具長波長光散射能力的新型TCO玻璃之開發及其在矽基薄膜太陽電池的應用

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研究生：	張元鴻 YUAN-HUNG CHANG
論文名稱：	具長波長光散射能力的新型TCO玻璃之開發及其在矽基薄膜太陽電池的應用 Fabrication of Newly Developed TCO Glass with Long Wavelength Scattering Property and its Applications in Silicon Based Thin Film Solar Cells
指導教授：	洪儒生 Lu-Sheng Hong
口試委員:	邱正杰 none 葉秉慧 none
學位類別：	碩士 Master
系所名稱：	工程學院 - 化學工程系 Department of Chemical Engineering
論文出版年：	2012
畢業學年度：	100
語文別：	中文
論文頁數：	115
中文關鍵詞：	TCO玻璃、薄膜太陽電池、散射體、光捕捉
外文關鍵詞：	TCO glass, thin film solar cell, scattering layer, light trapping
相關次數：	點閱：210 下載：2
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上一筆

本研究係以射頻矽甲烷電漿輔助化學氣相沉積系統製作非晶矽薄膜太陽電池。實驗結果顯示當[TMB]/[SiH4]=3時成長的p+層在電池應用獲得Jsc=16.81 mV/cm2、Voc=854 mV、F.F=61.26%，光電轉換效率則為8.79%。
另一方面我們以射頻電漿濺鍍法製作透明導電膜AZO得到最低的薄膜電阻率6.5 × 10-4 Ω∙cm，載子遷移率8.5 cm2/V-s，載子濃度為1.1 × 1021 cm-3。搭配以散射體結構層形成完整具光散射能力的TCO玻璃。於上述TCO玻璃上製作出的單接面非晶矽薄膜太陽電池元件的Jsc=17.1 mV/cm2、Voc=754 mV、F.F=52.2%， =6.75%。相較於在Asahi-U玻璃上元件的表現(Jsc=16 mA/cm2)。本研究所開發出的散射TCO玻璃在元件製作上短路電流提升6.9%，顯示散射層確實具有增加光捕捉的效果。

In this thesis, thin film amorphous silicon (a-Si:H) solar cells were fabricated by radio-frequency plasma-enhanced chemical vapor deposition. The result showed the short-circuit current (Jsc), open-circuit voltage (Voc) and fill factor (F.F.) of the cell were 16.81 mA/cm2, 854 mV and 61.26%, respectively, which corresponds an optoelectronic conversion efficiency ( ) of 8.79% when [TMB]/[SiH4]= 3 for the p layer. Second, Al-doped ZnO (AZO) films prepared by sputtering were deposited on glasses. The lowest resistivity of AZO layer obtained was 6.5 ×10-4 Ω∙cm at a film thickness of 800 nm. Finally, we fabricated a newly developed transparent conductive oxide (TCO) glass characterized by a spherical layer. A trial of a-Si:H thin film solar cell fabrication on this new textured TCO glass showed Jsc=17.1 mA/cm2, Voc=754 mV, F.F.=52.5% and =6.75%. Compared with a reference cell prepared on Asahi-U glass, 6.9% improvement in Jsc was obtained, indicating the effectiveness of the light-scattering of the proposed TCO glass.

摘 要	II
Abstract	II
誌 謝	IV
目錄	V
圖索引	IX
表索引	XIVV
第一章 緒論	1
1 前言	1
2 研究動機與目的	4
第二章 理論基礎與文獻回顧	5
1非晶矽薄膜	5
1.1非晶矽的原子結構及其基本特性	5
2 以電漿輔助化學氣相沉積法製備非晶矽薄膜	8
2.1射頻電漿輔助化學氣相沉積法	8
2.2矽甲烷電漿分解程序	9
2.3非晶矽薄膜成長機制	12
3 非晶矽薄膜太陽能電池元件結構及光電轉換原理	14
3.1非晶矽薄膜太陽能電池元件結構	14
3.2非晶矽薄膜太陽能電池光電轉換原理	17
4 應用於矽薄膜太陽電池之透明導電玻璃	18
4.1 光捕捉效應	18
4.2 TCO玻璃的技術現狀	21
第三章 實驗方法與步驟	30
1實驗流程圖	30
2 實驗藥品及氣體	33
3 實驗裝置	35
4 分析儀器	39
4.1表面形態輪廓儀(surface profiler)	39
4.2紫外光/可見光光譜儀(UV/VIS)	40
4.3 IV量測系統(IV)	43
4.4太陽光模擬器(solar simulator)	45
4.5分光效率量測儀(IPCE)	49
4.6掃描電子顯微鏡(scanning electron microscope)	50
4.7霍爾量測儀(Hall measurement)	51
5 實驗步驟	54
5.1玻璃基材清洗	54
5.2成長標準非晶矽薄膜太陽能電池元件	55
5.3成長透明導電膜層	56
第四章 實驗結果與討論	57
1 在Asahi-U玻璃上的非晶矽薄膜太陽電池	57
1.1不同電極製作方法對太陽電池元件的影響	57
1.2 p+窗口層沉積條件對太陽電池元件的影響	63
2 透明導電層的製作	71
2.1以濺鍍法制備AZO透明導電層之光電學性質與結構探討	71
2.2電漿功率密度對AZO透明導電層長膜的結構及光電特性效應	72
2.3溫度對AZO透明導電層長膜的光電特性效應	76
2.4於AZO薄膜上成長非晶矽薄膜太陽電池	80
3以散射體作為光學散射層	82
3.1以濕式製程進行粉狀體的分散並噴塗於玻璃上	82
3.2以漿液固定散射體於玻璃表面的製備	84
3.3 散色層結構層+AZO濺鍍膜的表面型態與光學性質	87
3.4 於散色體+AZO膜結構上之電池試作	90
第五章 結論	93
參考文件	95
作者簡介	100

                                

1. 經濟部能源局，“油價資訊管理與分析系統”.

2. Mullerova, J., Jurecka, S., Sutta, P., and Mikula, M., “Structural and Optical Studies of a-Si:H Thin Films: from Amorphous to Nanocrystalline Silicon” Acta Phys. Slovaca., Vol.55, pp.351-359 (2005).
3. Kasap, S.O., Principles of Electronic Materials and Devices, pp.81 (2006).

4. Shah, A. V., Schade, H., Vanecek, M., Meier, J., Vallat-Sauvain, E., Wyrsch, N., Kroll, U., Droz, C., and Bailat, J., “Thin-Film Silicon Solar Cell Technology” Prog. Photovolt: Res. Appl., Vol.12 pp.113-142 (2004).

5. Miyahara, H., Takai, M., Nishimoto, T., Kondo, M., and Matsuda, A., “Electrode Distance Dependence of Photo-Induced Degradation in Hydrogenated Amorphous Silicon” Sol. Energy Mater. & Sol. Cells., Vol.74, pp.351-356 (2002).

6. Matsuda, A., Takai, M., Nishimoto, T., and Kondo, M., “Control of Plasma Chemistry for Preparing Highly Stabilized Amorphous Silicon at High Growth Rate” Sol. Energy Mater. & Sol. Cells., Vol.78, pp.3-26 (2003).

7. Matsuda, A., “Recent Understanding of the Growth Process of Amorphous Silicon from a Silane Glow-Discharge Plasma” Plasma Phys Contr Fusion., Vol.39, pp.431-436 (1997).

8. Matsuda, A., “Thin-Film Silicon - Growth Process and Solar Cell Application” Jpn. J. Appl. Phys., Vol.43, pp.7909-7920 (2004).

9. Perrin, J., “Plasma and Surface-Reactions During a-Si-H Film Growth” J. Non-Cryst. Solids., Vol.137, pp.639-644 (1991).

10. Kawase, M., Masuda, T., Nagashima, M., Maki, T., Miyamoto, Y., and Hashimoto, K., “Effects of Plasma-Substrate Distance on Properties of Hydrogenated Amorphous-Silicon Deposited from Hydrogen-Diluted Silane” Jpn. J. Appl. Phys., Vol.33, pp.3830-3836 (1994).

11. Robertson, J. and M.J. Powell, “Deposition, Defect and Weak Bond Formation Processes in a-Si:H” Thin Solid Films, Vol.337, pp.32-36 (1999).

12. Robertson, J., “Growth Mechanism of Hydrogenated Amorphous Silicon” J. Non-Cryst. Solids., Vol.266, pp.79-83 (2000).

13. Matsuda, A., Takai, M., Nishimoto, T., and Kondo, M., “Control of Plasma Chemistry for Preparing Highly Stabilized Amorphous Silicon at High Growth Rate” Sol. Energy Mater. & Sol. Cells., Vol.78, pp.3-26 (2003).
14. Carabe, J. and J.J. Gandia, “Thin-Film-Silicon Solar Cells” Opto-Electron. Rev., Vol.12, pp.1-6 (2004).

15. J.Poortmans,V.A., Thin Film Solar Cells Fabrication, Characterization and Application, John Wiley and Sons, pp.182 (2006).

16. J. Muller, B. Rech, J. Springer, and M. Vanecek, “TCO and light trapping in silicon thin film solar cells”Solar Energy, 77, 917 (2004).

17. https://www.agc.co.jp/english/rd/topics_04.html

18. D. Rajesh, J. Tapati, R. Swati, “Degradation studies of transparent conducting oxide:a substrate of microcrystalline silicon thin film solar cells” Solar Energy Materials & Solar Cells, 86, 207 (2005).

19. http://www.oerlikon.com/ecomaXL/index.php?site=SOLAR_EN_tco_1200

20. S. Faÿ, J. Steinhauser, S. Nicolay, C. Ballif, “Opto-electronic properties of rough LP-CVD ZnO:B for use as TCO in thin-film silicon solar cells” Thin Solid Films, Vol.518, 2961 (2010).

21. http://www.vaat.biz/content/eng/photovoltaics.htm

22. T. Tohsophon, J. Hupkes, H. Siekmann, B Rech, M Schultheis, N. Sirikulrat, “High rate direct current magnetron sputtered and texture-etched zinc oxide films for silicon thin film solar cells“ Thin Solid Films, Vol.516,pp.4628-4632 (2008).

23. M.Berginski,B.Rech,J.Hüpkes,H.Stiebig, M. Wuttig, “Electrochemical texturing of Al-doped ZnO thin films for photovoltaic applications”Proc. of SPIE, 6197, 61970Y, (2006).

24. O. Kluth, B. Rech, L. Houben, S. Wieder, G. Schöpe, C. Beneking, H. Wagner, A. Löffl, H.W. Schock, “Texture etched ZnO:Al coated glass substrates for silicon based thin film solar cells” Thin Solid Films, Vol.351, 247 (1999).

25. M.Dimer, “Improved TCO for thin-film silicon solar cells”, Thin-Film Industry Forum, Berlin, (2010).

26. Hishikawa, Y., Sasaki, M., Tsuge, S., and Tsuda, S., “Effect of Heating SiH4 on the Plasma Chemical-Vapor Deposition of Hydrogenated Amorphous-Silicon” Jpn. J. Appl. Phys., Vol.33, pp.4373-4376 (1994).

27. Hishikawa, Y., Nakamura, N., Tsuda, S., Nakano, S., Kishi, Y., and Kuwano,Y.,“Interference-FreeDeterminationof the Optical-Absorption Coefficient and the Optical Gap of Amorphous-Silicon Thin-Films” Jpn. J. Appl. Phys., Vol.30, pp.1008-1014 (1991).

28. Hishikawa, Y., Tsuge, S., Nakamura, N., Tsuda, S., Nakano, S., and Kuwano,Y.,“Device-QualityWide-GapHydrogenatedAmorphous-Silicon Films Deposited by Plasma Chemical Vapor-Deposition at Low Substrate Temperatures” J. Appl. Phys., Vol.69, pp.508-510 (1991).

29. Li, S. B., Wu, Z. M., Li, W., Jiang, Y. D., and Liao, N. M., “Influence of Substrate Temperature on the Microstructure and Optical Properties of Hydrogenated Silicon Thin Film Prepared with Pure Silane” Phys. B, Vol.403, pp.2282-2287 (2008).

30. C.R.A. Catlow , “Defects and disorder in crystalline and amorphous solids”.

31. Lucie.Prusakova,Sona.Flickyngerova,Marinus.Fischer,Ivan Novotny,MartijnTijssen,Marie.Netrvalova,Miro.Zeman,Vladimir Tvarozek,Pavol Sutta, “Analysis of single junction a-Si:H solar cells grown on different TCO’s”Vacuum, 86,765-768 (2012).

32. Yu Sup Jung, Hyung Wook Choi, Kyung Hwan Kim,Sang Joon Park,Hyon Hee Yoon, “Properties of AZO Thin Films for solar cells deposited on polycarbonate substrates”,Journal of the Korean Physical Society,Vol. 55,No 5,1945-1949 (2009).

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