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研究生： 伶香
Pukhrambam - Puspa Devi
論文名稱： Electro-absorption Modulated Lasers with High Immunity to Residual Facet Reflection by Using Lasers with Partially Corrugated Gratings
Electro-absorption Modulated Lasers with High Immunity to Residual Facet Reflection by Using Lasers with Partially Corrugated Gratings
指導教授： 李三良
San Liang Lee
口試委員: 詹裕恆
None
曹恆偉
None
葉秉慧
None
廖顯奎
None
徐世祥
None
Gerd Keiser
Gerd Keiser
學位類別： 博士
Doctor
系所名稱： 電資學院 - 電子工程系
Department of Electronic and Computer Engineering
論文出版年： 2017
畢業學年度： 105
語文別： 英文
論文頁數： 110
中文關鍵詞： Electro-absorption modulated lasers 、Residual facet reflection 、High-speed transmission 、Linear gain coefficient 、Partially-corrugated-grating
外文關鍵詞： Electro-absorption modulated lasers, Residual facet reflection, High-speed transmission, Linear gain coefficient, Partially-corrugated-grating
相關次數： 點閱：247  下載：2 
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  •  上一筆

    • The electro-absorption modulated lasers (EMLs) that are widely used in long-haul high-speed transmission have become attractive as light sources for short- and medium-reach optical connects of data centers and mobile stations. These applications require the optical transceivers to be compact, low-cost, and mass producible. They are also demanding ≥100Gb/s data rates per cable currently and the needed data rate is expected to rise rapidly. But the EML formed of an integrated distributed feedback (DFB) laser and an electro-absorption modulator (EAM) is known to be vulnerable to optical reflection, especially for data rates above 10 Gb/s. Residual facet reflection can significantly degrade the performance of electro-absorption modulated lasers (EMLs) operating at high data rates. This issue also complicates the fabrication and characterization of the highly demanded light sources for optical interconnects and transmission. It is desired to optimize the device structure to make EMLs robust and immune to residual facet reflection.
    In this work, we have investigated the effects of the residual facet reflection on the dynamic properties of the EML. We propose to increase the linear gain coefficient of the laser material to improve the immunity to the reflection. Simulation results verify the increase in yield and Q-value by raising the linear gain. We have also numerically verified our statement by proposing a rate equation of a laser under modulated optical feedback for a uniform grating DFB EML structure.
    EMLs with a partially-corrugated-grating (PCG) DFB section are designed and optimized to have much improved tolerance to the residual optical reflection from the modulator output facet. By designing the laser section with an appropriate grating length and linear gain coefficient, the EML can have good tolerance to residual facet reflection. The analysis indicates that 100% yield can be obtained with the optimal design. If
    the EML needs to operate over a wide ranges of gain coefficient and facet reflection, >70% of yield can still be obtained.

    The electro-absorption modulated lasers (EMLs) that are widely used in long-haul high-speed transmission have become attractive as light sources for short- and medium-reach optical connects of data centers and mobile stations. These applications require the optical transceivers to be compact, low-cost, and mass producible. They are also demanding ≥100Gb/s data rates per cable currently and the needed data rate is expected to rise rapidly. But the EML formed of an integrated distributed feedback (DFB) laser and an electro-absorption modulator (EAM) is known to be vulnerable to optical reflection, especially for data rates above 10 Gb/s. Residual facet reflection can significantly degrade the performance of electro-absorption modulated lasers (EMLs) operating at high data rates. This issue also complicates the fabrication and characterization of the highly demanded light sources for optical interconnects and transmission. It is desired to optimize the device structure to make EMLs robust and immune to residual facet reflection.
    In this work, we have investigated the effects of the residual facet reflection on the dynamic properties of the EML. We propose to increase the linear gain coefficient of the laser material to improve the immunity to the reflection. Simulation results verify the increase in yield and Q-value by raising the linear gain. We have also numerically verified our statement by proposing a rate equation of a laser under modulated optical feedback for a uniform grating DFB EML structure.
    EMLs with a partially-corrugated-grating (PCG) DFB section are designed and optimized to have much improved tolerance to the residual optical reflection from the modulator output facet. By designing the laser section with an appropriate grating length and linear gain coefficient, the EML can have good tolerance to residual facet reflection. The analysis indicates that 100% yield can be obtained with the optimal design. If
    the EML needs to operate over a wide ranges of gain coefficient and facet reflection, >70% of yield can still be obtained.

    Abstract I ACKNOWLEDGEMENT III GLOSSARY OF TERMS XIII CHAPTER 1 INTRODUCTION 1 1.1 Overview 1 1.2 Introduction of EML 4 1.3 Operational Principle of EML 5 1.3.1 EAM Section 5 1.3.2 Laser Sections 6 1.3.3 Field Induced Absorption 7 1.4 Motivation for the Work 9 1.5 Organization of the Dissertation 12 CHAPTER 2 LITERATURE REVIEW 13 2.1 State of art of Electroabsorption Modulator Division 13 2.1.1 Static Intensity Modulation Performance 13 2.1.2 Dynamic Frequency Modulation Performance 14 2.2 Analysis of Different Laser Structures in EML 16 2.2.1 Overview 16 2.2.2 Standard DFB Laser 17 2.2.3 λ/4 Phase Shifted DFB Laser 19 2.2.4 Partially Corrugated Grating DFB Structure 21 CHAPTER 3 THEORITICAL MODELING OF OPTICAL MODULATED FEEDBACK EFFECT 23 3.1 Laser Under Modulated Optical Feedback 23 3.2 Theoretical Model Description and Analysis 23 3.3 Relative Noise Power Calculation 28 3.3.1 Effect of Linear Gain Coefficient to Noise Power 28 3.3.2 Effect of Confinement Factor to Noise Power 31 CHAPTER 4 DEVICE MODELING WITH TLLM METHOD 34 4.1 Transmission Line Laser Model (TLLM) 34 4.2 Device Modeling 37 4.2.1 Time and Space Discretization 37 4.2.2 Rate Equation Dynamics 38 4.2.3 Laser Gain Model 41 4.2.4 EAM Model 43 4.3 Simulation Setup to Measure the Dynamic Performance 47 4.4 Simulation Setup to Measure Relative Intensity Noise 50 CHAPTER 5 SIMULATION RESULTS AND DISCUSSION 52 5.1 Performance Analysis of EML with Conventional DFB Laser 52 5.1.1 EML with λ /4-shift DFB Structure 53 5.1.2 EML with Uniform Grating DFB Structure 55 5.2 Performance Comparisons between UG and PCG EMLs 59 5.3 RIN Analysis for UG/PCG-DFB EML 62 5.4 Dynamic Performance Analysis of EML with Partially Corrugated Grating (PCG)- DFB Laser 67 5.4.1 Justification of the Modeling Approach 67 5.4.2 Optimization of Gain and Gratings 68 5.4.3 Comparisons for EMLs with Different Laser Lengths 72 5.4.4 Effect of Reflections 74 5.4.5 Effect of Confinement Factor 77 5.5 Discussion 81 CHAPTER 6 CONCLUSION 85 6.1 Future Work 87 References 89

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