研究生: |
陳曉帆 Siao-Fan Chen |
---|---|
論文名稱: |
以陰極電弧鍍膜系統鍍製氮化鉻/氮化鋯奈米多層薄膜之研究 The study of nanostructured CrN/ZrN multilayer thin films prepared by Cathode Arc Deposition System |
指導教授: |
王朝正
Chaur-Jeng Wang |
口試委員: |
李志偉
Jyh-Wei Lee 周賢鎧 Shyan-Kay Jou |
學位類別: |
碩士 Master |
系所名稱: |
工程學院 - 機械工程系 Department of Mechanical Engineering |
論文出版年: | 2011 |
畢業學年度: | 99 |
語文別: | 中文 |
論文頁數: | 131 |
中文關鍵詞: | 氮化鉻/氮化鋯奈米多層薄膜 、陰極電弧鍍膜 、雙層週期厚度 、機械性質 |
外文關鍵詞: | Nanostructured multilayer coatings, Cathode Arc Deposition System, bilayer period, mechanical properties |
相關次數: | 點閱:217 下載:2 |
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本研究以陰極電弧鍍膜系統於矽晶片與碳化鎢基材上鍍製共五種氮化鉻/氮化鋯奈米多層薄膜,藉著改變試片在真空腔體內的轉速以控制薄膜的雙層週期厚度。本研究利用低掠角X光繞射儀進行薄膜層之晶相分析,以原子力顯微鏡分析薄膜表面之表面形貌,掃描式電子顯微鏡分析薄膜表面與截面形貌,及奈米壓痕儀及微小維克氏硬度儀,pin-on-disk磨耗試驗機分析薄膜之機械性質,由實驗結果發現,五種奈米多層薄膜之雙層週期厚度皆控制在5-30 nm之間,薄膜厚度介於550至600nm。各多層薄膜硬度均高於單層薄膜者,而試片編號為A5 (=30nm)之奈米多層薄膜有最高之硬度與最低的摩擦係數。
Five nanostructured CrN/ZrN multilayer coatings were deposited periodically by the Cathode Arc Deposition System (CAD6-1). We used to change the rotational speed to control the thinkness of the bipolar periodically of the CrN/ZrN thin film. The crystalline structure of multilayer coatings was determined by a glancing angle X-ray diffractometer. Microstructures of thin films were examined by an atomic force microscopy (AFM), scanning electron microscopy (SEM), respectively. A nanoindenter , a micro Vickers hardness tester and pin-on-disk wear tests were used to evaluate the hardness, fracture toughness and tribological properties of the thin films, respectively. It was found that the bipolar periodically thinkness of CrN/ZrN multilayer coatings were controlled within the range from 5 to 30 nm and the thinkness were at the range from 550 to 600 nm. All the hardness of multilayer thin films were higher than single layer and the sample A5(=30nm) multilayer have the maximum hardness and the minimum coefficient of friction.
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