化學機械研磨是目前能夠將250奈米以下製程的8吋晶圓完全平坦化的技術。然而，此程序消耗大量的超純水，即產生大量難以處理之廢水。本研究利用PDA2000來觀察不同高分子對於膠羽在雙重混凝程序中的影響。此外，經由導入高剪力可以獲得膠羽重新絮凝的能力，實驗結果發現，當雙重調理使用陽電性高分子絮凝劑PDADMAC搭配陰電性聚電解質(PAA, AP410, MagnaFloc156)時，絮凝效果會變好，同時亦提供了更廣的加藥範圍。但是，PDADMAC與非離子性聚電解質(PAM)組合，卻無法有效的幫助絮凝。另一方面，結合PDADMAC與兩性聚電解質(T204)可以比任一聚電解質單獨使用下，使用更低的劑量來達到相同的絮凝效果，並且也增加了加藥劑量範圍。從FI値與數據分析得知，濁度、總懸浮固體、界達電位與溶解矽酸與膠羽大小無關。膠羽破碎與再生成的實驗中發現，使佣PDADMAC搭配高劑量的AP410或是MagnaFloc156，膠羽破碎之後會再重新生成，然而，如果使用PDADMAC搭配T204或是低劑量的AP410或MagnaFloc156，則膠羽經破碎之後就不會重新生成新膠羽。

Chemical Mechanical Polishing (CMP) has emerged as a preferred and the only planarization technology that provides global planarization as IC size smaller than 250 nm and wafer size changes to 8 in and beyond. However, the CMP has a major drawback in that it consumes a large amount of ultra pure water and produces approximately an equal amount of wastewater that is difficult to treat.

The current study was conducted to study the effect of dual flocculation using different kind of polymers in treating CMP wastewater of semiconductor manufacturer with Photometric Dispersion Analyser (PDA2000) to continuously monitor the flocculation. In addition, the reformation of flocs after introducing high shear rate was investigated.

The experimental results showed that dual flocculation using combination of cationic polyelectrolyte (PDADMAC) and anionic polyelectrolyte (PAA, AP410, MagnaFloc156) enhanced the flocculation and gave broader range of optimum dosage at the expense of increasing the dosage of chemicals. Combination of PDADMAC and non-ionic polyelectrolyte (PAM) hardly enhanced the flocculation. On the other hand, combination of PDADMAC and polyampholyte (T204) also can enhance the flocculation with less dosage than the optimum dosage in single flocculation and gave broader optimum dosage. Turbidity, TSS, zeta potential, and dissolved silica were not related to floc size based on Flocculation Index (FI) and data analysis. Breakage and reformation results indicated that when using combination of PDADMAC and high dosage of AP410 or MagnaFloc156, reformation of flocs occurred. However, in dual flocculation using combination of PDADMAC with T204, low-dosage AP410, and low-dosage MagnaFloc156 did not show any reformation of flocs.

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