研究生: |
何軾 Shih - Ho |
---|---|
論文名稱: |
以氧化矽及氧化鋅雙散射層作為光捕捉結構應用於矽基薄膜太陽電池之研究 Dual Scattering Layers of silica/ZnO as Light Trapping Structure for Silicon Thin Film Solar Cell |
指導教授: |
洪儒生
Lu-Sheng Hong |
口試委員: |
周賢鎧
Shyan-kay Jou 陳良益 Liang-Yih Chen |
學位類別: |
碩士 Master |
系所名稱: |
工程學院 - 化學工程系 Department of Chemical Engineering |
論文出版年: | 2013 |
畢業學年度: | 101 |
語文別: | 中文 |
論文頁數: | 91 |
中文關鍵詞: | 單一分散氧化矽膠體 、氧化鋅 、光散射層 、霧度 、光捕捉 、透明導電氧化物 、矽薄膜太陽能電池 |
外文關鍵詞: | monodisperse colloidal silica, zinc oxide, light scattering layer, light trapping, diffuse transmittance, transparent conductive oxide, silicon thin film solar cell |
相關次數: | 點閱:297 下載:0 |
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首先利用溶膠-凝膠法製備氧化矽散射層,藉改變氨水濃度、乙醇比例、分散劑劑量等氧化矽膠體合成條件,探討製備出的氧化矽球體散射層表面形態及其透光特性。實驗結果顯示,當控制氧化矽粒徑為400 nm、分散劑PVP-K30重量百分比15 %、及兩階段旋轉塗佈轉速為3000 rpm/4000 rpm時,可製作出粒子均勻分佈透光率達90 %以上且對600 nm波長的光透過散射率達30 %的氧化矽散射層。
接著於氧化矽粒子層上沉積具粗糙化散射結構的(110)晶面擇優生長之ZnO薄膜,完成雙散射層結構。最後則採用濺鍍或化學氣相沉積法完成TCO薄膜的製備。
元件試作部份,我們利用射頻電漿輔助化學氣相沉積裝置製作單接面非晶矽薄膜太陽能電池,藉由p+型窗口層的厚度改變及退火處理後得到元件特性如,開路電壓、短路電流及填充係數分為784 mV、14.9 mA/cm2及34.2 %,光電轉換效率4.0 %。
Silica/ZnO dual scattering layers coated on glass substrates were applied for fabrication of silicon thin film tandem solar cell. First of all, sol-gel method was used to make mono-dispersed silica particle layer as the silica light scattering layer. Preparation conditions was the concentration of ammonium hydroxide, the proportion of ethanol and the quantity of dispersing agent were systematically varied so as to investigate the morphological and optical properties of the silica scattering layer. Through spin-on a gel with silica particles 400 nm in size dispersed in 15 wt% of PVP-K30 dispersant using two step spin at 3000 rpm/4000 rpm, an effective silica scattering layer was established. Then, ZnO layer with the characteristic hexagonal (110) pyramidal surface structure was deposited on the scattering layer. Finally, TCO layer such as Ga-doped ZnO or Al-doped ZnO was grown on the ZnO layer to constitute a complete TCO glass.
For device, we fabricate amorphous silicon p-i-n thin film solar cell by RF-PECVD system. The short-circuit current, open-circuit voltage and fill factor of device were 14.9 mA/cm2, 784 mV and 34.2 %, respectively. The optoelectronic conversion efficiency of 4.0 % was achieved.
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