以熱蒸鍍法蒸鍍氧化鋅及氧化鋅混合一氧化矽應用於指紋顯影

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研究生：	謝旺成 Wang-Cheng Hsieh
論文名稱：	以熱蒸鍍法蒸鍍氧化鋅及氧化鋅混合一氧化矽應用於指紋顯影 Thermal evaporation of ZnO and mixture of ZnO and SiO for developing latent fingerprints
指導教授：	周賢鎧 Shyankay Jou
口試委員:	郭鴻飛 Hungfei Kuo 胡毅 Yi Hu
學位類別：	碩士 Master
系所名稱：	工程學院 - 材料科學與工程系 Department of Materials Science and Engineering
論文出版年：	2011
畢業學年度：	99
語文別：	中文
論文頁數：	101
中文關鍵詞：	指紋顯影、氧化鋅、一氧化矽、熱蒸鍍、光激發發光
外文關鍵詞：	Development of latent fingerprint, Zinc oxide, Silicon monoxide, Thermal evaporation, Photoluminescence
相關次數：	點閱：216 下載：8
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上一筆

本研究利用熱蒸鍍(Thermal evaporation)系統，蒸鍍氧化物粉末來顯影指紋，
並使用簡便的製程，在不經過退火之情況下，達到指紋顯影及薄膜發光之特性，
使其可用於鑑識科學。
蒸鍍氧化鋅、氫氧化鋅、硝酸鋅三種粉末，都可以清楚的顯影出指紋紋路，
利用X 光繞射儀分析，發現薄膜都為金屬鋅之結構，經過光激發發光光譜儀分
析，薄膜都沒有產生任何的發光波段。實驗中也利用RF 氧氣電漿處理此類薄膜，
但都無法使其氧化達到發光之效果。蒸鍍非結晶一氧化矽粉末製成之薄膜，只有
微弱的發光強度，但放置於大氣下八個月後，經光激發發光光譜儀分析，發現薄
膜發光強度提高。蒸鍍氧化鋅與一氧化鋅混合之粉末製得之薄膜，在剛沉積出時
薄膜有發光波段，此發光可能為與矽鍵結之兩個氧互相鍵結(dioxasilirane)及具有
兩個孤對電子的矽(silylene)之兩種缺陷造成之發光。
最後將具有發光特性之薄膜，蒸鍍在不同材料上，觀察其發光效果，並利用
254 nm 之紫外燈激發，把發光之指紋影像拍下，以將此技術應用於鑑識科學當
中。

In this research, development of latent fingerprint can be achieved by thermal
evaporation using various oxide sources and simple procedures without annealing.
Results shows that latent fingerprints can be clearly developed and behave
luminescence-emitting property in specific condition, which is beneficial to forensic science.
Latent fingerprint can be successfully developed using ZnO, Zn(OH)2, and
Zn(NO3)2, respectively. Films exhibit metallic Zn structure by XRD and showed no luminescence-emitting property by PL measurement, even proceeded by oxygen
plasma. However, by changing evaporation source to amorphous SiO powder showed
slightly luminescence-emitting. Furthermore, light emitting intensity became larger when films were stored in the air for 8 months. Latent fingerprint developed by source mixed of ZnO and SiO powders showed considerable luminescence intensity when firstly evaporated, which is possibly caused by defects of dioxasilirane and silylene.
Finally, various of objects were selected to try to achieve development of latent fingerprint, and investigate the luminescence-emitting property as well as take pictures after excited by UV light. Results could be applied to forensic science.

摘要................................................................................................................................ I
Abstract ......................................................................................................................... II
目錄.............................................................................................................................. III
表目錄........................................................................................................................... V
圖目錄.......................................................................................................................... VI
第一章 前言................................................................................................................ 1
第二章 文獻回顧........................................................................................................ 2
1 指紋特性及顯影技術................................................................................... 2
2 氧化鋅薄膜................................................................................................... 5
2.1 氧化鋅簡介........................................................................................ 5
2.2 氧化鋅薄膜薄膜發光機制................................................................ 7
3 真空金屬沉積(Vacuum Metal Deposition, VMD) ..................................... 10
3.1 Au/Zn deposition ............................................................................. 10
3.2 ZnO deposition................................................................................. 13
3.3 ZnO composite films........................................................................ 19
3.4 Amorphous SiO2 and ZnO+SiO2 film ............................................. 29
第三章 實驗步驟與方法.......................................................................................... 35
1 實驗用材料與規格..................................................................................... 35
2 實驗步驟..................................................................................................... 36
2.1 實驗流程.......................................................................................... 36
2.2 Au/Zn 薄膜之製備 .......................................................................... 38
2.3 蒸鍍ZnO 粉末之步驟 .................................................................... 39
2.4 蒸鍍Zn(OH)2、Zn(NO3)2、Zn(CH3COO)2 粉末之步驟 .............. 40
2.5 蒸鍍SiO 粉末及ZnO+SiO 粉末之步驟 ....................................... 41
IV
3 實驗儀器與裝置......................................................................................... 44
3.1 熱蒸鍍系統(Thermal evaporation) ................................................. 44
3.2 RF 氧氣電漿氧化系統(RF Oxygen Plasma Oxidation System) .... 45
3.3 石英管爐系統(Furnace System) ..................................................... 46
3.4 指紋拍攝.......................................................................................... 46
4 薄膜分析與鑑定......................................................................................... 48
4.1 表面輪廓儀(α-Step) ........................................................................ 48
4.2 X 光繞射儀(X-Ray Diffractometer, XRD) ..................................... 48
4.3 能量散射光譜儀(Energy Dispersive Spectrometers, EDS) ............ 49
4.4 光激發發光光譜儀(Photoluminescence, PL) ................................. 49
4.5 化學分析影像能譜儀(ESCA) ......................................................... 50
第四章 結果與討論.................................................................................................. 51
1 蒸鍍Au/Zn 金屬與ZnO 粉末顯影指紋之比較 ....................................... 51
1.1 時效性比較...................................................................................... 51
1.2 蒸鍍ZnO 粉末之薄膜XRD 分析 .................................................. 52
1.3 蒸鍍ZnO 粉末之薄膜PL 分析...................................................... 54
2 改善ZnO 薄膜缺氧之情形 ....................................................................... 55
2.1 通入空氣蒸鍍ZnO 粉末 ................................................................ 55
2.2 RF 氧氣電漿處理缺氧之薄膜 ........................................................ 57
3 蒸鍍Zn(OH)2、Zn(NO3)2、Zn(CH3COO)2 粉末 ..................................... 60
4 蒸鍍SiO 粉末及ZnO + SiO 粉末 ............................................................ 65
4.1 蒸鍍SiO 粉末 ................................................................................. 65
4.2 蒸鍍ZnO+SiO 粉末 ........................................................................ 72
5 蒸鍍SiO 及ZnO + SiO 粉末顯影指紋之影相 ........................................ 82
第五章 結論.............................................................................................................. 93
參考文獻...................................................................................................................... 95

                                

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