研究生: |
陳威廷 Wei-Ting Chen |
---|---|
論文名稱: |
一維和二維週期性鋯基金屬玻璃光柵在矽晶片表面上之製備與分析 Fabrication and Chracterication of the grating of 1-D and 2-D Periodic relief Zr-based metallic glass on the Silicon Wafer |
指導教授: |
陳建光
Jem-Kun Chen |
口試委員: |
朱瑾
Jinn P. Chu 邱顯堂 Hsien-Tang Chiu 張棋榕 Chi-Jung Chang |
學位類別: |
碩士 Master |
系所名稱: |
工程學院 - 材料科學與工程系 Department of Materials Science and Engineering |
論文出版年: | 2012 |
畢業學年度: | 100 |
語文別: | 中文 |
論文頁數: | 88 |
中文關鍵詞: | 微影製程,金屬玻璃 |
外文關鍵詞: | lithography,metallic glass |
相關次數: | 點閱:426 下載:2 |
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在本研究中利用微影製程技術製備出奈米結構光阻在矽晶片上,並使用磁控射頻濺鍍分別濺鍍不同厚度之鋯基金屬玻璃薄膜,探討晶片上之光阻與鍍膜去除光阻後鋯基金屬玻璃之奈米結構之光柵現象與親疏水性質。
藉由SEM及AFM觀察發現運用微影製程製備出奈米尺寸線條與洞型圖案之光阻圖案平均分布且連續性佳,光阻高度介於810~840nm;600nm、800nm、1000nm線性圖案光阻於線條垂直方向分別以不同傾角可觀察到明顯之光柵現象;光阻對水之接觸角約68°,而洞寬500nm、700nm、800nm之圖案化光阻對水之接觸角分別增加為83.7°、82.5°、81.8°,可發現其疏水性因其結構變化而增加。觀察經由鍍膜去除光阻之晶片,可發現鍍膜時間900sec其金屬玻璃會沉積於原線型圖案化光阻之間距中,形成高度約30nm~50nm具連續性之線型圖案化鋯基金屬玻璃,且可觀察到具有光柵之效果。洞型圖案光阻經濺鍍再去除光阻後,可觀察到鍍膜時間225sec、450sec、675sec、900sec皆可製備出空心圓柱型態之鋯基金屬玻璃;量測不同濺鍍厚度之500nm、700nm、800nm圓柱型態之對水接觸角,分別增加為96.6°~98.3°、92.1°~95°、91.2°~93.8°,可發現其圓柱型態更提升其疏水性質。經由此實驗研究之分析與觀察可發現製備圖案化之金屬玻璃,且藉由其微米以下尺寸圖型、均一性與連續性,可提升其疏水性質,盼能發展出更多研究與應用。
In this study, nanostructures of photoresists were fabricated by lithographic technologies. And using r.f. magnetron sputtering system to deposite the metallic glass film of different thickness. The nanostructures of photoresists which have patterns of lines and holes, the patterns were complete and good in continuity. The height of patterned photoresists were about 810 to 840nm.The resolutions and duty ratios(line width/line spacing) of the lines were designed from 600nm to 1000nm and 1:1.5,respectively.And the resolutions and the duty ratios(hole width/hole spacing) of the holes were designed from 500nm to 800nm and 1:1.5,respectively.All of the patterned photoresist have great optical property of optical gratings by shining with white light source.After sputtering the bulk metallic glass film onto the lines patterns of photoresist and wash away the photoresist by acetone,the lines patterns of bulk metallic glass still have great optical gratings.
Furthermore, the contact angles on plate surface of positive photoresist is 68°.The contact angles increased to81.8° to 83.7° on the hole matrixes of positive photoresist. After sputtering the bulk metallic glass film onto the holes patterns of photoresist and washing away the photoresist, the contact angles increased to 91.2° to 98.3°because of the hollow cone structure. In this work, we found it is successful to fabricate hollow cone structure of Zr-based metallic glass, and the contact angles increased obviously. The patterns are uniform and complete.
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