有鑑於目前市售光學尺之製作方法是以曝光顯影或雷射直寫進行生產，但考慮到高精度曝光顯影光罩及裝置價格昂貴，且不適合製作長行程及反射式光學尺，而雷射直寫刻劃光柵結構的速度較慢，無法快速生產等因素，本研究將以微奈米轉印技術製作具金屬光柵之光學尺。微奈米轉印技術具有高解析度、快速生產以及低成本的特點，可克服曝光顯影及雷射直寫所面臨之成本及生產等問題。
本研究將分兩階段進行，第一階段將以平面轉印直接轉印微結構於金屬薄膜之實驗，並探討轉印溫度、轉印壓力及轉印時間等操作參數對轉印結果之影響。第二階段則以滾壓轉印驗證長行程線性光學尺之製作可行性，本研究以現有之機台為架構，新增可拆卸式滾壓轉印裝置，並由萬向接頭調整滾輪之接觸均勻性及對位性。此外利用雷射直寫刻劃滾輪模具達到連續式無接縫微結構之製作，最後則是藉由滾壓轉印裝置將微結構轉印至鍍金柔性鋼帶，以獲得大尺寸之金屬光柵光學尺，並量測轉印結果進行分析討論。
本研究採用平面轉印及滾壓轉印技術分別製作出週期 20μm及40μm之線性光學尺，製作之週期誤差在±1μm，並由實驗結果得出轉動速度對轉寫率的影響不顯著，因此可以得到光學尺快速生產之目的。雖然平面模具配合滾壓技術所做出之結構轉寫率只有60%，不過對於光學尺來說，量測精準度是由週期決定，光柵深度決定繞射效率，因此週期的精準度是相當重要因素，而配合市售光學讀頭進行訊號量測，也有得到不錯的輸出效果，

Nowadays there are two ways, laser writing and photolithography, for manufacturing the main scale of linear optical encoder. Photolithography requires expensive mask and cannot fabricate ultra-long scale. The speed of laser direct writing is too slow for mass production. Nanoimprint offers a high-throughput, high-resolution and low cost process. It may overcome the problem of laser direct writing and photolithography in fabricating optical linear scale.
The content of this study is divided into two sections. The first section uses flat optical grating molds to validate the feasibility of direct imprint on metal substrates and discusses the effect of operation parameters on the imprinting results. Because the flat imprint cannot fabricate a very large product, the existing imprint machine was added a removable roller imprint set to perform rolling imprint process in the second section. Contact uniformity and alignment can be adjusted by the universal joint of the equipment. In addition, the fabrication of a seamless roller mold by laser direct writing are presented. Rolling imprint process was performed to imprint microstructures into electroplated Au/Cu thin film on flexible steel strips. Fabrication of long optical scale with metallic gratings has been achieved successfully.
Finally, this study fabricated the optical linear scale of 20μm pitch and 40μm pitch by flat and rolling imprint and error of the period is under ±1μm. Based on the results of the experiment, imprinting pressure has more influence on transfer rate than rolling speed so that we can achieve the high-throughput production. Although the mold structure only has 60% maximum transfer rate, depth of grating affect diffraction efficiency for linear scale. Measurement accuracy is an quite important problem; therefore, the error of pitch is core issue. Collocation with commercial readhead output a excellent signal.

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