本研究利用接觸式曝光與微透鏡光罩製作微針陣列模仁。當平行紫外光透過微透鏡光罩，使光線在光阻上呈現發散，而製作出微針陣列凸模仁。首先，以幾何光學推導接觸式曝光系統中微透鏡聚焦長度之光路預測公式，並與造鏡者公式及光學模擬分析結果作比較。再以光路預測公式進行設計製作微透鏡之尺寸。由光路預測公式得知微透鏡直徑580μm與高度為38.57μm，能使聚焦長度在玻璃厚度2300μm處。藉由五組不同塗佈轉速及熱熔法方式，將微透鏡精準製作在孔徑光欄上，得到微透鏡光罩。其五組參數之微透鏡聚焦長度分別為2410μm、2314μm、2216μm、2263μm及2279μm。再以高功率氦氖雷射紅光進行檢測，其結果顯示製作的微透鏡光罩有聚焦、發散功用。將五組微透鏡光罩採接觸式曝光法，製作在負光阻(SU-8)形成微針陣列模仁，其模仁結構外形分別為倒圓台形狀、沙漏形狀、圓台形狀。模仁之頂部尺寸及底部尺寸皆有縮小的趨勢。
另以光纖雷射雕刻方法製作，將光纖雷射雕刻在正光阻(AZ4620)及矽晶圓上，藉由不同功率及頻率作為雕刻條件，結果顯示當功率60%與頻率30Hz之正光阻模仁完整，經由PDMS翻模得到微針陣列，微針直徑約為170μm、高度約為60μm，其外形輪廓完整且表面品質佳。

The new micro-needle array mold fabrication method using micro-lens mask through contact printing is reported. At first, the parallel ultraviolet light would pass through the mask of micro-lens. The light is divergent on the photoresist. Finally, micro-needle array mold would be obtained. This study used two different prediction formulas, including Lensmaker’s formula and Optical path prediction formula. These results obtained by two methods would be compared with optical simulation results. The result of Optical path prediction formula, which was better than the other, would be used to design micro-lens. This micro-lens was 580μm in diameter; 38.57μm in height; and 2300μm of focal length. In fabrication process, the micro-lens mask could be obtained by using five different coating speeds and thermal reflow method. Five different types of the micro-lens focal length were 2410μm, 2314μm, 2216μm, 2263μm and 2279μm. After that, the detection results which used by high power red helium-neon laser, showed that micro-lens might be focus and then divergent. These five types of micro-lens mask with contact exposure method were manufactured in the negative photoresist (SU-8) formation micro-needle array mold. Three kinds of mold structure were showed, including inverted frustum shape, sand clock shape and frustum shape. The top and the bottom of the molds tended to reduce their dimension.
By the other hand, another method to fabricate micro-needle array mold was by using fiber laser. The fiber laser was engraved in the positive photoresist (AZ4620) and silicon wafer, using different carving conditions with different power and frequency. The results indicated that when the power of 60% with the frequency of 30Hz, the positive photoresist mold would be completed. By using PDMS molds, micro-needle with the diameter of approximately 170μm and height of 60μm has shown a good quality of contour suface.

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