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研究生: 金志明
Chih-Ming King
論文名稱: 由微影工程角度探討十二吋晶圓廠新建至量產之模式-以台中科學園區某晶圓廠為例
A Model for Setting Up 12-inch Wafer Fabs from the Perspective of Photolithography Engineering - Based on a New Fab in Tai-Chung Scientific Park
指導教授: 葉瑞徽
Ruey-Huei Yeh
口試委員: 徐世輝
Shey-Huei Sheu
羅士哲
Shih-Che Lo
學位類別: 碩士
Master
系所名稱: 管理學院 - 工業管理系
Department of Industrial Management
論文出版年: 2006
畢業學年度: 94
語文別: 中文
論文頁數: 67
中文關鍵詞: 晶圓微影工程機台配置二次配裝機
外文關鍵詞: Wafer, Lithography Engineering, Layout, Hook up
相關次數: 點閱:310下載:11
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半導體晶圓廠是一個非常複雜的製造環境,其中包含250至300種製程機台,需執行幾百甚至有上千種不同製程步驟。在執行興建新的晶圓廠前需要做許多面向的考量,包含廠址選擇、設定製程目標、機台選定等,建廠時程的掌握及機台設備的選擇會影響到晶圓廠的廠務設施容量、廠房面積、興建成本、運轉時生產效率和產品成本。現階段一座十二吋晶圓廠的建置成本大約十八億美元,其中採購製程設備和安裝架設就佔約十五億美元;對於一座每月投產三萬片十二吋晶圓的晶圓廠,不包括製程設備或其它設施的運轉成本,每年生產的成本就需要約六至七億美元。就因半導體廠投資金額如此高,故如何有效地掌握十二吋晶圓廠興建時程及各相關環節的合作,就顯得非常重要了。本研究是以半導體微影製程角度來做論述,並藉以快速掌握新建廠房的關鍵規格,增加建廠效率及縮短建廠時程,使半導體廠商可以有效掌握產品推出時程及大幅降低投資成本。
本文將實際以台中科學園區某新廠為例,該廠自規劃、破土到第一片晶圓產出,以破紀錄約十四個月的時間即達到試產完成目標。本論文將針對該廠優異表現,以晶圓廠微影工程角度來探討自設計規劃、廠房土建、廠務設施容量規劃、專案執行、工安管理、機台配置規劃、機台搬入、二次配裝機、試產、及量產等過程,藉以瞭解掌握新建廠工程專案之關鍵成功要素,並以結果來檢視最初規劃時所訂定的規格。本研究是首度以微影工程使用者的角度來探討新建十二吋廠晶圓廠的過程及規格檢視,期望藉由建廠模式之建立,提供有效率地掌握高科技廠房建廠時程之準則,以符合市場需求並達成降低業者成本之目的。


A semiconductor wafer fab is a very sophisticated and complex manufacturing environment with between 250 to 300 types of processing tools to execute hundreds to thousands of process steps. Many decisions need to be made before constructing a new wafer fab, including site location, a technology road map, schedule control, and tool selection. Among them, schedule control and tool selection are the most critical factors, because they have major impact on facility design capacity, fab footprint, construction cost, running efficiency, and production cost. The most advanced wafer fab costs as much as US$1.8 billion. Of this amount, US$1.5 billion is for the purchasing of process equipment and installation fees. The average annual operation cost of a 12-inch wafer fab with a monthly output of 30,000 wafers is between US$ 600 to 700 million, excluding the cost of acquiring process equipment and other facility operation costs. Due to the huge investment necessary for setting up a semiconductor fab, it is crucial to control the schedule of the fab and the seamless cooperation among all the construction processes. Since semiconductor lithography is the most critical process to semiconductor manufacturing, this study investigates the fab construction process, from this point of view. By taking control of the key processes of a fab facility, we can increase fab setup efficiency and minimize construction time. Therefore, the time-to-market schedule of a semiconductor fab can be predicted, and the investment cost can be reduced immensely.
This case study used a newly set up fab located in Tai-Chung Scientific Park, which has set a record for the completion of planning, ground breaking, and first silicon yielding within 14 months. In this study, we will discuss the execution process of this successful fab construction based on fab module engineering aspects, including fab building construction, facility utilities capacity planning, project execution, industrial safety management, risk management, layout planning, tool move-in, hook up, pilot run, and production run. Since the proper execution of each step is critical to the subsequent steps, this study identifies the essential elements for the success of each step and also evaluates the fitness of the initial specifications based on the final performance. The study here is the first one to discuss the 12”Wafer FAB set up project and key SPEC review according to user aspect, which is Photolithography engineering. The results of this study can provide guidelines for starting future high-tech fab projects more efficiently to better meet future market demand and significantly reduce investment.

封面內頁 指導教授推薦書 考試委員會審定書 中文摘要.......................I 英文摘要.......................II 誌謝........................III 目錄.........................01 圖目錄........................04 表目錄........................06 第一章 緒論.......................07 1.1 研究背景..................07 1.2 研究動機..................10 1.3 論文架構..................11 第二章 微影區對廠房設計的要求.........13 2.1 半導體廠房之設計..............13 2.2 微影技術的基本介紹.............14 2.3 掃描式曝光對準機台的振動規格........16 2.4 廠址選定..................16 2.4.1 國際通用振動標準...........17 2.4.2 高速鐵路對廠房振動的影響.......17 2.5 SWOT 分析................18 2.6 微影區對廠房設計之特殊需求........19 2.6.1 潔淨度控制..............20 2.6.2 加裝靜電消除器............22 2.6.3 光罩保存環境.............23 2.6.4 微影區化學品安全防護.........27 2.7 微影機台搬入之相關事項..........29 2.7.1 機台設備運送.............30 2.7.2 卸貨碼頭至無塵室的搬運方式......30 第三章 新建廠務設施系統專案執行.......32 3.1 專案經理人與執行之架構..........32 3.2 各專案人員職責說明............32 3.3 設計流程說明...............33 3.4 品質管制流程...............35 3.5 工程進度控管...............35 第四章 微影機台之裝機流程...........37 4.1 機台位置規劃 ...............37 4.2 管路連接施作工程.............38 4.2.1 統包的優點..............38 4.2.2 主管路設計及施工...........38 4.2.3 繪製 Micro layout 圖.........40 4.3 防震基座................41 4.3.1 防震基座的種類............42 4.3.2 防震基座之施工............42 4.3.3 防震基座測試.............43 4.4 機台搬入................45 4.4.1 機台搬入前之載重測試.........45 4.4.2 機台入庫進貨管理及搬運方式......46 4.5 自動化設施................47 4.5.1 自動晶圓搬運設備............47 4.5.2 自動晶圓及光罩儲存設備.........47 第五章 晶圓試產及量產............49 5.1 無塵室實際環境數據結果..........49 5.1.1 微影區內氨氣濃度比較.........49 5.1.2 環境溫溼度比較............51 5.1.3 微影機台實際振動值..........52 5.2 晶圓製造流程介紹.............53 5.3 晶圓六大製程區..............54 5.4 試產投入的晶圓類別............55 5.5 試產時程之掌控..............56 第六章 結論與建議..............58 6.1 結論...................58 6.2 建議...................59 6.3 個案之新廠建廠過程大事紀.........59 參考文獻...................61

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