研究生: |
周炳伸 Ping-Shen Chou |
---|---|
論文名稱: |
水解能量於可水解鋁酸鋰基板平坦化製程之研究 Research on Hybrid-Energy Assisted Planarization for Polishing of Hydrolysis LAO Substrates |
指導教授: |
陳炤彰
Chao-Chang A. Chen |
口試委員: |
林榮慶
Zone-Ching Lin 鄭裕隆 Lung-Yu Jeng |
學位類別: |
碩士 Master |
系所名稱: |
工程學院 - 機械工程系 Department of Mechanical Engineering |
論文出版年: | 2012 |
畢業學年度: | 100 |
語文別: | 中文 |
論文頁數: | 192 |
中文關鍵詞: | 次表面破壞 、可水解基板 、複合能量化學機械拋光 、鋁酸鋰基板 |
外文關鍵詞: | Hybrid-energy assisted chemical mechanical plana, Hydrolysis wafer, Sub-surface damage, lithium aluminate wafer |
相關次數: | 點閱:191 下載:10 |
分享至: |
查詢本校圖書館目錄 查詢臺灣博碩士論文知識加值系統 勘誤回報 |
化學機械平坦化(Chemical Mechanical Polishing, CMP)因能夠快速移除材料且可達全面平坦化,故常用於半導體製程,而於LED基板產業,因使用與氮化鎵(GaN)晶格匹配的藍寶石或碳化矽基板,目前多以磨料與基板之間由作用力促進化學反應的機械化學拋光(Machano-Chemical Polishing, MCP)為主,因此透過外加能量促使硬脆材料基板之反應層要求也成為平坦化技術發展之趨勢。本研究主要為建立一種以研磨液溫度控制複合水解能量輔助化學機械平坦化(Hybrid-energy Assisted Chemical Mechanical Planarization, HACMP)之系統用以達到快速移除及表面全平坦化,並以可水解材料鋁酸鋰(LiAlO2, LAO)基板進行製程研發。本研究同時探討鋁酸鋰基板於拋光前之次表面破壞程度,確保所需移除之深度,並觀察水解現象在表面之影響。首先以無磨料純水溶液進行純水解之移除方法,再使用目前硬脆材料專用之兩款研磨液作為對照,最後以含水量之差異進行複合能量於鋁酸鋰基板拋光之效果的影響。於對照實驗時,進行研磨液升溫80°C之HACMP移除率上升22%,而在添加含水量50%之研磨液升溫80°C之HACMP可將稀釋磨料濃度之研磨液移除率上升29%,並且表面粗糙度更加改善,研磨液使用量將可減少25%。本研究相關成果可作為對於鋁酸鋰基板平坦化製程之研磨液調配依據,以及日後於LED基板產業應用鋁酸鋰基板製程時所需技術發展參考。
Chemical mechanical planarization (CMP) has become a popular technology in semiconductor manufacturing process. Substrate of light emitted diode (LED) are usually planarized by the Machano-Chemical Polishing (MCP) proceed due to the solid-phase chemical passivation between substrate material and abrasive grits. Since of the current low efficiency, thus this study is to develop a hybrid energy mechanism to assist in generating hydrolysis reacted layer on lithium aluminate (LAO) substrates. This Hybrid-Energy assisted Chemical Mechanical Planarization (HACMP) process achieves higher material removal rate and global planarization by such hydrolysis reaction and abrasive processing. Furthermore, the depth of sub-surface damage layer of LAO substrate before and after polishing process. Experimental results shows that the slurry with DI-water (DIW) to proceed the HACMP and achieve MRR increasing about 22% under the work temperature 80°C. The surface roughness is reduces as 20% and MRR can increased as 29% with adding 50% water concentration into slurry in the HACMP process. Thus, slurry comsumption can reduce upto 25% compare with the conventional polishing process. Results can be applied to further slurry analysis for LAO substrate and process optimization, especially for the LED substrate demands in the near future.
1. Isamu, A., “Key invention in the history of nitride-based blue LED and LD”, Journal of Crystal Gtowth, 300, pp.2-10, 2007.
2. Reed, M. D., Kryliouk, O. M., Mastro, M. A., Anderson, T. J., “Growth and characterization of single-crystalline gallium nitride using (100) LiAlO2 substrates”, Journal of Crystal Growth, 274, pp.14-20, 2005.
3. Ploog, K. H., Fritz, H., Friedhelm, B., (Al, Ga, In)N heterostructures grown along polar and non-polar directions by plasma-assisted molecular beam exitaxy, Paul Drude Institut Fur Festkorperelektronik, Berlin, 2001.
4. 謝啟祥, 電場輔助化學機械拋光製程於銅膜平坦化之研究, 機械工程學系碩士論文, 國立台灣科技大學, 2011.
5. 枋明輝, 林彥德, 鋁酸鋰基板拋光製程分析, 47286654-9702, 國立台灣科技大學, 2008.
6. Parshuram, B. Z., Ashok, K., Sikder, A. K., “Chemical mechanical planarization for microelectronics applications”, Materials Science and Engineering, R, 45, pp.89-220, 2004.
7. Zedang, Z., Weili, L., Zhitang, S., Xiaokai, H., “Two- step chemical mechanical polishing of sapphire substrate”, Journal of the Electrochemical Society, 157, 6, H688-H691, 2010.
8. Umeno, M., Takashi, E., Hiroyasu, I., “GaN-based optoelectronic devies on sapphire and Si substrate”, Materials Science in Semiconductor Processing, 4, pp.459-466, 2001.
9. Melton, W. A., Jacques, I. P., “GaN growth on sapphire”, Journal of Crystal Growth, 178, pp.168-173, 1997.
10. Arnoud, P. K., Funter, W. S., Fritz, A., “Crystallography of potassium aluminate K2O•Al2O3”, Journal of Alloys and Compounds, 314, pp.147-153, 2001.
11. Kinoshita, K., J. W., Ackerman, J. P., “Preparation and characterization of lithtum aluminate”, Mat. Res. Bull. 13, pp.445-455, 1978.
12. Sang, W. K., Seung, B. P., “Effect of precursors on the preparation of lithium aluminate”, Journal of Nuclear Materials, 246, pp.131-138, 1997.
13. Lee, J. W., Pearton, S. J., Abernthy, C. R., “Wet and Dry Etching of LiGaO2 and LiAlO2”, Journal of Electrochemical society, 143, pp.169, 1996.
14. Laffey, S. M., John, R. V., Mary, A. H., “Method of polishing langasite”, United States Patent, US5605490, 1997.
15. Xu, K., Xu, J., Deng, P., Qiu, R., Fang, Z., “MOCVD growth of GaN on LiAlO2 (100) substrate”, Physica Status Solidi (A) Applied Research, 176, 1, pp.589-593, 1999.
16. Ploog, K. H., Ted, W. M., Roberto, F., Growth and characterization of M-plane GaN and (In, Ga)N/GaN multiple quantum wells, Mathematisch Naturwissenschaftlichen Fakultat I Humboldt Universitat, zu Berlin, 2004.
17. Ploog, K. H., Wolfgang, N., Wolfgang, J., Transmission electron microscopy studies of GaN/γ-LiAlO2 heterostructures, Mathematisch Naturwissenschaftlichen Fakultat I Humboldt Universitat, zu Berlin, 2004.
18. 曹百君, 以柴氏提拉法生長鋁酸鋰單晶晶體及其晶面的反向特性之研究, 材料科學研究所碩士論文, 國立中山大學, 2006.
19. 黃信介, 鋁酸鋰單晶成長與表面拋光之研究, 材料科學研究所碩士論文, 國立中山大學, 2006.
20. Wu, S. Q., Hou, Z. F., Zhu, Z. Z., “First- principles study on the structural, elastic, and electronic properties of γ-LiAlO2”, Compurarional Materials Science, 46, pp.221-224, 2009.
21. Lin, H., Zhou, S., Hao, T., Jia, T., Hou, X., Gu, S., Shunming Zhu, Zili Xie, Ping Han, Rong Zhang, “Polishing of (100) γ-LiAlO2 wafer and its effect on the epitaxial growth of ZnO films by MOCVD”, Journal of Alloys and Compounds, 479, L8-L10, 2009.
22. Material comparison table of substrates, Kallex Company, Ltd., Taiwan, 2010. http://www.kallex.com.tw/
23. Properties of silicon and silicon wafer, EL-CAT Inc., NJ 07463, USA, http://www.el-cat.com/
24. Preston, F. W., “The theory and design of plate glass polishing machine”, Journal of the society of glass technology, 11, pp.214, 1927.
25. Muldowney, G. P., James, D. B., “Characterization of CMP pad surface texture and pad- wafer contact”, Mat. Res. Stmp. Proc., pp.816, 2004.
26. Mahadevaiyer, K., Jakub, W. N., Lee, M, C., “Chemical mechanical planarization: slurry chemistry, materials, and mechanisms”, Chem. Rev., 110, pp.178-204, 2010.
27. Desal, T., Du, V., “Chemical mechanical planarization of copper: pH effect”, Journal of Materials Science Letters, 22, pp.1623-1625, 2003.
28. Du, T., Dnyanesh, T., Vimal, D., “Electrochemical characterization of copper chemical mechamical polishing”, Microelectronic Engineering, 69, pp.1-9, 2003.
29. Kim, N. H., Lim, J. H., Kim, S. Y., Chang, E. G., “Effects of phosphoric acid stabilizer on copper and tantalum nitride CMP”, Materials Letters, 57, pp.4601-4604, 2003.
30. Lee, D. W., Kim, T. G., Kim, N. H., Kim, S. Y., Chang, E. G., “Stability of H2O2 as an oxidizer for Cu CMP”, Electrical and Electronic Materials, 6, 1, pp.29-32, 2005.
31. Hiroki, T., Takashi, M., Yasuhiro, T., Terutake, H., Suzuki, K., Novel CMP Technique for Copper Surface Finishing with Fullerene Nano-Particle, American Society of Precision Engineering, California, USA, 2006.
32. Liu, P., Lu, X., Liu, Y., Luo, J., Pan, G., “Chemical Mechanical Planarization of Copper Using Ethylenediamine and Hydrogen Peroxide Based slurry”, Advanced Tribology Proceedings of CIST2008 & ITS-IFToMM2008, Beijing, China, 2008.
33. Lee, H., Joo, S., Jeong, H., “Mechanical effect of colloidal silica in copper chemical mechanical planarization”, Journal of Materials Processing Technology, 209, pp.6134-6139, 2009.
34. Armini, S., Whelan, C. M., Moinpour, M., K. M., “Copper CMP with composite polymer core–silica shell abrasives: a defectivity study”, Journal of Electrochemical Society, 156, 1, H18-H26, 2009.
35. Chen, C. C. A., Hsieh, C. H., “Effect of inhibiter concentration on Cu CMP slurry analyzed by a Cu ECMP system”, Electrochemical society, Las Vegas, USA, 2010.
36. Lowell, A. N., Leonard, N. G., Mickey, O. M., “Process for gas polishing sapphire and the like”, United States Patent, US4038117, 1977.
37. Doi, T., Ara, P., Koichiro, I., “Design and performance of a controlled atmosphere polisher for silicon crystal polishing”, Electrochemical and Solid-State Letters, 7, 8, G158-G160, 2004.
38. Doi, T. K., Ara, P., Koichiro, I., “A new bell-jar type controlled atmosphere polishing (CAP) machine and its characteristics”, The Japan Society for Precision Engineering, 70, 5, pp.726-731, 2004.
39. Denardis, D., Doi, T., Hiskey, B., Ichikawa, K., Ichikawa, D., Philipossian, A., “Impact of gaseous additives on copper CMP in neutral and alkaline solutions using a CAP system”, Journal of the Electrochemical Society, 152, 11, G824-G830, 2005.
40. Elfallagh, F., Inkson, B. J., “3D analysis of crack morphologies in silicate glass using FIB tomography”, Journal of the European Ceramic Society 29, pp.47-52, 2009.
41. Edward, J. H., Ghatu, S., “Analysis of interacting cracks due to sequential indentations on sapphire”, Acta Materialia 59, pp.3528-3536, 2011.
42. William, H., Experiments on the quantity of gases absorbed by water, at different temperatures, and under different pressures, Communicated by the Right Hon. Sir Joseph Banks, Philosophical Transactions of the Royal Society, 1802.
43. Ian, M., Tomislav, C., Klaus, H., Nikola, K., Kozo, K., Quantities, units and symbols in physical chemistry, Blackwell Science, 1993.
44. Rolf, S., Compilation of Henry’s Law constants for inorganic and organic species of potential importace in environmental chemistry, Air Chemistry Department, Max-Planck Institute of Chemistry, 1999.
45. Nic, M., Jirat, J., Kosata, B., “Hydrosis”, Compendium of Chemical Terminology, ISBN 0-9678550-9-8, Ver. 2.3.1, 2012.
46. Palla, “Organic compounds, Carbohydrates, & Lipids”, Science Pages, Urbana High School, USA, 2005.
47. 林銘棟,可水解材料基板之拋光特性研究, 機械工程學系實務專題, 國立台灣科技大學, 2009.
48. Gerras, G. C., Hartmann, P. P., Sasol Encyclopaedia of Science and Technology, New Africa Books, pp.143-146, ISBN 1869283848, 2007.
49. 陳炤彰, 製造分析課程講義, 機械工程學系, 國立台灣科技大學, 2010.
50. Material: Silicon Dioxide (SiO2), Material properties information, MEMS & Nanotechnology Exchange. https://www.memsnet.org/
51. Klimczyk, P., Figiel, P., Petrusha, I., Olszyna, A., “Cubic boron nitride based composites for cutting applications”, Journal of Achievements in Materials and Manufacturing Engineering, 44, 2, pp.198-204, 2011.