由於光電子元件積體化，所以對於不同材料所組成的結構來說，半導體製程中所產生的本質應力(Intrinsic-stress)、外在環境溫度影響下所產生的熱應力(Thermal-stress)對於波導雙折射特性皆會產生很大的影響，本論文主要是探討因波導結構不對稱所造成的結構雙折射是如何利用覆蓋氧化層薄膜來反推求得。

In this thesis, the research will focus on acquiring the group birefringence of 0.25-m thick silicon-wire waveguide from various silicon-dioxide cladding layers using the interferograms of optical low coherence interferometry (OLCI) technology

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