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研究生: 李瑞陽
Jui-Yang Lee
論文名稱: 殘留雙折射和光學性質量測應用於射出成形之研究
Research of Residual Birefringence and Optical Properties Measured by injection Molding
指導教授: 陳炤彰
Chao-Chang Chen
口試委員: 楊申語
Sen-Yeu Yang
李世榮
Shah-Rong Lee
黃招財
Chao-Tsai Huang
謝宏麟
Hung-Lin Hsieh
學位類別: 碩士
Master
系所名稱: 工程學院 - 機械工程系
Department of Mechanical Engineering
論文出版年: 2015
畢業學年度: 103
語文別: 中文
論文頁數: 127
中文關鍵詞: 殘留雙折射白光光彈射出成形非球面透鏡調制轉換函數
外文關鍵詞: Residual birefringence, White light photoelastic, Injection molding, Aspheric lens, Modulation transfer function
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  • 本研究研發白光光彈軟體對殘留雙折射進行量測,並使用自組式偏光儀量測射出成形之非球面透鏡,探討非球面透鏡殘留雙折射(Residual birefringence)、調制轉換函數(Modulation transfer function, MTF)、有效焦長(Effective focal length, EFL)與曲率半徑誤差(Radius error)。藉由兩階段射出成形實驗,優化射出成形殘留雙折射,實驗結果顯示V/P切換點、保壓壓力以及充填速度為影響殘留雙折射之主要參數。將V/P切換點提前、設定兩段式充填與降低保壓壓力能有效降低最大條紋級數約32.7%。使用自組式MTF量測儀進行量測,得知最大條紋級數小於2.76N時,解像能力MTF50約可提升13.6%,MTF10最大能提升約40%。商用機台於110 lp/mm時可提升約15.4%,由此可知殘留雙折射確實為影響透鏡成像品質的成因之一,而透鏡之曲率誤差與殘留雙折射對EFL與MTF具有影響性,當殘留雙折射愈大時,EFL誤差較低但成像品質較差。研究結果顯示白光光彈軟體能有效量化條紋級數1N以下之光彈條紋,其條紋級數誤差最大約為0.0298N,本研究研發之白光光彈軟體能夠降低幾何輪廓對產品整體殘留雙折射之判斷誤差,因此不同材料及幾何形狀之產品皆可透過白光光彈軟體進行量測,未來可將本研究應用於顯微鏡和手機鏡頭之高解析塑膠射出成形鏡片分析


    White light photoelastic theory is used to design residual birefringence analysis software and also used polariscope to measure the aspheric lens fabricated by injection molding. Moreover, the residual birefringence, modulation transfer function, effective focal length and radius error of aspheric lens have been investigated and discussed. Through the two-stage injection molding experiments, it can achieve the residual birefringence optimization. The main parameters include V/P position, packing pressure and filling velocity. Setting V/P position and two stage filling with lower packing pressure, it can reduce fringe order amount 32.7%. Results of self-assemble MTF measurement shows that the fringe order in image quality is less than 2.76N and MTF50 can be promoted to 13.6%, even MTF10 can be promoted to 40%. On the other hand, the commercial MTF measurement in 110 lp/mm the MTF can be improved to 15.4%. Through this result, residual birefringence is one of the factors which can affect lens image quality. Radius error and residual birefringence can also affect EFL and MTF. The larger residual birefringence causes less EFL error and decreases image quality. A white light photoelastic software can been modified and used to quantify fringe order less than 1N and maximize fringe order error approximately 0.0298N. Finally this study can adapt to measure difference material and geometry product. Future study can focus on high-resolution plastic lens for microscopic phone camera.

    摘要 I Abstract II 誌謝 III 目錄 V 圖目錄 VIII 表目錄 XIII 符號表 XIV 第一章 導論 1 1.1. 研究背景 1 1.2. 研究動機與目的 4 1.3. 研究方法 5 1.4. 論文架構 6 第二章 文獻回顧 8 2.1. 光彈技術文獻回顧 8 2.2. 白光光彈技術文獻回顧 11 2.3. 射出成形殘留應力分析文獻回顧 16 2.4. 光彈相關專利回顧 21 2.5. 文獻回顧總結 23 第三章 光彈理論與射出成形殘留應力 24 3.1. 光彈理論 24 3.1.1 線偏振理論 24 3.1.2 圓偏振理論 25 3.1.3 雙折射現象 26 3.1.4 應力光學定律(Stress-optical law) 27 3.2. 射出成形殘留應力 29 3.2.1 射出成形 29 3.2.2 流動導致的殘留應力[26] 30 3.2.3 熱導致的殘留應力[26] 32 第四章 實驗設備與規劃 34 4.1. 實驗設備與材料 35 4.1.1 射出成形實驗設備 35 4.1.2 光彈儀與應力補償法設備 36 4.2. 量測設備 40 4.3. 非球面透鏡射出成形規劃 42 4.3.1 Moldex3D模流分析 42 4.3.2 非球面模具 46 4.3.3 取樣方法 46 4.3.4 成形視窗 47 4.3.5 實驗參數設計 47 4.4. 非球面透鏡量測 52 第五章 偏光儀設計與白光光彈軟體 54 5.1. 偏光儀設計流程 54 5.2. 應力光學係數量測 55 5.2.1 光彈應力補償法 55 5.3. 白光光彈軟體設計 56 5.3.1 LUT建立 56 5.3.2 影像處理 57 5.3.3 延遲量搜尋 57 5.4. 白光光彈軟體誤差分析 57 第六章 實驗結果與討論 70 6.1. 模流分析結果 70 6.1.1 流動與熱導致殘留應力 70 6.1.2 充填與保壓階段 72 6.1.3 冷卻階段與整體光學性質殘留應力結果討論 74 6.2. 射出成形實驗結果 76 6.2.1 第一階段射出成形實驗 76 6.2.2 第二階段射出成形實驗 86 6.3. MTF量測結果 93 6.4. 殘留雙折射與曲率半徑誤差對於光學品質之影響 97 6.5. 結果與討論總結 101 第七章 結論與建議 102 7.1. 結論 102 7.2. 建議 103 參考文獻 104 附錄 A Panlite L-1225L物性表 109 附錄 B FANUC ROBOSHOT α-15iA 110 附錄 C 非球面模具設計BOM表 111 附錄 D 調制轉換函數(MTF) 114 附錄 E MASTER PL-C燈源規格 116 附錄 F 白光光彈軟體誤差分析 117 附錄 G 成品圖 120 附錄 H 光彈圖 121 附錄 I 非球面形狀誤差量測結果 123 作者簡介 126

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