研究生: |
廖健智 JIAN-JHIH LIAO |
---|---|
論文名稱: |
具有氮化鎵元件之高頻升壓型功率因數修正器研製 Study and Implementation of a High-Frequency Boost Power Factor Corrector with GaN Device |
指導教授: |
邱煌仁
Huang-Jen Chiu |
口試委員: |
謝耀慶
Yao-Ching Hsieh 劉宇晨 none 劉益華 none |
學位類別: |
碩士 Master |
系所名稱: |
電資學院 - 電子工程系 Department of Electronic and Computer Engineering |
論文出版年: | 2016 |
畢業學年度: | 105 |
語文別: | 中文 |
論文頁數: | 51 |
中文關鍵詞: | 氮化鎵高電子遷移率電晶體 、高頻化 、升壓型功率因數修正 |
外文關鍵詞: | gallium nitride high electron mobility transisto, high-frequency, boost power factor correction |
相關次數: | 點閱:304 下載:9 |
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現今電力電子元件多由矽作為主要的材料,在過去半世紀的研究中發現,矽材料已經逐漸達到物理限制瓶頸,替代矽之新材料也逐漸被發現,包含兩種或更多元素所構成之化合物,這種具有高潛力的半導體稱為「化合物半導體」,尤其以氮化鎵(GaN)電晶體發展最為成熟。與傳統矽功率元件相比,氮化鎵(GaN)具備高電子遷移率、寬能隙、高崩潰電場、低導通電阻及高飽和電子速度等優越條件。
本論文使用GaN FET實現一台操作在300kHz,輸入電壓為85~264Vac,輸出400V的500W升壓型功率因數修正器,效率最高可達97%。
Silicon is the major material of modern power electronics.In the past half century, the study found that the silicon material has gradually reached the physical limit bottleneck. New material compounded of two of more elements has gradually been found to replace silicon.This semiconductor referred to as "compound semiconductor" has a high potential, In particular, gallium nitride (GaN) transistors has the maturest development. Compared with traditional silicon power (GaN) has the adcantages such as high electron mobility, wide bandgap, high breakdown electric field, low on-resistance and high saturated electron speed.
Therefore, this thesis adopts the GaN FET to develop a 300kHz 500W boost power factor corrector with 85~264Vac input and 400V output.The measured efficiency can be up to 97%.
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