本研究係探討以田口式實驗設計法應用電漿浸沒離子佈值(PIII, Plasma Immersion Ion Implantation)技術進行AA7005鋁合金表面改質之最佳製程參數組合，亦探討後續T6熱處理對試片表面性質所需之影響。所採用之品質特性指標為氮元素擴散深度、氮元素總含量、及試片表層硬度值等三種；涉及之PIII製程控制因子為處理時間、脈衝電壓、電漿源能量、工作氣壓。
實驗結果顯示，氮元素總含量為最合宜之品質特性指標。對於氮元素擴散深度而言，氮元素擴散深度隨著植入的時間與脈衝電壓的增加而增加。對氮元素總含量以及表層硬度值，影響最大的為脈衝電壓。大的脈衝電壓、飽和的電漿源能量、足夠的工作氣壓均為提升表層硬度值所必須遵循之原則。本研究所得之最佳製程參數組合為: 時間60min、脈衝電壓30kV、電漿源能量350W、工作氣壓3×10-3torr。以上述參數組合所進行之確認實驗，其實驗結果之量測值與預估值很相近，表示加法模式成立，此外，最佳參數組合之PIII處理後經T6熱處理，可有效提升表層硬度值。

In this study, Taguchi experimental method is applied to optimize the process parameters of PIII technology for surface treatment of AA7005 aluminum alloy. The effect of post T6 heat treatment on the surface characteristic of PIII treat specimens is also studied. Three quality indexes are used to conduct Taguchi analysis, they are nitrogen implantation depth, total nitrogen implanted, maximum surface hardness. PIII process controlling factors analyzed in this study are treat time, bias voltage, RF power and working pressure.
Experimental results show that total nitrogen implanted is the most suitable one among the three quality indices use in this study. Implantation depth of the nitrogen increases with increasing treat time and bias voltage. Total nitrogen content and surface hardness are strongly influence by bias voltage. Analytical results indicate that a combination of large bias voltage, high working pressure and suitable RF power are essential for PIII process to produce good modified surface layer. The optimized PIII process parameters obtained in this study are: 60 min. of treat time, 30kV of bias voltage, 350W of RF power, 3×10-3torr of working pressure. Experiment results obtained from confirmation experiment are in good agreement with the expectation value. Experimental results also showed that post T6 heat treatment can enhance the surface hardness of test specimens.

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