本研究以兩階段式電沉積法在ITO玻璃上成長氧化鋅奈米桿，期望能生成細長且缺陷較少的氧化鋅奈米桿，將來可應用於太陽能電池和生物感測元件上。
第一部分探討直接電沉積氧化鋅奈米桿的性質。直接電沉積氧化鋅奈米桿時，無法得到均勻分布且整齊排列的奈米桿。因此期望藉由兩階段式電沉積法加上一層種晶來幫助奈米桿的生長與排列。
第二部分探討兩階段式電沉積氧化鋅奈米桿的性質，包含第一階段成長種晶的電位與時間，和第二階段成長氧化鋅奈米桿的電位、硝酸鋅濃度、系統溫度與時間之影響。當第一階段成長種晶的電位為-1.3V且沉積時間超過5秒時，可以得到整齊且均勻排列的奈米桿。而第二階段成長奈米桿的較佳條件為電位-1.0V到-0.9V、硝酸鋅濃度0.002M到0.003M以及系統溫度高於60OC，可以得到排列整齊、結晶性佳且高穿透率的奈米桿，但是電沉積時間必須小於120分鐘。然而隨著還原電位的提升、硝酸鋅濃度的增加和系統溫度的下降，氧化鋅奈米桿的缺陷也跟著增加。
第三部分探討熱處理溫度對氧化鋅奈米桿的影響。退火處理使得奈米桿中的缺陷減少且晶相品質提升。

ZnO nanorods were grow on ITO substrates by two-step electrochemical deposition in Zn(NO3)2 aqueous solution. We expect to grow thin, long, less defect and high crystallization ZnO nanorods, and the nanorods can use in solar cell and biosensor in the future.
In first part, we investigate the direct electrodeposition. Uniform and highiy oriented ZnO nanorods were not deposited by direct electrodeposition.
In second part, we investigate the two-step electrodeposition. Compact and transparent ZnO nanorods were deposited by the two-step electrodeposition technique. The first potentiostatic step was used to prepare the seed layer, and the second potentiostatic step was used to grow ZnO nanorods. The effects of growth parameters, such as first cathodic potential, first growth time, second cathodic potential, Zn(NO3)2 concentration, bath temperature, and second growth time were studied. Results show that ZnO nanorods with highly c-axis preferred orientation can been obtained when the operation time of first potentiostatic deposition at –1.3 V is over 5 s. The isolated nanorods fabricated at potential -0.9V or -1.0V, a relatively small concentration of Zn(NO3)2 (0.002M~0.003M), and high temperature (>60OC) exhibited the best structural and optical qualities. The ZnO nanorods were found to grow along the c axis perpendicularly to the substrate with a single-crystal wurtzite structure.
In third part, we investigate the annealing treatment of ZnO nanorods. Thermal treatment will effect the optical emission characteristic of ZnO rods. The degree of crystallization of ZnO rod will be increased with thermall treatment due to it reduce the concentration of defect.

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