電極材料種類與性質對光-電芬頓系統之運行效率有顯著影響。本研究選用純鈦金屬(Ti)作為電極基材，以陽極處理法建構二氧化鈦奈米管狀結構(TiO2 nanotube array, TNA)，再經退火處理及透過電沉積技術複合三氧化鎢於基材表面(WO3/TNA/Ti)完成電極製備，冀能優化Ti電極之光催化性能。過程並佐以田口方法(Taguchi method)分別針對陽極處理電壓、陽極處理時間及電沉積時間進行性能測試。
結果顯示，陽極處理電壓40 V、陽極處理時間5分鐘及電沉積時間15分鐘所製備之WO3/TNA/Ti電極，其能帶隙(Eg)減為2.87 eV，可提高紫外光和可見光照射下之光催化性能。於光-電芬頓系統進行30分鐘之Rhodamine B染料降解，其降解率為81.32 %，而降解反應常數為5.59 × 10^-2 min^-1，分別為未修飾Ti電極之2.54倍及3.43倍。綜上，WO3/TNA/Ti電極可促使光-電芬頓系統運行效率與電極光催化性能獲得提升。

The types and properties of the electrode material bring in a significant effect for efficiency of the photoelectro Fenton system. In this study, pure titanium (Ti) was used as the substrate. The titanium dioxide nanotube array (TNA) was constructed by anodization method. After annealing, the electrodeposition technique was used to composite tungsten trioxide (WO3) on the surface of substrate. To optimize photocatalytic performance of the Ti electrode, the Taguchi method was used to test the property of anodization voltage, anodization time and electrodeposition time.
The results show that WO3/TNA/Ti electrode prepared with anodization voltage of 40 V, anodization time of 5 minutes and electrodeposition time of 15 minutes can let the bandgap energy (Eg) reduced to 2.87 eV. This process can improve the photocatalytic performance under ultraviolet light and visible light illumination. The degradation of Rhodamine B dye in the photoelectro Fenton system for 30 minutes, the degradation rate is 81.32 % and the reaction coefficient is 5.59 × 10-2 min-1, which are 2.54 and 3.43 times then Ti electrode, respectively. In summary, the WO3/TNA/Ti electrode can promote the efficiency of the photoelectro Fenton system and photocatalytic performance for electrode.

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