重金屬汙染會影響人體的生理機能，人體經由直接或是間接地攝入重金屬會引起臟器骨骼病變，皮膚、黏膜及呼吸道的局部炎症，以及中樞神經等不可逆之永久性損傷。因此，建立有效且準確監測食物及水源中殘留的重金屬離子的方式尤為重要。傳統的感測方式例如感應式耦合電漿光學放射光譜儀 (Inductively coupled plasma optical emission spectroscopy, ICP-OES) 及感應式耦合電漿質譜儀 (Inductively coupled plasma mass spectroscopy, ICP-MS) 已能準確探測樣品之重金屬含量，但是儀器的複雜操作，龐大的機械設備，以及對於樣品和標準品校正的要求過於嚴苛，使感測的廣泛性被侷限。因此，眾多研究團隊致力於發展輕便化、可攜帶式、高靈敏性的重金屬檢測感測系統。
方波陽極剝除法 (square wave anodic stripping voltammetry, SWASV) 及薄膜電極 (film electrode, FE) 是一種以伏安法之電流響應定量重金屬離子的方式。工作電極的表面原子會與重金屬離子形成類汞齊的薄膜，沉積於電極表面，而後經由正向掃描將沉積的重金屬氧化，即可由伏安圖中的金屬氧化峰進行定量。工作電極之化學結構及表面型態，是影響重金屬離子沉積的關鍵，因此不同的元素例如汞、鉍、鎵、銦、錫、鉛等後過渡金屬被用作工作電極，以因應不同的目標重金屬離子。研究顯示單一元素態的工作電極對於重金屬離子的親和力、普遍性、及最低偵測極限有所侷限，因此同時使用兩種金屬作為工作電極，以協同效應可增強對於重金屬離子之靈敏度及最低偵測極限。
過往文獻中以錫金屬作為工作電極的研究極為稀少，因此本論文第一部分先行探討錫電極之電化學性質、鈍化性質、以及最適化錫電極偵測鎘離子之電化學勢窗和酸鹼值。第二部分以微波電漿蝕刻錫電極表面，以達到去除氧化層及活化表面之效果。第三部分以濺鍍鉍的方式，形成鉍錫雙金屬薄膜電極，並調控濺鍍時間，以最適化鉍錫金屬的比例。第四部份以微波電漿處理最適化之鉍錫雙金屬薄膜電極，嘗試疊加兩種後處理帶來的效果，以更精進對鎘離子之靈敏度及最低偵測極限。
結果顯示微波電漿處理能放大稀薄濃度時的波形，且能極大的增強對鎘離子之靈敏度；而鉍濺鍍則能有效穩定電流響應及降低背景值，使鉍錫雙金屬電極的準確性大幅提升。最適化後以微波電漿處理之鉍錫雙金屬薄膜電極對鎘離子偵測之線性區間為5 ppb ~ 100 ppb，靈敏度為 2.46 μA/ppb，偵測極限可達0.45 ppb，偵測表現可匹敵現有的文獻數值。

Recent scientific studies have revealed that heavy metal contamination can significantly impact human physiological functions. Heavy metal consumption, whether direct or indirect, can cause local inflammation of the skin, mucous membranes, respiratory tract, visceral bone lesions, irreversible and permanent central nervous system damage. As a result, it is critical to develop methods for effectively and precisely monitoring residual heavy metal ions in food and water sources. Conventional sensing technologies, such as inductively coupled plasma optical emission spectroscopy (ICP-OES) and inductively coupled plasma mass spectroscopy (ICP-MS), have shown their capability in detecting heavy metal ions accurately. However, the sophisticated operation, massive mechanical equipment, and stringent requirements for samples and calibrations limited the versatility of heavy metal detection. Therefore, many research teams are committed to developing lightweight, portable, high-sensitivity heavy metal detection systems.
Heavy metal ions can be measured by voltammetric current response using square wave anodic stripping voltammetry (SWASV) with the thin film electrode (FE). The surface atoms of the working electrode will form an amalgam-like thin film with the heavy metal ions and coat on the electrode surface, which can be quantified from the oxidation peaks in the voltammogram through the forward scan. The chemical composition and surface construction of the working electrode are essential determinants in heavy metal ions deposition. As a result, various elements such as mercury, bismuth, gallium, indium, tin, lead, and other post-transitional metals are utilized as the working electrode material to bind with specific target heavy metal ions. Research has revealed that the affinity, ubiquity, and limit of detection for heavy metal ions were constrained by applying single-element working electrodes. Therefore, combining two metals as working electrodes simultaneously can improve the sensitivity and limit of detection through the synergetic effect.
Due to the limited research utilizing tin metal as the working electrode in previous studies, the first section of this thesis covers the electrochemical properties, passivation properties, electrochemical potential window, and optimized pH value of tin electrode for cadmium detection. The second section applies the microwave plasma to remove the inherent oxide layer and activate the electrode surface. In the third section, bismuth is sputtered on the tin electrodes to establish bismuth-tin bimetallic film electrodes. The ratio of bismuth to tin metal is optimized by manipulating the sputtering time. In the last section, microwave plasma treatment is applied on the optimized bismuth-tin bimetallic film electrode in an effort to superimpose the benefits of the two post-treatments to raise the sensitivity and the limit of detection to cadmium ions.
The results revealed that microwave plasma treatment can significantly increase the sensitivity to cadmium ions and may amplify the response at a dilute concentration. On the other hand, bismuth sputtering can effectively stabilize the current response and lower the background noise, resulting in high accuracy for the bismuth-tin bimetallic electrode. The best-performed microwave plasma-treated bismuth-tin bimetallic film electrode exhibited linearity between 5 ppb to 100 ppb, a sensitivity of 2.46 μA/ppb, and a limit of detection of 0.45 ppb, competitive to the reported records.

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