研究生: |
王文豪 Wen-Hao Wang |
---|---|
論文名稱: |
VNbMoTaWCrx高熵合金氮化物薄膜之微結構與性質評估 Microstructure and property evaluation of VNbMoTaWCrx high entropy alloy nitride thin films |
指導教授: |
王朝正
Chaur-Jeng Wang |
口試委員: |
王朝正
Chaur-Jeng Wang 李志偉 Jyh-Wei Lee 陳士勛 Shih-Hsun Chen |
學位類別: |
碩士 Master |
系所名稱: |
工程學院 - 機械工程系 Department of Mechanical Engineering |
論文出版年: | 2020 |
畢業學年度: | 108 |
語文別: | 中文 |
論文頁數: | 105 |
中文關鍵詞: | VNbMoTaWNx 、VNbMoTaWCrxNy 、氮化高熵合金薄膜 |
外文關鍵詞: | VNbMoTaWNx, VNbMoTaWCrxNy, high entropy alloy nitride thin films |
相關次數: | 點閱:163 下載:1 |
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本研究分為兩個部分,第一部分以等原子比VNbMoTaW高熵合金靶材進行濺鍍,並於製程中控制不同氮氣通量,以製備不同氮含量之高熵合金薄膜;在第二部分使用Cr靶材與VNbMoTaW高熵合金靶共濺鍍,並改變不同氮氣通量來鍍製薄膜。本研究探討不同氮氣流量對於五元VNbMoTaWNx與六元VNbMoTaWCrxNy高熵合金薄膜之元素比例、微觀結構、硬度、沉積速率、附著性、耐腐蝕性等性質變化。
實驗結果顯示,本研究鍍製之VNbMoTaW與VNbMoTaWCrx薄膜均具有負的混合焓、小的原子尺寸差及高的混合熵值,同時也符合混合熵值高於1.5R的高熵合金定義,因此本次鍍製的高熵合金可被稱為固溶體高熵合金;本實驗鍍製VNbMoTaW薄膜為BCC結構,在氮含量13.8 at. %時轉變成過渡相BCC結構,當薄膜中氮含量提高至22.0 at. %時則為純FCC結構。VNbMoTaWNx晶粒尺寸與晶格常數隨著氮含量增加而上升;而薄膜硬度、沉積速率、腐蝕阻抗則隨之下降,薄膜甚至出現許多缺陷。VNbMoTaWCrx薄膜為BCC結構,直到氮含量提高至34.0 at. %時才完全轉變成FCC結構。VNbMoTaWCrxNy薄膜的晶粒尺寸、晶格常數、硬度、腐蝕速率皆隨著氮含量增加而上升,沉積速率則呈現下降趨勢。本研究發現薄膜添加鉻元素可以提升薄膜在氯化鈉水溶液中的抗腐蝕性質,但是對機械性質的提升貢獻不大;而含氮13.8 at.%的VNbMoTaWN薄膜具有高硬度與良好的附著性以及極佳的抗腐蝕能力,因此具有極大的工業應用潛力。
This study can be divided into two parts. In the first part, the VNbMoTaWNx high-entropy alloy thin films with different nitrogen contents were fabricated using an equal atomic ratio VNbMoTaW high-entropy alloy target and under different nitrogen flow rates. In the second part, the the VNbMoTaWCrxNy high-entropy alloy thin films containing different nitrogen contents were grown by a co-sputtering process using a Cr target and a high-entropy alloy target. Effects of nitrogen flow rates on the chemical compositions, microstructure, deposition rate, hardness, adhesion, and corrosion resistance of the five elements VNbMoTaWNx and six elements VNbMoTaWCrxNy high-entropy alloy thin films were discussed.
The experimental results showed that the VNbMoTaW and VNbMoTaWCrx films exhibited negative mixing enthalpy, smaller atomic rauis difference and high mixing entropy, higher than 1.5R, which met the definition of high-entropy alloy. Hence, the high-entropy alloy thin films in this work can be defined as solid solution high-entropy alloy. The VNbMoTaW film was a BCC structure and it further changed into a transition of BCC structure when 13.8 at.% nitrogen was added. The phase structure was pure FCC when the nitrogen content in the VNbMoTaWNx film increased to 22.0 at. %. The grain size and lattice constant of VNbMoTaWNx increased with increasing nitrogen content. Meanwhile, the hardness, deposition rate and corrosion resistance of the VNbMoTaWNx film decreased with increasing nitrogen content. Even more film defects were found when the nitrogen content was higher. The VNbMoTaWCrx thin film had a BCC structure and it completely transformed into an FCC structure when the nitrogen content increased to 34.0 at. %. The grain size, lattice constant, hardness, and corrosion rate of VNbMoTaWCrxNy thin films increased with increase nitrogen content, whereas the deposition rate showed a decreasing tendency. This study found that the addition of chromium to the VNbMoTaW film can improve its corrosion resistance in sodium chloride solution, but it had no effect on the improvement of mechanical properties. We can conclude that the 13.8 at.% nitrogen contained VNbMoTaWN film had high hardness, good adhesion and excellent corrosion resistance, which made it has a great potential for industrial application.
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