本研究主要為次微米陽極氧化鋁(Anodic aluminum oxide, AAO)孔洞製作光學元件之研究，先進行氧化鋁微結構製程，再結合聚二甲基矽氧烷（Polydimethylsiloxane , PDMS）微鑄造成形技術。此研究過程中磷酸生成200/300 nm 孔距錐狀AAO孔洞，電壓偏低為非最密堆積結構排列，孔洞成長率較低，需以400 nm最密堆積結構6~3.5 倍時間氧化，才能獲致與最密堆積結構接近之深寬比為2.5孔洞。AAO 孔徑300 nm尺度以下之PDMS翻製，為了能完整呈現氧化鋁原來形貌，必須另加入矽油稀釋劑改變PDMS之黏滯係數，使PDMS主劑、硬化劑與稀釋劑比例為10:1:1時較易進入模穴。此外以電漿處理改變AAO表面為親水性時，可以有效改善翻製時，因表面能因素而不易成形之缺點。實驗結果顯示，300 nm 錐狀PDMS微結構在波長300 nm時穿透率由45 ％提升至63 ％，是較佳之抗反射微結構尺寸。以此技術所製作之抗反射層光學元件，具有製程簡單、成本低廉、具大面積翻製之可能，預期未來可應用於矽基太陽能面板、平面顯示器面板、手機面板之抗反射結構層。

This research is to fabricate optical elements with sub-micron features on AAO (Anodic aluminum oxide). Herein, anodic aluminum oxide fabrication and nano imprinting fabrication techniques have been integrated to fabricate AR (Anti-reflection) optical elements. Experimental procedure includes anodizing an Al plate to make porous sub-micron structure perpendicular to the surface as an AAO master mold, then applying PDMS (Polydimethylsiloxane) to cast on the AAO template to obtain an optical element, and finally using SEM and spectrophotometer to investigate the optical property of the AR optical element. Experimental results show that with 300 nm conic shape PDMS AR elements, transmittance can be achieved as 63% at the optical wavelength 300 nm, which is higher than the reference surface without structures as 45%. This method has been developed and proved to effectively produce optical elements within 100~300 nm features. Potentially it could be used to fabricate a large area of polymer thin films and to be used an effective AR structure for solar cells and related applications.

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