本研究主分為兩大部分，一、設計蒸鍍腔體內之大型遮板，其目的為改善膜厚均勻性，提高薄膜生產良率；二、線性漸變濾波片的設計，在基材上方加入擋片，使膜厚有梯度變化，達到濾波效果。
在第一部分，為使腔體內膜厚均勻分布，須加入遮板來調控膜厚。首先定義蒸鍍腔體內幾何結構，並建立理論模型計算膜厚分佈，進而模擬遮板形狀。在未加入遮板前膜厚最大變化量為12.5 %，加入單片型遮板之模型理想狀態下可達到膜厚均一之效果，對稱型遮板模型膜厚變化量為總膜厚的3.925 %。
第二部份，設計線性漸變濾波片，於在基材上方加入擋片，使膜厚分佈產生梯度變化。利用理論模型計算擋片高度不同時之膜厚分佈，與模擬膜厚分佈做比較，其漸變膜厚25 % 至75 % 部份的膜厚輪廓幾乎重疊。實際蒸鍍膜厚與理論模型及軟體模擬結果，其漸變區域的成長趨勢相當，膜厚輪廓差異較大的部份為漸變區及無漸變區的交界處，需加入修正因子來修正模型。

This research was divided into two parts. First part was the large mask design inside of Evaporation that has the potential to improve thickness uniformity of thin film and increase process yield for that. The other was the design of linear variable filters that adds a mask on the substrate and make the thickness of film to cause gradient changes.
In the first part, the mask needs to be added in the Evaporation modulate the thickness of films so that it can be uniformly distributed. Defining the geometric structure of the Evaporation was the first step. Then, the theoretical model to calculate thickness of films distribution was established. And then the mask shape can be simulated. The maximum variation of thickness was 12.5 % before adding the mask. Thickness of film can achieve the effect of uniformity distributed under ideal conditions after adding the single type mask model. The variation of symmetrical type mask model was 3.925 % of thicknesses .
In the second part, thickness of film distribution calculating in different the mask height with the theoretical model that compared with the results of the experiments, and there were 25 % to 75 % outline that almost appeared overlapping. The measured thickness of the thin film in the transition region from the covered area to the evaporated area has certain discrepancy as compared to that of the theoretical model, which can be improved by constructing a more sophisticated model in the future.

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