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研究生： 黃奕翔
Yi-hsiang Huang
論文名稱： 短波長光源與非接觸浸潤式之無光罩微影系統研發暨其應用
Development and application of non-contact immersion maskless lithography system using short wavelength light source
指導教授： 鄭正元
Jeng-Ywan Jeng
口試委員: 鄭逸琳
Yih-Lin Cheng
張復瑜
Fuh-Yu Chang
趙偉忠
none
洪基彬
none
學位類別： 博士
Doctor
系所名稱： 工程學院 - 機械工程系
Department of Mechanical Engineering
論文出版年： 2012
畢業學年度： 101
語文別： 中文
論文頁數： 160
中文關鍵詞： 無光罩微影系統 、非接觸浸潤式
外文關鍵詞： maskless lithography system, non-contact immersion
相關次數： 點閱：392  下載：12 
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  •  上一筆

    • 光學加工已經是目前科技中相當重要的一環，其中光微影製程為最重要的積體電路或微機電元件生產技術，由於元件開發往「輕、薄、短、小、低成本」的趨勢進行製程的開發；在微影製程中，傳統的方式已經無法再將尺寸縮小，此時開發出浸潤式微影法來解決尺寸問題，但此方式也衍生出許多的問題，如水份滲入光阻產生光阻的特性改變、水滴殘留造成光阻的顯影失敗、需在塗佈光阻保護層等問題。
    本研究為解決上述之問題，本實驗室自行研發兩種不同曝光光源(分別為藍光波長435nm及紫外光波長365nm)的動態光罩微影系統，利用軟體控制光罩進行曝光，可成功的曝光出微電極及微機電元件圖案並利用灰階曝光製作出不同斜率的菲涅爾透鏡。其因為提升解析度，提出乾式非接觸浸潤式微影並可解決傳統浸潤式微影的問題，乃利用高分子透明薄膜置於水與光阻中間，讓濕製程轉為乾製程成功的解決傳統浸潤濕的問題。並利用不同的薄膜與不同的曝光介質進行曝光，將解析度最高提升到原先的6.6μm降到850nm，並成功的在非接觸浸潤式加上灰階曝光製作出直徑縮小約57%的菲涅爾透鏡，證明此方式可應用建構平面與立體的結構。

    The optical lithography process which was one of the most important optical processes was developed to produce the integrated circuit and micro electromechanical system components. The traditional optical lithography process could not produce small size components. Therefore, a new optical lithography process, immersion lithography method, was developed. Some process issues from traditional immersion lithography process such as characteristics of photoresist changed by penetrating DI water into photoresist, development failed by water droplet on photoresist, coating protection layer on photoresist, etc. In order to solve the above mentioned issues, the dynamic mask lithography system exposure by two different light sources was developed in this study. The mask exposure was designed by the drawing software. The dynamic mask lithography system exposure system could expose the microelectrodes and micro-electromechanical patterns and the Fresnel lens with different slopes. The dry non-contact immersion lithography used a polymer transparent film to separate water and photoresist. Applying dry non-contact immersion lithography increased the exposure resolution and solved the process issues from the traditional immersion lithography process. The resolution was improved from 6.6 um to 850 nm using different polymer transparent films and exposure mediums. The dry non-contact immersion lithography combined with gray-scale exposure reduced about 57% the diameter of Fresnel lens. Those results demonstrated that the dry non-contact immersion lithography could apply to construct the 2-D and 3-D structures.

    中文摘要...................................................................................Ⅰ Abstract………………………………………………………Ⅱ 致謝………………………………………………………...…Ⅲ 目錄...........................................................................................Ⅴ 圖目錄.......................................................................................Ⅹ 表目錄....................................................................................XIX 第一章 緒論………………………………………………...….1 1.1前言..................................................................................................1 1.2研究背景及目的………………………………………….……….3 1.3論文架構…………………………………………………………..6 第二章 文獻探討……………………….....……………….......8 2.1 動態光罩微影技術………………………………………….........8 2.1.1 數位微反射鏡元件原理..............................................................9 2.1.2 無光罩使用在微影曝光的演進................................................11 2.2 灰階光罩.......................................................................................19 2.2.1灰階光罩微影技術製作立體微結構..........................................19 2.2.2 DMD灰階微影技術...................................................................22 2.3 菲涅爾透鏡製作方法...................................................................25 2.4 浸潤式微影原理與介紹...............................................................29 2.4.1 浸潤式微影所可能產生的問題................................................34 2.5 顯微鏡工作原理...........................................................................36 2.6 駐波效應…………………………………………………...……37 第三章 浸潤式動態微影系統的設計與建構..........................38 3.1藍光顯微鏡動態光罩微影系統.....................................................39 3.1.1 藍光動態光罩系統改裝............................................................40 3.2 紫外光動態光罩微影系統改裝...................................................42 3.2.1 紫外光光源................................................................................42 3.2.2 DLP內部機電改裝..................................................................44 3.2.3 三眼式顯微鏡............................................................................45 3.2.4 紫外光動態光罩微影系統........................................................47 3.2.5 高解析度動態光罩微影系統....................................................49 3.3 非接觸浸潤式曝光設計...............................................................52 3.3.1 非接觸浸潤式對光學性質的影響............................................53 3.4浸潤式薄膜夾治具設計與製作....................................................55 第四章 浸潤式動態光罩微影系統製程與實驗......................59 4.1 微影曝光流程...............................................................................59 4.1.1試片清洗......................................................................................59 4.1.2 去水烘烤....................................................................................61 4.1.3 光阻的旋佈與介面活性劑(六甲基二矽氮烷) .........................61 4.1.4 軟烤............................................................................................62 4.1.5 光罩設計方式與對位方式........................................................63 4.1.6 浸潤式曝光方式........................................................................65 4.1.7 顯影............................................................................................66 4.2 系統解析度與實驗設計...............................................................67 第五章 非接觸式藍光動態光罩系統實驗與分析..................71 5.1 藍光動態光罩微影系統-空氣中線寬曝光..................................71 5.2 藍光動態光罩微影系統-平面元件圖案曝光..............................73 5.2.1 藍光動態光罩微影系統-LED電路曝光..................................73 5.2.2 藍光動態光罩微影系統-特殊LED電路曝光.........................75 5.3非接觸浸潤式曝光法對光學性質的影響.....................................76 5.4 非接觸浸潤式藍光動態光罩微影系統實驗...............................78 5.5小結.................................................................................................79 第六章 非接觸浸潤式紫外光動態光罩系統..........................80 6.1 紫外光動態光罩微影系統...........................................................80 6.2 高解析度紫外光動態光罩微影系統...........................................85 6.2.1 高解析度紫外光動態光罩微影系統解析度測試....................87 6.2.2空氣中液態電極曝光實驗結果.................................................92 6.2.3空氣中梳狀致動器曝光實驗結果..............................................95 6.3 紫外光動態光罩系統利用灰階曝光製作立體結構...................99 6.3.1灰階曝光：微透鏡陣列製作.....................................................100 6.3.2灰階曝光：非涅爾透鏡結構製作............................................104 6.3.2.1 灰階間隔對非涅爾透鏡外形的影響....................................107 6.3.2.2 灰階間隔對非涅爾透鏡深度的影響....................................114 6.3.2.3 灰階間隔對非涅爾透鏡外環斜率的影響............................115 6.3.2.4 非涅爾透鏡焦點距離測試....................................................116 6.4 紫外光動態光罩非接觸浸潤式微影..........................................120 6.4.1 非接觸浸潤式在不同曝光介質下對解析度的影響...............122 6.4.2非接觸浸潤式在不同高分子薄膜下對解析度的影響............127 6.5 非接觸浸潤式灰階曝光製作菲涅爾透鏡..................................129 第七章 結論與未來研究.........................................................131 7.1 藍光動態光罩非接觸浸潤式曝光系統.....................................131 7.2 紫外光動態光罩非接觸浸潤式曝光系統..........................,......131 7.2.1 紫外光動態光罩解析度測試..................................................132 7.2.2 灰階曝光：微透鏡與菲涅爾透鏡..........................................132 7.3紫外光動態光罩非接觸浸潤式曝光系統解析度測試..............132 7.3.1紫外光動態光罩非接觸浸潤式曝光系統進行灰階曝光.......133 7.4 未來研究.....................................................................................133

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