本實驗使用脈衝直流磁控濺鍍系統在200℃及400℃二種環境下鍍製出兩個系列共10批Cr-Si-C-N奈米複合薄膜，鍍製時通入四甲基矽烷(TMS)為前驅物作為薄膜內矽與碳的來源，在製程中逐漸提升TMS流量(5、10、15、20、30 sccm)以觀察不同矽與碳含量對於Cr-Si-C-N奈米複合薄膜之微結構、機械性質及耐蝕能力之影響。由XRD晶相分析結果可以發現在TMS流量小於15 sccm時薄膜皆為FCC之CrN結構，隨著TMS流量的增加，薄膜逐漸形成非晶之結構，到了TMS流量微30 sccm時薄膜主要以非晶碳結構為主。薄膜之粗糙度介於1.9-5.9 nm，當微量之矽與碳含量固溶於CrN晶粒結構造成固溶強化使硬度上升，在5 sccm時固溶強化效果為最佳且C1及T1之硬度分別達到23.5及27.5 Gpa，在附著性試驗分析中可以觀察到除了T1(1.1 at.%Si，8.5 at.%C)有著較佳的附著性。在0.5M之硫酸水溶液做電化學腐蝕試驗中可以觀察到Cr-Si-C-N奈米複合薄膜都有著比SUS 420不鏽鋼更加的抗腐蝕能力，綜合上述結果可以發現在適當的TMS流量下，可以得到擁有不錯硬度及附著性，以及同時擁有極佳抗腐蝕能力之薄膜，在工業用加工刀具、模具之保護鍍膜都具有極高的應用潛力。

The chromium nitride thin film have a good mechanical properties and oxidation resistance. but the drawback is the slightly lower hardnessthen other hard coatings. the concept of nanocomposite thin films is employed by adding silicon and carbon to enhanced microstructures, mechanical properties and corrosion resistance, In this study, ten CrSiCN nanacomposite thin films with various TMS flow rate were fabricated by a pulsed DC reactive magnetron sputtering system
The FCC structure of CrN was observed for the coating under 15 sccm TMS flow rate by XRD phase analysis. With higher TMS flow rate, amorphous structure was found. The coating with 30 sccm TMS flow rate exibite the Diamond-like carbon structure. The hardness decreased with increasing TMS contents in the Cr-Si-C-N coatings. The coatings with 1.1 at.% Si and 8.5 at.%C content exhibited a combination of high hardness because of the solid solution hardeness, based on the scratch adhesion strength test results, the Cr-Si-C-N coatings with 5 sccm TMS flow rate at 200℃ has the best adhesion properties. It is found that the Cr-Si-C-N coating with porper Si and C content (1.1 at.%Si and 8.5 at.%C) at 200℃ has the best mechanical properity.The corrosion resistance was analyed by using the potentiostat in 0.5M H2SO4 aqueous solution. and the corrosion resistance of the thin films was improved as the highest TMS flow rate.

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