本論文使用立體光罩(3D-mask)與近接式曝光(proximity exposure)製作圓錐型微探針陣列(micro-probe array)模仁。根據熱熔法(thermal reflow)的限制，定義出五種透鏡尺寸，其曲率半徑Rc之順序為：Lens C > Lens E > Lens D > Lens A > Lens B。孔徑光闌Daperture皆固定在0.5倍的透鏡直徑Dlens。光源為一個光通量120 Watt/m2的近紫外光波段。首先，藉由光學模擬軟體，分析出各透鏡所對應的曝光間隙g。接著，配合試片模型的設計，運算出不同等級的吸收輻照圖，建立出顯影後的微探針模仁輪廓。為了探討紫外光的能量分佈，本文定義出三組方案，方案一僅考慮折射係數n；方案二多考慮試片的消光係數k；而方案三考慮所有的材料光學性質，其理由為材料性質的組合會間接影響系統邊界條件。除此之外，影響微探針模仁外型之參數還包含：微透鏡尺寸、孔徑光闌Daperture、曝光間隙g。
在方案一，正光阻AZ4620無法吸收紫外光線的功率，故無法使光阻漂白(bleached)；在方案二，微探針模仁直徑Dprobe之順序為：Lens E > Lens D > Lens C > Lens A > Lens B，微探針模仁高度Lprobe皆固定為12 μm；而在方案三，模仁直徑Dprobe的大小順序則為：Lens E > Lens C > Lens D > Lens B > Lens A，模仁高度Lprobe皆固定在10 μm。由模擬輸出得知，限制模仁高度Lprobe的原因為材料性質之組合，或光阻的吸收率(absorptance)，其中方案三最接近實際的情況。模仁直徑Dprobe的主要限制為光線繞射的分佈，其參數權重大小順序：透鏡直徑Dlens > 透鏡高度h > 曝光間隙g，其中繞射程度與Dlens以及g成正比、與h成反比。最後，以方案三的條件進行光線追跡模擬，將Lens A系統中的孔徑光闌Daperture 縮小至0.2倍透鏡直徑Dlens，其輸出結果可獲得一個理想的微探針模仁幾何，Lprobe = 10 μm，Dprobe = 26 μm，AR (aspect ratio) = 0.4。

In this study, an mold of micro-probe array was fabricated by a 3D-mask with proximity exposure. By the limit of thermal reflow, five kinds of microlenses were defined. The ranking of radius of curvature (RC) of microlens: Lens C > Lens E > Lens D > Lens A > Lens B. The aperture stop (Daperture) was half of diameter of lens (Dlens). The source was ultraviolet light with a 120 Watt/m2 flux. The exposure gap was calculated from 3D-mask, and establish the geometry of the mold of micro-probe array by the absorbed irradiance maps of the different levels calculated with the designed model of positive photoresist AZ4620 by optical software, respectively. In order to discuss the energy of ultraviolet light, this study defined three cases for comparing. In Case 1, the refractive index (n) was only considered ; in Case 2, the extinction value (k) of specimen was also considered; in Case 3, the complex refractive index was all considered. Different combinations of material properties will influence boundary conditions of every exposure system. In addition, the other parameters of the shape of micro-probe included diameter (Dlens) and height (h) of micro-lens, sizes of aperture stop, exposure gap (g).
In Case 1, positive photoresist AZ4620 did not absorb any energy from UV light, so it wasn't bleached; in Case 2, the ranking of diameter of the mold of micro-probe (Dprobe): Lens E > Lens D > Lens C > Lens A > Lens B, and the depth of the mold of micro-probe (Lprobe) was 12 μm; in Case 3, the ranking of Dprobe: Lens E > Lens C > Lens D > Lens B > Lens A, and Lprobe was 10 μm. Through the outputs, the limit of Lprobe was the combination with different material properties, or the absorptance of positive photoresist. Case 3 was the most close to reality. Dprobe was limited by the range of diffraction. The ranking of the influence of parameters: Dlens > h > g. The diffraction effect is directly proportional to Dlens and g and is inversely proportional to h. (The larger Dlens and g are, the lager diffraction is, but the situation of h was upside down.) Finally, change Daperture into one fifth of Dlens, and simulate the system of Lens A with Case 3. The outputs were Lprobe =10μm, Dprobe =26μm, AR (aspect ratio)=0.4.

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