這個研究是藉由電子束微影技術製備奈米光阻結構表面性質研究。正型光阻被用來製作正方形洞矩陣，這些正方形洞矩陣和洞寬度與洞間距分別設計成200 nm至1200 nm和1：1~1：3。深寬比作為表面孔洞深度與寬度的比值。在深寬比為2時，洞矩陣比為1：1之正型光阻的正方形矩陣與表面平坦的正型光阻，接觸角度從71.1°上升至115°，並且接觸角度隨著深寬比增加。結果接近Wenzel's Model和Cassie's Model的理論值。在深寬比為2時以原子力顯微鏡 (AFM) 計算平坦表面之黏滯力從6.4 nN上升至17.3 nN，然而，在洞寬度與洞間距比黏滯力只有稍微的上升。
　　此外，負型光阻被用來製作正方形點矩陣，這些正方形點矩陣和點寬度與點間距分別設計成200 nm至1300 nm和1：1~1：6。深寬比作為表面點深度與點寬度之比值的影響研究，在深寬比為2時，點矩陣比為1：1之負型光阻的正方型點矩陣與表面平坦的正型光阻，接觸角度從43.2°上升至97.3°，此外，接觸角度隨著深寬比增加。結果大約近似於Wenzel's Model，但是卻不適合於Cassie's Model的理論值。在深寬比為2時以原子力顯微鏡 (AFM) 計算平坦表面之黏滯力從5.2 nN上升至22 nN，黏滯力因為點寬度與點間距而增加。
在本實驗中，各方面的矩陣比例與深寬比之奈米表面可以控制黏滯力進行模仿壁虎纖毛的粗糙表面。

In this study, nanostructures of photoresists were fabricated by e-beam lithography to investigate the surface property. The positive photoresist was used to fabricate square hole matrixes. The resolutions and duty ratios (hole width /hole spacing) of these square holes were designed from 200 to 1200 nm and 1:1 to 1:3, respectively. Aspect ratios were defined as depth/width of the contact holes to investigate the effect on the surface. At aspact ratio = 2, the contact angles on plate surface of positive photoresist increased from 71.1° to 115°on the square hole matrixes of positive photoresist under duty ratio = 1:1. Moreover, the contact angle increased with the aspect ratio. The results matched approximately with Wenzel's Model and Cassie's Model. The adhesion force from atomic force microscope (AFM) calculation on plate surface increased from 6.4 to the 17.3 nN on the matrix surface at aspect =2. However, the adhesion force just increased slightly with the duty ratios ratio.
Furthermore, the negative photoresist was used to fabricate square dot matrixes. The resolutions and duty ratios (dot width /dot spacing) of these square dots were designed from 200 to 1300 nm and 1:1 to 1:6, respectively. Aspect ratios were defined as depth/width of the dots to investigate the effect on the surface. At aspact ratio = 2, the contact angles on plate surface of negative photoresist increased from 43.2° to 97.3°on the square dot matrixes under duty ratio = 1:1. At duty ratio = 1:1. Moreover, the contact angle on the matrix surface increased with the aspect ratio. The results could fit approximately with Wenzel's Model, but mismatched with Cassie's Model. The adhesion force from atomic force microscope (AFM) calculation on plate surface increased from 5.2 to the 22 nN on the matrix surface at aspect = 2. The adhesion force on the matrix surface increased with the duty ratios.
　　 In our work, the adhesion forces on the surface were controlled by the nanostructure on the surface with various aspect and duty ratios to imitate gecko setae surface.

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