研究生: |
楊文虎 Wen-hu Yang |
---|---|
論文名稱: |
以近接曝光製作光學增亮膜研究 Study of optical brightness enhancement film fabrication using proximity printing |
指導教授: |
趙振綱
Ching-kong Chao |
口試委員: |
曾垂拱
Chwei-goong Tseng 楊錫杭 Hsi-harng Yang |
學位類別: |
碩士 Master |
系所名稱: |
工程學院 - 機械工程系 Department of Mechanical Engineering |
論文出版年: | 2007 |
畢業學年度: | 95 |
語文別: | 中文 |
論文頁數: | 76 |
中文關鍵詞: | 增亮膜 、近接曝光 、TracePro |
外文關鍵詞: | BEF, proximity printing, TracePro |
相關次數: | 點閱:155 下載:4 |
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本論文為研究以近接曝光製作微結構應用於光學增亮膜之方法,利用兩種不同的光阻:JSR與AZP4620,個別探討其特性。針對負光阻JSR,利用TracePro模擬軟體建構出光學系統,以不同外型尺寸的結構,與現有3M增亮膜做比較。由模擬結果顯示,橢圓結構長軸為20 μm、短軸為10 μm的形式,對於側光式的光源輸出,在整體均勻性有較佳的結果,而背光式的光源輸出,呈現較大的視角;針對正光阻AZP4620,光罩設計參數寬度(w)為35 μm、間隔(d)為20 μm、光罩及基材距離(h)為100 μm,結構寬度為56 μm、鋸齒角度130.43°,比較3M增亮膜後可得到更佳的光源效益。利用近接曝光成型的光學薄膜可有效的降低增亮膜的成本比重,並達到相似的效果。
This thesis presents the optical brightness enhancement film (BEF) fabrication using proximity printing with two different photoresists: JSR and AZP4620 whose properties have been examined in detail. In terms of the negative photoresist JSR, the TracePro software is used to build the optical system, by simulating various shapes and sizes of micro structures, and to compare with 3M products. It is found that the elliptical shape with 20 μm in long axis and 10 μm in short axis has a uniform luminance in the edge lighting and wider view angle in bottom lighting. In terms of the positive photoresist AZP4620, the parameters of the mask with 35 μm in width, 20 μm in pitch and the gap between mask and substrate being 100 μm can get a saw-toothed structure with 56 μm in width and the angle is 130.43°. This geometry can have a better light efficiency comparing with 3M BEF products. Use of proximity printing to fabricate the film can decrease the cost efficiently with having the same function.
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