本論文之研究目的，為利用常壓電漿沉積兩種不同的前驅物：六甲基二矽氧烷 (hexamethyldisiloxane, HMDSO) 以及三乙氧基矽烷 (3-aminopropyltriethoxylsilane, APTES) ，製備電漿聚合薄膜，並應用於離子釋放及表面生物相容性之探討。在材料表面分析方面，利用不同的分析方法，如場發射式掃描式電子顯微鏡 (field emission scanning electron microscope, FE-SEM)、全反射式傅立葉轉換紅外線光譜儀 (attenuated total reflectance Fourier transform infrared spectroscopy, ATR-FTIR)、橢圓偏光儀 (ellipsometry)、原子力顯微鏡 (atomic force microscope, AFM)、水接觸角量測 (water contact angle, WCA measurement)、及化學分析電子能譜儀 (X-ray photoelectron spectroscopy, XPS) 等方法鑑定以電漿聚合沉積薄膜之物理化學性質，並發展不同的應用。
本論文的第一部份為利用常壓電漿沉積HMDSO，結果顯示所沉積薄膜厚度隨沉積瓦數以及沉積時間增加而增加，其中膜厚與電漿沉積時間具有線性關係。另外，接觸角量測結果顯示，利用常壓電漿於不同沉積瓦數下沉積HMDSO薄膜，於低沉積瓦數50瓦下可製備超疏水薄膜，其水接觸角為143 °；當沉積瓦數增加為140瓦時，表面變為超親水，原因可能為表面碳含量由13% 減少為6%，同時氧含量由49% 上升為54%，其中碳含量下降原因為隨沉積瓦數上升氧氣受激發程度上升，因此氧化單體結構之甲基基團，使得沉積薄膜由有機矽轉變為無機矽，使得表面由疏水性質變為親水性。實驗結果同時顯示，表面親疏水性質主要與沉積時所使用的瓦數有關，薄膜厚度對表面親疏水性質無直接影響。
控制做為阻障層材料之性質，可應用於離子釋放、氣體穿透及藥物釋放等系統，本研究將利用製備的HMDSO薄膜應用於銀離子釋放系統，並且探討表面性質對離子釋放的影響。研究中為了達到修飾銀離子的目的，利用實驗室真空電漿聚合正庚胺 (plasma polymerized heptylamine, HApp) 之技術，於基材表面修飾胺基，並將樣品浸泡於0.1 M硝酸銀溶液中，以2小時以螯合銀離子，接著在樣本上沉積不同親疏水性之HMDSO薄膜，以控制銀離子釋放。銀離子的釋放則用於探討抗菌效果，利用抑菌圈直徑表示抑菌效果，結果顯示表面為親水性之HMDSO薄膜層，相較於疏水薄膜層而言，有較佳之抑菌效果。
於第二部份常壓電漿沉積APTES研究中，主要目的為沉積同時具有SiOx以及胺基兩種官能基的薄膜，並探討其生物相容性。由橢偏儀分析結果可發現，APTES之膜厚與沉積時間呈現線性關係，沉積速率約為2 nm/min，並於ATR-FTIR中可發現胺基之吸收訊號，表示於低瓦數下可成功沉積含胺基的矽氧薄膜於基材表面。藉由XPS分析，得到表面碳元素含量隨沉積時間增加而減少，同時氧與氮含量增加，顯示成功引入胺基，且可與ATR-FTIR結果相應證。在應用方面，藉由LDH (Lactate dehydrogenase assay) 計算貼附於APTES薄膜之L929老鼠纖維母細胞的數目，發現當沉積APTES時間增加，貼附於表面之細胞數目增加，其中，於60分鐘沉積APTES薄膜上之細胞貼附量為12 × 103 cell/cm2為最多。為探討影響細胞貼附的結果，利用AFM分析薄膜表面粗糙度，發現表面粗糙度隨薄膜厚度增加而增加，但薄膜之粗糙度皆低於未經沉積之不銹鋼基材，因此推論粗糙度對於細胞貼附影響程度不高。比較上述研究影響細胞貼附之因素，由實驗結果推論影響程度由高到低排列為、表面官能基、表面親水性、及粗糙度。

The thin films containing SiOx functionalities showed versatilities for the applications in protecting layer, gas penetration barrier, and corrosion resistance layer when coated on metal and plastic materials. Due to the inorganic structure of Si-O-Si bindings, the surface mechanical property of the SiOx coatings was generally considered advantageous. In this study, SiOx containing thin films was deposited by atmospheric pressure plasma jet using two different types of precursors: hexamethyldisiloxane, (HMDSO) and 3-aminopropyltriethoxylsilane (APTES). HMDSO and APTES allowed to functionalize the surfaces of materials with SiOx and the combination of SiOx and amines, respectively. The APPJ deposition was optimized under different plasma parameters including applied power and deposition time. The resultant SiOx containing thin films were characterized by analytical methods such as attenuated total reflectance Fourier transform infrared spectroscopy (ATR-FTIR), Field emission scanning electron microscope (FE-SEM), water contact angle measurement and X-ray photoelectron spectroscopy (XPS).
The results showed that the HMDSO films were successfully deposited on the substrates with good adhesion. The thickness of deposited thin films was modulated by the deposition time and applied power of the APPJ. The surface wettability revealed dramatic variations when the HMDSO films were prepared under different applied power that both superhydrophobic and superhydrophilic HMDSO films were able to be acquired in this study, which was mainly due to the different levels of oxidation. The as-prepared HMDSO films with different wettability were further applied for modulating the release of silver ions by incorporating silver ions prior to the HMDSO coatings. In addition, the effects of silver ion release were evaluated by antibacterial tests. The zone of inhibition results performed on agar plates showed that the maximum antibacterial HMDSO films were found by applying 140 W APPJ deposition, indicating that the hydrophilic SiOx coating might facilitate the ion releases.
The deposition of the thin films containing combined functionalities of SiOx and amines was achieved by depositing APTES. The film thickness was modulated by deposition time and was evaluated by ellipsometry. The results showed that the film thickness of the APPJ deposited APTES grew linearly with the deposition time. ATR-FTIR spectrum revealed the absorbance of amine functional groups at wave number 1563 cm-1, which indicates the surface was successfully functionalized. Moreover, Lactate dehydrogenase assay (LDH) results showed that the cell density on the APTES deposited thin films increased as function of the deposition time, which is most probably due to the inducing of amine functionality for the promotion of the affinity with biomolecules.
In summary, two different SiOx containing thin films were successfully acquired by APPJ deposition using the precursors of HMDSO and APTES. The resultant SiOx containing thin films possess a wide range of wettability which may have great potentials for ion release or delivery system. On the other hand, the amine-rich SiOx films allow to be applied in biomedical related materials.

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