由於鎂及其合金在所有結構用金屬材料中具有優異的物理及機械特性，如低密度、高比強度、高比剛性、高吸震性、高電磁屏障性、抗輻射能力強、易切削加工及易回收等一系列優點，在生活設備及國防軍事領域具有極其重要的應用價值及應用前景，被譽為21世紀的綠色工程材料。但如一般所知鎂及其合金之耐腐蝕性非常差，進而限制鎂合金的應用與發展，故為增加鎂合金的應用使其在腐蝕環境下仍不失去其優異之物理其機械特性為本研究之重點。
本研究藉由真空濺鍍系統於AZ91D鎂合金表面沉積金屬鋁膜，再利用陽極氧化處理將金屬鋁膜氧化成氧化鋁膜，並探討不同反應間下氧化鋁膜對鎂合金的抗腐蝕能力。藉由場發射掃描式電子顯微鏡(FE-SEM)觀察薄膜表面形貌、雙束型聚焦離子束顯微鏡(DB-FIB)觀察薄膜橫截面、X射線光電子能譜儀(XPS)分析薄膜表面特性及X光繞射儀(XRD)分析薄膜晶體結構，結果發現氧化鋁膜隨著氧化時間增加而變厚且表面出現奈米孔洞、該氧化鋁膜成分主要為Al2O3且為非晶結構。
最後以電化學阻抗頻譜分析及動電位極化曲線分析之量測結果表示，相較於原始AZ91D鎂合金，經過濺鍍沉積鋁膜和陽極氧化處理生成氧化鋁膜之試片皆具有較高的腐蝕電位及較低的腐蝕電流密度，其中以陽極氧化15分鐘之氧化鋁膜試片在3.5 wt%之氯化鈉水溶液中有最高的腐蝕電位-1.359 V、最低的腐蝕電流密度0.262 μA/cm2及電化學阻抗值30000 Ω。此結果證實利用真空濺鍍沉積金屬鋁膜於鎂合金表面再透過陽極氧化處理製備氧化鋁層之方式，有助於提升AZ91D鎂合金之抗腐蝕能力。

Magnesium and its alloy have been used widely for the living facilities and military defense owing to their excellent physical and mechanical properties, such as low density, high strength, good cast-ability and weld-ability, excellent electrical and thermal conductivity, high dimensional stability, good electromagnetic shielding and high recyclability. However, the poor corrosion resistance of magnesium alloys have limited their engineering applications, especially in acidic environment and salt-water conditions.
Two processes were used to improve the corrosion resistance of the magnesium alloys, including sputtering and anodized. Since the aluminum film is more stable than magnesium substrate, the aluminum film can be oxidized to aluminum oxide film, to further improve the corrosion resistance. In this study, the sputtering + anodized were carried out on an AZ91D Mg alloy, and the effects on the corrosion resistance were evaluated.
The cross-sectional configuration of film was analyzed by Dual Beam Field Emission Focused Ion Beam (DB-FIB), indicated thickness of anodized oxide films increased with the oxide time. The film surface is characterized by X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) which indicated that the anodized oxide layer was amorphous structure and composed by Al2O3.
The results of potentiodynamic polarization show that the sputtering Al film and the anodized oxide layer on the AZ91D alloys performed more positive corrosion potential and lower corrosion current density than the AZ91D substrate, by adopting an anodizing treatment 15 minutes specimen have higher corrosion potential value of -1.359 V and lower corrosion current density value of 0.262 μA/cm2. Similar, according to EIS results, the charge transfer resistance of the anodized specimens were larger than the AZ91D substrate. These results proved that the sputtering Al film with anodizing treatment coated on the AZ91D alloys significantly improved the corrosion resistance property of the AZ91D alloys.

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