-wires) are significantly higher than “plane NiFe films” (plane films),and SQR are “plane NiFe films” significantly higher than nano-wired NiFe films. We also compared nano-wires with different oblique angles, and found that the squareness ratio are the highest in the 40o angle case.
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