本研究主要是探討以射頻磁控濺鍍(RF magnetron sputtering)之系統沉積二氧化鈦以及含氮二氧化鈦薄膜於鈦/矽基材上，或者再以鍛燒的方式對膜材進行後處理，探討氣體流量參數以及後處理溫度的改變對結晶結構、表面形態和化學組成之影響，並測試膜材光催化的效能。
實驗結果顯示，利用大氣氧化純鈦膜所製備的二氧化鈦膜對紫外光的照射具有明顯的銀還原現象且接觸角下降幅度達70%。然而在反應性濺鍍沉積二氧化鈦膜前，必須先於基材預鍍一層鈦膜，才可直接成長出具有光觸媒效應之Anatase(004)結構，且對紫外光照射的光催化效果隨著氧氣流量增加而增加，經熱處理後，對紫外光照射的催化效果隨處理溫度升高可獲得大幅提升，尤其在Ar/O2=2(O2=2sccm)，溫度500℃時為Anatase與Rutile兩相混合，因而具有最佳的紫外光光催化效果，接觸角下降近80%，較未熱處理時提高了20%，亦較市售二氧化鈦粉末(Degussa P-25)製成之薄膜效果佳。
在同時通入N2及O2成長含氮二氧化鈦時，發現氧氣流量以及靶材材料會影響氮原子的摻入量。以鈦為靶材時，在O2=4sccm時，易達完全氧化，故氮原子不易摻入而以氮分子吸附為主，在降低氧氣流量後，氮原子可明顯的摻入膜材中，其中以N2/O2=2.33(O2=3sccm)時，有最大氮原子摻入量約2.1 at.%，並且在可見光照射之下，已有顯著銀顆粒還原於膜材表面，且水滴接觸角亦可下降達60%，相同的條件改以氮化鈦為靶材時，可得到較大氮原子摻入量約3.2 at.%，亦具有較佳的可見光效果。

The study is to deposit TiO2 photocatalyst thin films on Ti/Si substrate with and without nitrogen doping in a R.F. magnetron sputtering system. The crystal structure, surface morphology, chemical composition and other characteristics of TiO2 or TiO2-xNx films were also investigated with different gas flow ratios and thermal treatments. Finally, the photocatalytic effect were examined by the use of silver reduction and contact angle measurement.
Experimental results indicated that after thermal oxidation the TiO2 film showed remarkable silver reduction and hydrophilic behaviors under UV light. When TiO2 films were deposited by reactive sputtering, a layer of Ti had to be deposited before hand on the substrate. The TiO2 films deposited on Ti/Si substrate could form Anatase structure and the photocatalytic effect increased with increasing O2 flow rate. After annealing in air at various temperatures, the photocatalytic effect was be enhanced. Especially with Ar/O2=2(O2=2sccm) and annealing at 500℃, the films formed Anatase and Rutile mixed phase structure and had better photocatalytic effect than other deposition and thermal treatment conditions under exposure to UV light .
N2/O2 flow ratio and target material played very important roles for the deposition of TiO2-xNx films. The deposition films were TiO2 at N2/O2=1.75(O2=4sccm) and nitrogen atom were difficult to be doped into. The nitrogen atom existed in TiO2 by chemical adsorption. But the TiN crystal structure appeared with N2/O2=3.5(O2=2sccm) which affected the photocatalytic effect with exposured to visible light. When N2/O2=2.33(O2=3sccm), films with a concentration of 2.1 at.% β-N with only Anatase structure was grown. It showed remarkable silver reduction result with exposure to visible light and the 59.6% decrease in contact angle. When the target changed from Ti to TiN, the amount of β-N increased in the TiO2-xNx film. The TiO2-xNx film contained 3.2 at.% β-N deposited with TiN target at N2/O2=2.33(O2=3sccm). It had better photocatalytic effect with exposure to visible light.

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