四甲基氫氧化銨(TMAH)在現今被廣泛使用於薄膜晶體管液晶顯示器(TFT-LCD)及半導體工業製程中。因四甲基氫氧化銨具毒性且含有氮源，故在排放前必需經過特別的廢水處理程序。在此研究中，探討利用活性碳對四甲基氫氧化銨的吸附現象。在實驗中活性碳(WAKO)有最佳的結果，故更進一步藉由硝酸氧化作用(NA-WAKO)，氧氣電漿處理(P10-WAKO)及矽含浸法(SM-WAKO 0.5)進行活性碳表面改質，並對含有四甲基氫氧化銨的廢水進行吸附。本實驗利用氮的吸附/脫附，掃描式電子顯微鏡，酸鹼值，界達電位，表面官能基定量及傅立葉轉換紅外線光譜儀分析活性碳的物理及化學性質。

經由表面改質的活性碳成功地改變其表面官能基及表面電荷特性，但比表面積並無增加。當平衡時間控制在24小時左右時四甲基氫氧化銨可以完全被吸附。此外，依動力學研究顯示偽二階(pseudo-second-order) 動力學模式模擬出的吸附數據比偽一階(pseudo-first-order) 動力學模式更加符合，而經由內部粒子擴散模組的計算下顯示其吸附四甲基氫氧化銨時粒子的擴散為速率決定步驟。實驗數據與蘭謨爾等溫吸附模式(Langmuir isotherm)相符合。由等溫吸附模式發現，理論吸附密度分別為27.77 mg/g (WAKO)，37.46 mg/g (NA-WAKO)，32.83 mg/g (SM-WAKO 0.5)及29.03 mg/g (P10-WAKO)。一般來說酸鹼值為重要的影響因素, 活性碳在鹼性的條件下易吸附四甲基氫氧化銨, 而在升溫的條件下則會影響蘭謨爾吸附常數(b)及吸附量。藉由相關的熱力學參數發現吸附現象為自發且為放熱程序。即使使用0.1 N的鹽酸使活性碳再生並且重複五次的實驗, 其脫附的結果顯示不管是WAKO或NA-WAKO都沒有太大的改變。最後可以得到的結論為活性碳吸附四甲基氫氧化銨的機制為靜電吸附。

Currently, tetramethylammonium hydroxide (TMAH) is widely used in thin-film transistor liquid crystal display (TFT-LCD) and in semiconductor processing industries. Because of its toxicity and nitrogen content, TMAH-containing wastewater has to undergo a proper wastewater treatment before discharge. In this study, several commercial activated carbons were used to study TMAH adsorption. The carbon with the best performance (WAKO) was further modified by nitric acid oxidation (NA-WAKO), oxygen plasma (P10-WAKO), and silica impregnation (SM-WAKO 0.5); and were used to adsorb wastewater containing TMAH. These activated carbons were characterized both physically and chemically, including nitrogen adsorption-desorption, scanning electron microscopy, pH drift, zeta potential measurement, Boehm titration, and Fourier transform infrared spectroscopy.

The modifications of activated carbons were found to successfully alter the surface functional groups and surface charge properties of activated carbons, while the BET analyses showed that surface areas remained practically unchanged. The adsorption of TMAH was completed at the equilibrium time of 24 hours. Furthermore, kinetic study showed that the adsorption could be better represented by pseudo-second-order, while intraparticle diffusion model revealed that the particle diffusion was the rate limiting step in TMAH adsorption. Adsorption isotherms were well-fitted by Langmuir isotherm. As found by the isotherm model, theoretical adsorption density of WAKO was 27.77 mg/g, while those of NA-WAKO, SM-WAKO 0.5, and P10-WAKO were 37.46 mg/g, 32.83 mg/g, and 29.03 mg/g, respectively. pH was found to be the most significant factor and generally, higher pH was favorable for TMAH adsorption. Increase in temperature affected not only the b constant, but also the adsorption capacity. By associated thermodynamic parameters, the adsorption was found to be spontaneous and exothermic. Desorption study revealed that both WAKO and NA-WAKO had no considerable reduction in performance even after five cycles of regeneration by 0.1 N hydrochloric acid. It was proposed that electrostatic interaction was the mechanism of TMAH adsorption on activated carbon.

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