本研究探討以不同分散溶劑作為矽奈米粒子分散介質時，所配製分散液之穩定性，找出矽奈米粒子最適之分散溶劑，並根據其分散液沉降速度、離心後之濃度，定義其穩定性的差異。以雷射動態散射儀分析分散液穩定性對分散液中矽奈米粒子粒徑的影響、分散液中矽奈米粒子粒徑隨時間的影響，及以界達電位量測儀，測量矽奈米粒子表面帶電與分散液穩定性之關係。並利用不同分散溶劑之分散液穩定性差異，計算出屬於矽奈米粒子的分散穩定性參數(Hansen solubility parameters)，並將其計算結果與實驗結果作一比較。最後將分散實驗結果之分散液，利用超音波塗佈的方式進行基板之塗佈，觀察及改善其基板上之分散情形。

Silicon nanopowder colloidal solution has been investigated in terms of the silicon particle size, dispersion and zeta-potential in various organic solvents. In this study, we conducted sedimentation experiment and concentration measurement after centrifugation of the prepared solution to give us an initial assessment regarding the stability of the nanopowders in the solution. Using the Zetasizer3000HS, the hydrodynamic diameter (Z-average) and zeta-potential of the chosen solutions were obtained. In measuring the size of the nanopowders in the solution, an additional time-dependent measurement was also done. As such, a relationship was correlated between the different measured parameters and the type of solvent in which the colloidal solution remains stable. The study also introduced the concept of Hansen solubility parameters to explain the possible solvent effect on the silicon nanopowder. The stable colloidal solution was then used as ink and coated on an ITO substrate using an ultrasonic-assisted spray coater. Studies were also done on the interaction of the substrate with the nanopowder and an assessment was done on the further modification required to improve film uniformity.

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