本研究為設計波段900~1700 nm Offner系統光譜儀，選定架構參數，包含光源設計波段、中心波長、繞射階數、光譜成像大小、光柵條紋間距、光源發散角、凸透鏡曲率半徑及透鏡間距，將可以得到整個Offner初始架構模型，再將資料匯至TracePro軟體進行實際光跡追蹤模擬。
本研究分成兩組，一組偵測器像素數規格128 × 128、像素大小1.4 μm × 1.4 μm及偵測器像素數規格50 × 50、像素大小20 μm × 20 μm兩種規格分析，再利用這兩個規格各分析點光源及前級光源，點光源大小為X方向1 nm、Y方向1 nm，前級光源大小為X方向20 μm、Y方向20 μm；另一組則將像素大小改變為0.75μm × 0.75 μm，其餘分析參數固定。
為了分析波段的成像品質，本研究將波段分成900 nm、1100 nm、1300 nm、1500 nm、1700 nm個別分析，進行光跡追蹤，另外再分別計算出MTF、Pitch、DOF及解析度數據及其圖形。
本研究針對Offner系統光譜儀，從參數建立、分析流程、模擬呈現、數據分析等步驟，主要比較凸透鏡曲率半徑大小得出最佳系統大小，並建立一套完整的Offner分析設計流程。

Design of an Offner system spectrometer used for 900 ~ 1700 nm wavebands is introduced in this thesis. All the system parameters are selected, including the wavebands of light source, the central wavelength, the diffraction orders, spectral imaging size, grating pitch, the divergence angle of the light source, radius of concave mirror and the distance of the lens. The entire Offner system model will be available and data will be exported to the TracePro software for ray tracing simulation.
This study is divided into two groups, one of the detector pixel number 128 × 128, pixel size 1.4 μm × 1.4 μm and the detector pixel number 50 × 50 , pixel size 20 μm × 20 μm two specifications. And then two specifications are used to analyze point source and the front-optics source. The size of light source is 1 nm × 1 nm. The size of front source is 20 μm × 20 μm；another group purpose to change pixel size 0.75μm × 0.75μm，the remaining parameters are fixed.
In order to analyze the quality of images, five specific wavelengths are selected to be analyzed individually, Which are 900 nm, 1100 nm, 1300 nm, 1500 nm, and 1700 nm. Ray tracing simulation are used to analyze MTF, Pitch, DOF, resolution data and graphics respectively.
This process mainly through compare radius of concave mirror to get an optimal system size. This study establishes a design process of complete Offner analysis.

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