由於石墨烯在各方面的應用上皆表現出驚人的特性，人們對於石墨烯的研究及應用越來越重視，甚至有學者將它稱為能夠改變21世紀之材料。

本研究係使用PVD濺鍍配合高溫氧化及真空高溫處理之製程來製造石墨烯。在嘗試了不同濺鍍鍍層厚度、氧化處理時間、真空高溫還原溫度的實驗參數後，再利用拉曼光譜儀、熱重分析儀、原子力顯微鏡來分析，成功的在銅箔基板上製造出大面積且連續之石墨烯薄膜。

實驗結果顯示，多組實驗數據搭配皆能成功的製造出少層石墨烯，以銅箔為底材，利用原子力顯微鏡、熱重分析儀和拉曼光譜儀觀察並分析後，皆顯示出相當不錯的成果。

In recent years, the research and application of graphene becoming more and more popular. This two-dimensional material exhibits amazing properties on the application of all aspects, some scholars even say that graphene will change the way we live.

This study used PVD sputtering collocation high-temperature oxidation and high-temperature vacuum treatment to manufacture graphene. After trying different films thickness, oxidative induction time and high-temperature vacuum reducing, then use Raman spectroscopy, Thermogravimetry Analysis(TGA) and Atomic Force Microscope(AFM) to analyze. Finally succeed to manufacture large area of continuously graphene film.

In the result, most multiple groups of empirical data could succeed to manufacture grapheme. This empirical data had great achievement after using AFM, TGA and Raman spectroscopy to analyze.

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