純金屬和合金有序排列奈米管陣列的製備和性質分析｜國立臺灣科技大學博碩士論文系統

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研究生：	曾冠瑋 Kuan-wei Tseng
論文名稱：	純金屬和合金有序排列奈米管陣列的製備和性質分析 Elemental metal and alloy nanotube arrays with highly ordered periodicity: Fabrication and characterizations
指導教授：	朱瑾 Jinn P. Chu
口試委員:	江偉宏 Wei-Hung Chiang 陳詩芸 Shih-Yun Chen 邱昱誠 Yu-Cheng Chiu 郭浩中 Hao-Chung Kuo
學位類別：	碩士 Master
系所名稱：	工程學院 - 材料科學與工程系 Department of Materials Science and Engineering
論文出版年：	2020
畢業學年度：	108
語文別：	英文
論文頁數：	122
中文關鍵詞：	階梯覆蓋、微影製程、純金屬和多元合金奈米管陣列
外文關鍵詞：	step coverage, elemental metal, nanotube arrays
相關次數：	點閱：162 下載：0
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上一筆

摘要    1
Abstract    2
Acknowledgements    4
Contents    5
List of Figures    9
List of Tables    15
Chapter 1. Introduction    16
1 Objectives of Study    17
Chapter 2. Literature Review    18
1 Physical vapor deposition (PVD)    18
1.1 Step coverage    18
1.2 Oblique angle physical vapor deposition (OAPVD)    19
2 Metallic glass (MG)    21
2.1 W-BMG systems    21
2.2 Thin-film metallic glass (TFMG)    22
2.3 W-TFMG systems    23
3 Nanotubes (carbon nanotubes, metallic oxide nanotubes, metallic nanotubes)    24
3.1 Fabrication of Carbon nanotubes    25
3.1.1 Synthesis of CNTs prepared via the chemical vapor deposition (CVD) method    26
3.1.2 Synthesis of CNTs prepared via arc discharge method    27
3.1.3 Synthesis of CNTs prepared via laser ablation method    28
3.2 Fabrication of metallic oxide nanotubes (TiO2, TiN)    29
3.2.1 Titanium oxide nanotube arrays prepared by anodic oxidation method    29
3.2.2 Titanium nitride nanotube arrays prepared by anodic oxidation method    29
3.3 Fabrication of metallic nanotubes (Pt-Cu and Co-Ni alloy)    30
3.3.1 Pt-Cu alloy nanotube arrays prepared by electrodeposition etching method    30
3.4 MG nanotube arrays    31
3.4.1 Surface characteristics of MGNT    33
3.4.2 Detection convenience of MGNT    35
3.4.3 Microstructural analysis for MGNT arrays    36
Chapter 3. Experimental Procedures    38
1 Metallic Nanotube Arrays (MeNTA) Fabrication (single layer)    39
1.1 Substrate and photoresist preparations    40
1.2 Deposition of metallic thin film (single layer)    41
1.3 Photoresist removal    41
2 Different methods of deposition    41
2.1 Working distance    42
2.2 Position of templates on holder    42
2.3 Speed of rotation    42
2.4 Template with tilting angle    43
2.5 Y axial rotation of templates    43
3 MeNTA fabrication (multilayer)    44
3.1 Substrate and photoresist preparations    44
3.2 Deposition of metallic thin films (multilayer)    45
3.3 Photoresist removal    46
4 Characterizations of thin films    46
4.1 Crystallographic analysis (XRD)    46
4.2 Chemical composition (EPMA)    47
4.3 Nanoidentation test    47
5 Characterizations of Nanotube arrays    47
5.1 Composition analysis and TEM specimen preparation (FIB)    48
5.2 DI water contact angle    49
5.3 Elemental Surface analysis (AES)    49
5.4 Microstructural analysis (TEM)    50
Chapter 4. Results and Discussion    51
1 SEM image of nanotube arrays in different diameter    51
2 Single layer of MeNTA    52
2.1 Surface morphology of MeNTA after ultrasonically-removing photoresist (1 layer)    52
2.2 SEM image of cross-section in MeNTAs before removing photoresist    53
SEM images of cross section in MeNTAs before removing photoresist    54
2.3 EDS results of MeNTAs    54
2.4 Effect of small aspect ratio in single layer-MeNTA    56
3 Deposition of different methods on contact-hole templates    57
3.1 Effect of working distance    57
3.2 Effect of position on holder    59
3.3 Effect of speed of rotation    60
3.4 Effect of tilting angle    61
3.5 Effect of Y axial rotation of templates    62
3.6 Evaluation of ultrasonically removing photoresist    62
4 Multilayer of MeNTA (2 layer)    64
4.1 Surface morphology of MeNTAs after removing top layer using tweezer. (2 layer)    64
4.2 SEM image of cross section in MeNTAs before removing photoresist. (2 layer)    66
SEM image of cross section in MeNTAs before removing photoresist    66
4.3 Multilayer of MeNTAs (3 layers)    67
4.4 Comparison of surface morphology between single layer and multilayer (3 layers) of MeNTAs    67
4.5 Effect of W-Ni-B deposition time for SS316-MeNTA    70
4.6 Comparison of cross section between single layer and multilayer of MeNTAs    71
SEM image of cross-section in MeNTAs before removing photoresist    71
SEM image of cross-section in MeNTAs before removing photoresist    72
4.7 7075 Al-MeNTA failed sample    73
4.8 Ag-MeNTA    74
5 Characteristic of Metallic single layer and multilayer    75
5.1 Chemical composition (EPMA)    75
5.2 XRD results on single layer and multilayer of metallic films    76
6 MeNTA    78
6.1 Surface morphology and elemental analysis (SEM and EDS)    78
6.2 Surface properties (water contact angle)    83
6.3 Auger analysis (Auger)    89
6.4 Microstructural analysis (TEM)    93
6.5 Strengthening mechanism    108
Chapter 5. Conclusions    111
Chapter 6. Reference    112
Appendix    117


                                

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