研究生: |
張為凱 Wei-kai Chang |
---|---|
論文名稱: |
應用PIII技術探討鋁合金表面氮化鋁生成機制 Applying PIII process to study the Growth Mechanism of AlN / Al Alloys |
指導教授: |
吳翼貽
Ye-ee Wu |
口試委員: |
郭俞麟
none 蔡文發 none |
學位類別: |
碩士 Master |
系所名稱: |
工程學院 - 機械工程系 Department of Mechanical Engineering |
論文出版年: | 2013 |
畢業學年度: | 101 |
語文別: | 中文 |
論文頁數: | 115 |
中文關鍵詞: | PIII 、AlN 、GDS 、XPS 、AFM 、奈米壓痕試驗機 、Al-Zn-Mg 鋁合金 、AA7005 鋁合金 、奈米壓痕試驗機 |
外文關鍵詞: | PIII, AlN, GDS, XPS, AFM, aluminum alloy, nano-indentation, wear resistance, friction coefficient |
相關次數: | 點閱:261 下載:2 |
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本研究係應用電漿浸沒離子佈植技術(PIII, Plasma Immersion Ion Implantation)來探討鋁合金表面氮化鋁之生成機制。在本研究內以AA7005鋁合金、1N30商用純鋁、高純度5N級純鋁 (Super High Purity Aluminum 5N)為基材,探討PIII製程參數、及後續析出熱處理製程對表面改質層厚度及微觀結構的影響。
本研究所用之PIII脈衝電壓為10kV至30kV,工作時間(120min.)與工作氣壓(1x10-3 torr)為固定參數,試片經PIII處理後應用奈米壓痕試驗機(nano-indentor)與輝光放電光譜分析儀(GDS, Glow Discharge Spectrometer)來得到硬度縱深曲線圖以及氮(N)元素縱深分佈曲線圖,並以Flat-on-Flat方式進行表面摩擦係數之量測;再以金相試驗、掃描式電子顯微鏡(SEM)、及應用雙粒子束聚焦式離子束(DB-FIB)技術製作穿透式電子顯微鏡試片觀察改質層之生成分佈、厚度及微觀結構。
研究結果顯示,脈衝電壓越高,氮離子之植入深度越深,且植入劑量越大。當離子注入劑量達到一定值與植入深度後,便開始在試片外部處堆積,難以再往較深處移動,惟在較少雜質與合金元素影響之5N級純鋁中則有隨著脈衝電壓升高,氮元素之高峰值有向試片內部移動之現象。隨著離子注入劑量之上升,鋁合金試片表面的硬度提升越趨明顯,其中以5N級純鋁表面硬度上升幅度最大。將離子佈植過之試片進行熱處理後,在試片內部的氮元素會向外擴散,導致改質層厚度縮減。微觀結構之觀察顯示試片經熱處理後有氣泡在白層內生成,氣泡之生成將嚴重影響白層之平坦度進而使得摩擦係數上升;在氮化層內觀察到多量氣泡(bubble)之1N30試片的摩擦係數最高(0.130)。試片經PIII處理再經雷射表面熱處理後,未能提昇表面硬度值,且降至未改質試片之表面硬度值。
The objective of this study is to investigate the growth mechanism of AlN on Aluminum alloys by applying Nitrogen Plasma Immersion Ion Implantation (N-PIII) technique to treat the surface layer of the aluminum alloy. AA7005、commercially pure aluminum (1N30) and super high purity aluminum(5N) are used as the substrate material in this study. Effects of bias voltage 10 kV, 20kV and 30kV of N-PIII process on the thickness, growth rate and microstructure of the modified layer was studied. The influences post-process heat-treatment on the microstructure and the surface characteristics of the modified layer were investigated and analyzed. Nano-indentation test and Glow Discharge Spectrometer (GDS) test were conducted on the treated specimens to obtain the depth evolution profiles of the hardness and the depth profiles of nitrogen element from the surface of specimen, respectively. The friction coefficients of the modified layer were measured by Flat-on-Flat method.
Specimens being N-PIII treated were subjected to heat treatments. Then, nano-indentation test, GDS test, Flat-on-Flat test were conducted on these heat-treated specimens to examine the effects of post-process heat treatment on the surface properties of the modified layer.
Experimental results showed that the penetration depth of nitrogen ion is related to the bias voltage and the impurity contents of aluminum alloy. The higher bias voltage, the deeper penetration depth and the larger nitrogen ions dosage. High bias voltage can significantly increase the surface hardness of treated specimens; the effect is highly profound in 5N specimens.
After the heat-treatment, internal nitrogen in the specimen would diffuse to the external, and reduce the width of modified layer. This phenomenon can promote the formation of aluminum nitride, and to get better surface property. The microstructure observation showed that, after heat treatment bubbles were generated in the white layer which is a compound layer of AlN, εnitrateγ'nitrate. The generate of bubbles will severely affect the flatness of the aluminum nitride layer, increasing the coefficient of friction of the specimen. Specimen subjected to PIII treatment plus laser surface heat treatment, failed to improve the surface hardness, and the value of surface hardness reduced to the hardness values of unmodified specimen.
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