研究生: |
陳茂全 Mao-chuan Chen |
---|---|
論文名稱: |
於CNC工具機進行自動球拋光之定力控制研究 Research on the constant force control of automated spherical polishing on a machining center |
指導教授: |
修芳仲
Fang-jung Shiou |
口試委員: |
陳炤彰
Chao-chang Chen 黃安橋 An-chyau Huang 巴白山 Pai-shan Pa |
學位類別: |
碩士 Master |
系所名稱: |
工程學院 - 機械工程系 Department of Mechanical Engineering |
論文出版年: | 2008 |
畢業學年度: | 96 |
語文別: | 中文 |
論文頁數: | 159 |
中文關鍵詞: | 模糊控制 、定力球拋光 、田口法 、表面粗糙度 |
外文關鍵詞: | fuzzy control, surface roughness improvement, Taguchi’s experimental method, constant force spherical polishing system |
相關次數: | 點閱:371 下載:9 |
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本論文為應用模糊控制在CNC切削中心機上發展定力球拋光加工製程,來克服拋光加工中拋光球磨耗之問題,以改善硬化處理後STVAX塑膠模具用鏡面不銹鋼之表面粗糙度。本研究設計製造一內建荷重計之拋光力感測機構,並將其裝置於拋光槽和加工平台間,最後將電腦、拋光系統、CNC控制器做系統整合,以進行線上定力拋光加工。使用VB 6.0撰寫具有拋光力感測及拋光力模糊控制功能之程式,且在球拋光加工過程中會自動產生拋光力補正NC碼,以達到定力拋光。
以田口實驗計劃法對STAVAX塑膠模具用鏡面不銹鋼找出拋光最佳參數,並用此最佳參數進行定力拋光實驗,經實驗結果得知最佳定力拋光加工參數為:轉速12,000 rpm、磨料粒徑0.3 μm、進給40 mm/min、間距40 μm、拋光液1:10及拋光力0.392 N。先後利用平面擠光與平面定力拋光加工製程,可得到擠光加工後表面粗糙度為Ra 0.07 μm,經定力拋光加工後其表面粗糙度值為Ra 0.01 μm (Rmax 0.13 μm)。而在非球面鏡面模仁上的應用,非定力控制拋光加工後的試件表面粗糙度為Ra 0.0266 μm,定力拋光加工後的試件表面粗糙度可至Ra 0.0168 μm。
The objective of this research is to develop a constant force spherical polishing system using the fuzzy control method, to overcome the wear problem of a polishing ball and improve the surface roughness of the hardened STAVAX plastic mold stainless steel on a machining center. A polishing force sensing device using a load cell, mounted between the slurry container and the machine bed, has been designed and fabricated. To achieve the possible on-line constant force polishing, the NC controller, and a PC have been integrated information-technically. A set of software programmed with Visual Basic 6.0 has been developed to monitor the polishing force, to carry out the fuzzy control, and to generate the NC codes for the machining path of ball polishing. The optimal polishing force used for the polishing force control and the process parameters were determined by the Taguchi’s experimental method. The determined optimal ball polishing parameters with force compensation for plane surface were as follows: the spindle speed of 12,000 rpm, the abrasive size of 0.3 μm, the feed of 40 mm/min, the stepover of 40 μm, the slurry mass concentration of 1:10, and the polishing force of 0.392 N. Using the determined optimal plane force ball polishing parameters with force compensation, the surface roughness of the burnished test specimens could be improved from Ra 0.07 μm on average to Ra 0.01 μm(Rmax 0.13 μm) on average. Applying the optimal plane force surface ball polishing parameters with force compensation to a 3D test carrier of an aspheric surface, a surface roughness of Ra 0.0168μm on average was possible, whereas a surface roughness of Ra 0.0266 μm on average was obtained using the polishing with no force compensation.
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