研究生: |
張益華 Yi-Hua Chang |
---|---|
論文名稱: |
250–1050 nm 紫外光至近紅外波段之微型高光譜儀系統優化設計 Optimal Design of Miniature Hyperspectrometer System from Ultraviolet to Near Infrared Light Band for 250 to 1050 nm |
指導教授: |
柯正浩
Cheng-Hao Ko |
口試委員: |
李敏凡
Min-Fan Lee 沈志霖 Chin-Lin Shen |
學位類別: |
碩士 Master |
系所名稱: |
工程學院 - 自動化及控制研究所 Graduate Institute of Automation and Control |
論文出版年: | 2020 |
畢業學年度: | 108 |
語文別: | 中文 |
論文頁數: | 87 |
中文關鍵詞: | 紫外光至近紅外 、高光譜儀 、光譜解析度 、半高全寬 、聚焦縱深 |
外文關鍵詞: | UV-Vis-NIR, Hyperspectrometer, Spectral resolution, Full width at half maximum, Depth of focus |
相關次數: | 點閱:350 下載:0 |
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摘要
本研究欲設計波長250-1050 nm Offner形式的紫外光-可見光-近紅外波段微型光譜影像儀,設計前須選定光源發散角、光譜成像面大小、凹面鏡曲率、光柵條紋間距、繞射階數,以上述規格進行Offner系統參數計算,並定義解像方向為X方向、解光譜方向為Y方向,光線行進方向為Z方向。
該光學系統的體積大幅縮小,使光譜儀增加攜帶的方便性。其中系統設計之光學元件皆採用市售元件,增加元件取得方便性,並降低光譜儀的製作成本。
該光學系統模型之建立採用光學/成像系統設計分析軟體 CODE V進行建模,為降低該光學系統製造成本,於建模時藉由調變光柵每單位長度內的刻痕,使光學系統需使用之反射鏡符合市售元件規格,並於確認各光學元件後進行系統優化,使該光學系統可達最佳空間解析度,利用優化將偵測器各波段成像斑點進入繞射極限內,在此研究利用450 nm 作為優化波段。
為了能精確分析波段的成像品質,將波段分波長250 nm、450 nm、650 nm、850 nm、1050 nm各別分析。
此光學系統最終確定之凹球面鏡曲率半徑為50 mm,光柵間距為4.1 μm,整體Offner系統大小為 70 mm × 90 mm × 70 mm,點光源光譜總解析度為0.68–2.10 nm,狹縫光源光譜總解析度為3.12–3.60 nm。
而後利用光線追跡軟體TracePro模擬真實情況,並驗證建模軟體CODE V的結果正確性。其中,點光源搭配底片規格之最佳影像解析度為1.94–1.98 μm,光譜總解析度為0.44–1.70 nm;狹縫光源搭配偵測器規格之最佳影像解析度為18.75–19.04 μm,光譜總解析度為3.16–3.49 nm,皆與CODE V設計結果相符,偵測器聚焦縱深約為0.23 mm。
Abstract
In this study, design an ultraviolet-visible-near infrared multiple miniature Offner spectrometer with wavelength of 250-1050 nm. Before designing, the FOV of the light source, the size of the spectral image, the Radius of the concave mirror, the grating pitch, and the diffraction order must be determined in the above manner. Perform Offner system parameter calculation, and define the spatial direction as the X direction, the spectral direction as the Y direction, and the light travel direction as the Z direction.
Use the optical simulation software Code V to create the model. By adjusting the grating pitch, a hyperspectrometer imager that meets the design specifications can be created. The radius of curvature of the spherical mirror is 50 mm, the grating pitch is 4.10 μm, and the size of the Offner system is about 70 mm × 90 mm × 70 mm.
Trace Pro is used to trace the light for simulation to verify the Code V results and analyze them in the most realistic imaging situation, total spectral resolution of 0.68-2.10 nm and an image resolution of 4.08-14.30 μm.
The real imaging situation with slit source and detector specifications, has a total spectral resolution of 3.16-3.49 nm and an image resolution of 18.75-19.04 μm. It is almost the same as the total resolution of the CODE V spectrum with the slits source.
Finally, for the best efficiency of the concave mirror, the blaze wavelength is used for compensation, and the short side of the mechanical processing is too short to be processed, so the left angle of the blaze angle is 6.70 ° and the blaze wavelength is 800 nm.
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