本計畫係探討應用電漿浸沒離子佈植技術(PIII, Plasma Immersion Ion Implantation)於Al-Zn-Mg鋁合金來增進其表面特性之研究。在本研究內以AA7005為基材，探討PIII製程之脈衝電壓、基材初始狀態、及後續析出熱處理製程對表面改質層之生成、厚度及微觀結構等表面特性的影響。
本實驗前半段，係以不同PIII脈衝電壓值對試片進行表面改質處理，探討不同脈衝電壓對試片表面改質層之影響。應用奈米壓痕試驗機(nano-indentor)與輝光放電光譜分析儀(GDOS, Glow Discharge Optical Spectrometry)來得到硬度縱深曲線圖以及氮(N)離子縱深分佈曲線圖，並應用原子力顯微鏡(AFM, Atomic Force Microscopy)來量測試片之表面粗糙度並進行分析。亦應用ball-on-disc方法進行表面摩擦係數之量測。在後半段，利用SIMS得到試片表面之鋁元素及氮離子縱深分布曲線圖，對GDOS的氮離子縱深分佈曲線圖進行校正，並對PIII處理試片進行後續析出熱處理，探討後續析出熱處理製程對試片表面粗糙度與改質層性質之影響。
研究結果顯示，在越高的脈衝電壓進行離子佈值時，氮離子能植入的深度越寬，直到離子注入劑量達到一定程度與深度後，便開始在試片外部處堆積，難以再往較深處移動。隨著離子注入劑量上升，對鋁合金試片表面的硬度提升越趨明顯，經離子佈值試片之硬度比未進行離子佈值者提高兩倍以上。將離子佈值過之試片進行T6熱處理後，在試片內部的氮離子會向外擴散，雖然會導致改質層厚度縮減，但也會使鋁與氮的結合集中在外部，使試片得到更好的硬度與較低的摩擦係數。

The objective is to improve the surface property of the Al-Zn-Mg alloys by applying Nitrogen Plasma Immersion Ion Implantation (N-PIII) technique to modify the surface properties of the aluminum alloy. AA7005 aluminum alloy is used as the substrate material in this study. Effects of bias voltage of N-PIII process on the thickness, growth rate and microstructure of the modified layer was studied. The influences of pre-treatment and initial condition of substrate as well as the post-process heat-treatment on the microstructure and the surface characteristics of the modified layer were investigated and analyzed.
At the first step, effects of bias voltage, 20 kV, 30kV and 40kV, on the thickness, growth rate and micro-structure of the modified layer were studied. Nano-indentation test and Glow Discharge Spectrometer (GDOS) test were conducted on the treated specimens to obtain the depth evolution profiles of the hardness and the depth profiles of nitrogen ions from the surface of specimen, respectively. Atomic Force Microscopy (AFM) were applied to measure the surface roughness of the treated specimens. The friction coefficient of the modified layer were measured by ball-on-disc method.
The second step efforts were focused on studying the growth rate and the micro- structure of the modified layer, as well as the effects of post-process heat treatment on the surface properties of the modified layer. The depth profiles of Al and N were measured by Secondary Ion Mass Spectrometer (SIMS) to calibrate the GDOS results. Specimens being N-PIII treated were subjected to various heat treatments. Then, nano-indentation test, GDOS test, ball-on-disc test, and AFM were conducted on these heat-treated specimens to examine the effects of post-process heat treatment on the surface properties of the modified layer.
Experimental results showed that the depth of nitrogen ion is related with the bias voltage. Until the level depth, the nitrogen ion can’t move into the deeply side of specimen. Specimen’s surface hardness was going up when we promote the ions dosage, and the hardness would increase double after the process of N-PIII. After the heat-treatment of T6, internal nitrogen ion in the specimen would diffuse to the external, and the wide of modified layer would be reduced. This phenomenon can promote the probability to form the aluminum nitride, and to get better surface property.

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